公开(公告)号：US20200090897A1

公开(公告)日：2020-03-19

申请号：US16572999

申请日：2019-09-17

Applicant: Hitachi High-Technologies Corporation

Inventor： Keigo KASUYA ,  Shuhei ISHIKAWA ,  Kenji TANIMOTO ,  Hajime KAWANO ,  Hideo TODOKORO ,  Souichi KATAGIRI ,  Takashi DOI ,  Soichiro MATSUNAGA

IPC: H01J37/075

Abstract: An object of the invention is to stably supply an electron beam from an electron gun, that is, to prevent variation in intensity of the electron beam. The invention provides a charged particle beam device that includes an electron gun having an electron source, an extraction electrode to which a voltage used for extracting electrons from the electron source is applied, and an acceleration electrode to which a voltage used for accelerating the electrons extracted from the electron source is applied, a first heating unit that heats the extraction electrode, and a second heating unit that heats the acceleration electrode.