公开(公告)号：US20180277335A1

公开(公告)日：2018-09-27

申请号：US15547315

申请日：2015-01-30

Applicant: Hitachi High-Technologies Corporation

Inventor： Toru IWAYA ,  Hisayuki TAKASU ,  Sakae KOUBORI ,  Atsushi KAMINO ,  Kento HORINOUCHI

IPC: H01J37/20 ,  H01J37/26 ,  H01J37/31

CPC classification number: H01J37/20 ,  H01J37/261 ,  H01J37/305 ,  H01J37/31

Abstract: The present invention relates to adjustment of a mask position by driving an R-axis of an electron microscope in order to adjust the mask position with high accuracy while performing observation by the electron microscope without providing a heat generation source inside the electron microscope. The R-axis originally exists in a sample chamber of the electron microscope, which enables control with high accuracy. The R-axis driving of a sample stage can be substituted by raster rotation, therefore, the mask position can be adjusted with high accuracy while performing observation by the electron microscope according to the present invention.

公开(公告)号：US20210193430A1

公开(公告)日：2021-06-24

申请号：US16077782

申请日：2016-02-26

Applicant: Hitachi High-Technologies Corporation

Inventor： Toru IWAYA ,  Hisayuki TAKASU ,  Sakae KOUBORI

IPC: H01J37/20 ,  H01J37/26 ,  H01J37/304 ,  H01J37/08

Abstract: Provided is a machining technology to obtain a desired machining content while suppressing a possibility of causing a redeposition in a machining surface. The invention is directed to provide an ion milling device which includes an ion source which emits an ion beam, a sample holder which holds a sample, and a sample sliding mechanism which slides the sample holder in a direction including a normal direction of an axis of the ion beam.