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公开(公告)号:US20200266020A1
公开(公告)日:2020-08-20
申请号:US16644871
申请日:2017-09-07
Applicant: Hitachi High-Technologies Corporation
Inventor: Soichiro MATSUNAGA , Yasunari SOHDA , Souichi KATAGIRI , Makoto SAKAKIBARA , Hajime KAWANO , Takashi DOI
IPC: H01J37/063 , H01J37/141 , H01J37/244 , H01J37/248 , H01J37/28 , H01J37/295
Abstract: In order to provide an electron gun capable of maintaining a small spot diameter of a beam converged on a sample even when a probe current applied to the sample is increased, a magnetic field generation source 301 is provided with respect to an electron gun including: an electron source 101; an extraction electrode 102 configured to extract electrons from the electron source 101; an acceleration electrode 103 configured to accelerate the electrons extracted from the electron source 101; and a first coil 104 and a first magnetic path 201 having an opening on an electron source side, the first coil 104 and the first magnetic path 201 forming a control lens configured to converge an electron beam emitted from the acceleration electrode 103. The magnetic field generation source is provided for canceling a magnetic field, at an installation position of the electron source 101, generated by the first coil 104 and the first magnetic path 201.
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公开(公告)号:US20200090897A1
公开(公告)日:2020-03-19
申请号:US16572999
申请日:2019-09-17
Applicant: Hitachi High-Technologies Corporation
Inventor: Keigo KASUYA , Shuhei ISHIKAWA , Kenji TANIMOTO , Hajime KAWANO , Hideo TODOKORO , Souichi KATAGIRI , Takashi DOI , Soichiro MATSUNAGA
IPC: H01J37/075
Abstract: An object of the invention is to stably supply an electron beam from an electron gun, that is, to prevent variation in intensity of the electron beam. The invention provides a charged particle beam device that includes an electron gun having an electron source, an extraction electrode to which a voltage used for extracting electrons from the electron source is applied, and an acceleration electrode to which a voltage used for accelerating the electrons extracted from the electron source is applied, a first heating unit that heats the extraction electrode, and a second heating unit that heats the acceleration electrode.
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公开(公告)号:US20190198284A1
公开(公告)日:2019-06-27
申请号:US16328150
申请日:2016-09-06
Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION
Inventor: Soichiro MATSUNAGA , Yasunari SOHDA , Souichi KATAGIRI , Hajime KAWANO , Takashi DOI
IPC: H01J37/073 , H01J37/244 , H01J37/28
CPC classification number: H01J37/073 , H01J1/30 , H01J1/304 , H01J37/06 , H01J37/244 , H01J37/28 , H01J2237/2448 , H01J2237/24485 , H01J2237/24578 , H01J2237/2809
Abstract: Provided is a high-brightness, high-current electron source including a wire-like member. The wire-like member has an electron emission plane at the tip of the wire-like member. The electron emission plane has a projectingly curved surface. At least the surface of the electron emission plane is formed of an amorphous material.
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