摘要:
A fabrication method of a group III nitride crystal substance includes the steps of cleaning the interior of a reaction chamber by introducing HCl gas into the reaction chamber, and vapor deposition of a group III nitride crystal substance in the cleaned reaction chamber. A fabrication apparatus of a group III nitride crystal substance includes a configuration to introduce HCl gas into the reaction chamber, and a configuration to grow a group III nitride crystal substance by HVPE. Thus, a fabrication method of a group III nitride crystal substance including the method of effectively cleaning deposits adhering inside the reaction chamber during crystal growth, and a fabrication apparatus employed in the fabrication method are provided.
摘要:
A fabrication method of a group III nitride crystal substance includes the steps of cleaning the interior of a reaction chamber by introducing HCl gas into the reaction chamber, and vapor deposition of a group III nitride crystal substance in the cleaned reaction chamber. A fabrication apparatus of a group III nitride crystal substance includes a configuration to introduce HCl gas into the reaction chamber, and a configuration to grow a group III nitride crystal substance by HVPE. Thus, a fabrication method of a group III nitride crystal substance including the method of effectively cleaning deposits adhering inside the reaction chamber during crystal growth, and a fabrication apparatus employed in the fabrication method are provided.
摘要:
The present invention relates to a method of preparing solid particulates and solid particulates prepared by using the method. The method of preparing solid particulates includes dissolving an organic or inorganic compound in a first solvent to provide an organic or inorganic compound-included solution, dispersing the organic or inorganic compound-included solution in a second solvent to provide an emulsion, and concentrating the emulsion in a dispersing medium to precipitate the organic or inorganic compound as solid particulates to provide a dispersion including the solid particulates. The first solvent is an organic solvent or an aqueous solvent, and the second solvent is an organic solvent or an aqueous solvent that is not compatible with the first solvent. It is possible to prepare solid particulates from a wide range of organic or inorganic compounds in accordance with the present invention, and in addition, it is possible to prepare a dispersion including organic or inorganic compound particulates in a high concentration. Therefore, according to the method of the present invention, the solid particulates can be mass-produced.
摘要:
There is provided a method of producing a thin GaN film-joined substrate, including the steps of: joining on a GaN bulk crystalline body a substrate different in type or chemical composition from GaN; and dividing the GaN bulk crystalline body at a plane having a distance of at least 0.1 μm and at most 100 μm from an interface thereof with the substrate different in type, to provide a thin film of GaN on the substrate different in type, wherein the GaN bulk crystalline body had a surface joined to the substrate different in type, that has a maximum surface roughness Rmax of at most 20 μm. Thus a GaN-based semiconductor device including a thin GaN film-joined substrate including a substrate different in type and a thin film of GaN joined firmly on the substrate different in type, and at least one GaN-based semiconductor layer deposited on the thin film of GaN, can be fabricated at low cost.