公开(公告)号：US09483353B2

公开(公告)日：2016-11-01

申请号：US13466299

申请日：2012-05-08

申请人： Hitoshi Nakano

发明人： Hitoshi Nakano

IPC分类号： G06F17/30 ,  G06F11/14

CPC分类号： G06F11/1443

摘要： Provided in one embodiment of the present invention is a computer system including a database server and a terminal device for communicating with the database server; the said database server retaining a database; and the terminal device including: an interface for receiving data, which is stored in the database retained in the database server, via a communication network; a buffer for storing the data received by the interface in order to display the data in a window which is to be displayed on a display device; and a controller for starting saving the data, which is stored into the buffer, in a file at a time interval, with the window being displayed on the display device being as a trigger.

摘要翻译： 在本发明的一个实施例中提供了一种包括数据库服务器和用于与数据库服务器进行通信的终端设备的计算机系统; 所述数据库服务器保留数据库; 所述终端装置包括：通过通信网络接收存储在数据库服务器中的数据库中的数据的接口; 用于存储由接口接收的数据以便在要显示在显示装置上的窗口中显示数据的缓冲器; 以及控制器，用于以显示装置上显示的窗口作为触发，以时间间隔开始将存储在缓冲器中的数据保存在文件中。

公开(公告)号：US20090268175A1

公开(公告)日：2009-10-29

申请号：US12430613

申请日：2009-04-27

申请人： Takahito Chibana ,  Hitoshi Nakano

发明人： Takahito Chibana ,  Hitoshi Nakano

IPC分类号： G03B27/52

CPC分类号： G03F7/70341

摘要： An exposure apparatus that exposes a substrate through liquid includes a projection optical system that projects a pattern of an original onto the substrate; a supply port that supplies the liquid; a recovery port that recovers the liquid; and a plurality of pressure resistance portions arranged at a passage of at least one of the supply port and the recovery port, to apply pressure resistances to the liquid passing through the passage. The pressure resistance portions surround a final surface of the projection optical system and are distant from each other in a direction in which the liquid flows through the passage. One the plurality of pressure resistance portions, which is nearest to the substrate, faces the substrate.

摘要翻译： 通过液体曝光基板的曝光装置包括将原稿的图案投影到基板上的投影光学系统; 供应液体的供应口; 恢复液体的回收口; 以及设置在所述供给口和所述回收口的至少一个的通路处的多个耐压部，以对通过所述通道的液体施加耐压。 耐压部分围绕投影光学系统的最终表面并且在液体流过通道的方向上彼此远离。 与基板最接近的多个耐压部分中的一个面向基板。

公开(公告)号：US20080198347A1

公开(公告)日：2008-08-21

申请号：US12028933

申请日：2008-02-11

申请人： Youji Kawasaki ,  Yoshio Kawanobe ,  Hitoshi Nakano ,  Mikio Arakawa ,  Takahito Chibana ,  Yoichi Matsuoka

发明人： Youji Kawasaki ,  Yoshio Kawanobe ,  Hitoshi Nakano ,  Mikio Arakawa ,  Takahito Chibana ,  Yoichi Matsuoka

IPC分类号： G03B27/52

CPC分类号： G03F7/70916 ,  G03F7/70341

摘要： An immersion exposure apparatus for exposing a substrate via liquid is disclosed. The apparatus comprises a projection optical system configured to project an image of a pattern of a reticle onto the substrate, a first recovery nozzle arranged at a periphery of a final optical element of the projection optical system and configured to recover liquid from a gap between the final optical element and the substrate, and a detector configured to detect a foreign particle in the liquid recovered via the first recovery nozzle.

摘要翻译： 公开了一种用于通过液体曝光衬底的浸没曝光装置。 该装置包括：投影光学系统，被配置为将掩模版图案的图像投影到基板上;第一恢复喷嘴，布置在投影光学系统的最终光学元件的周边，并被配置为从 最终光学元件和基板，以及检测器，其被配置为检测经由第一回收喷嘴回收的液体中的异物。

公开(公告)号：US07372542B2

公开(公告)日：2008-05-13

申请号：US11435731

申请日：2006-05-18

申请人： Hitoshi Nakano

发明人： Hitoshi Nakano

IPC分类号： G03B27/42

CPC分类号： G03F7/70341

摘要： An exposure apparatus for exposing a substrate to light via a reticle. The apparatus includes a substrate stage configured to hold the substrate and to move, a projection optical system configured to project a pattern of the reticle onto the substrate, a flat plate having a surface whose height is substantially the same as that of the substrate held by the substrate stage and to move, a supply unit having a supply nozzle and configured to supply liquid through the supply nozzle to a gap formed between a final surface of the projection optical system and at least one of the substrate held by the substrate stage and the flat plate, a recovery unit having a recovery nozzle and configured to recover liquid filling the gap through the recovery nozzle, and a sensor arranged on the flat plate and configured to measure illuminance.

摘要翻译： 一种用于通过掩模版曝光衬底的曝光装置。 该装置包括：衬底台，其被配置为保持衬底并移动;投影光学系统，其被配置为将掩模版的图案投影到衬底上;平板，其具有与基板保持的基板的高度基本相同的表面 基板台并且移动，供应单元具有供应喷嘴并且被配置为将液体通过供应喷嘴供应到形成在投影光学系统的最终表面之间的间隙和由基板台保持的至少一个基板和 平板，具有回收喷嘴的回收单元，其构造成回收通过回收喷嘴填充间隙的液体;以及布置在平板上并被配置成测量照度的传感器。

公开(公告)号：US20080170211A1

公开(公告)日：2008-07-17

申请号：US12054600

申请日：2008-03-25

申请人： Hitoshi Nakano

发明人： Hitoshi Nakano

IPC分类号： G03B27/52 ,  G03F7/00

CPC分类号： G03F7/70341

摘要： An exposure apparatus which has a projection optical system configured to project light from a reticle to a substrate to expose the substrate to light, with a first gap between a final surface of the projection optical system and the substrate being filled with liquid. A substrate stage is configured to hold the substrate and to be moved to position the substrate, a plate has a surface substantially flush with a surface of the substrate held by the substrate stage and configured to be moved independently of the substrate stage, a supply nozzle is configured to supply the liquid, the liquid being supplied to the first gap via the supply nozzle during exposure of the substrate to light, and a recovery nozzle is configured to recover the liquid, the liquid being recovered from the first gap via the recovery nozzle during exposure of the substrate to light. The supply nozzle supplies the liquid to and the recovery nozzle recovers the liquid from, simultaneously, a second gap between the final surface and the plate positioned opposite to the final surface.

摘要翻译： 一种曝光装置，具有投影光学系统，该投影光学系统被构造成将来自掩模版的光投射到基板，以将投影光学系统的最终表面与衬底之间的第一间隙充满液体，使基板曝光。 衬底台被配置为保持衬底并移动以定位衬底，板具有与由衬底台保持的衬底的表面基本齐平的表面，并且被配置为独立于衬底台移动供给喷嘴 被配置为在将基板暴露于光的过程中经由供给喷嘴将液体供给到第一间隙，并且回收喷嘴构造成回收液体，液体经由回收喷嘴从第一间隙回收 在将基板曝光于光时。 供应喷嘴将液体供应到回收喷嘴，并且回收喷嘴从最终表面和与最终表面相对定位的板之间的第二间隙同时回收液体。

公开(公告)号：US07349064B2

公开(公告)日：2008-03-25

申请号：US10872513

申请日：2004-06-22

申请人： Hitoshi Nakano

发明人： Hitoshi Nakano

IPC分类号： G03B27/52 ,  G03B27/42 ,  G03B27/58

CPC分类号： G03F7/70341

摘要： An exposure apparatus having a projection optical system configured to project a pattern of an original to a substrate and exposing a substrate to light via the original with a gap between the substrate and the projection optical system being filled with liquid. The apparatus includes a substrate stage configured to hold the substrate and to move, a supply nozzle configured to supply the liquid to the gap between the substrate and the projection optical system, the supply nozzle entirely surrounding the projection optical system, and a recovery nozzle arranged outside the supply nozzle and configured to recover the liquid from the gap, the recovery nozzle entirely surrounding said supply nozzle.

摘要翻译： 一种具有投影光学系统的曝光装置，其配置为将原稿的图案投影到基板，并且在基板和投影光学系统之间具有间隙的情况下经由原稿将基板暴露于光，而填充有液体。 该装置包括：基板台，其被构造成保持基板并移动;供给喷嘴，其构造成将液体供应到基板和投影光学系统之间的间隙;整个包围投影光学系统的供应喷嘴;以及布置成 在供应喷嘴外部并且构造成从间隙回收液体，回收喷嘴完全围绕所述供应喷嘴。

公开(公告)号：US20070229784A1

公开(公告)日：2007-10-04

申请号：US11760081

申请日：2007-06-08

申请人： Hitoshi Nakano

发明人： Hitoshi Nakano

IPC分类号： G03B27/52

CPC分类号： G03F7/70341

摘要： It is an object of this invention to provide an exposure technique which uses immersion method and is highly practical. For example, an exposure apparatus includes a substrate stage which holds and moves a substrate, and a supply unit which has a supply nozzle and supplies a liquid to the surface of the substrate. The opening of the supply nozzle is arranged at a side of a projection optical system so as to oppose the substrate, and the supply unit supplies the liquid in accordance with movement of the substrate by the substrate stage.

公开(公告)号：US20070119131A1

公开(公告)日：2007-05-31

申请号：US11668666

申请日：2007-01-30

申请人： Hitoshi Nakano ,  Kiyoshi Arakawa

发明人： Hitoshi Nakano ,  Kiyoshi Arakawa

IPC分类号： B01D50/00

CPC分类号： B01D46/12 ,  B01D46/0036 ,  B01D46/521 ,  B01D53/0438 ,  B01D53/0446 ,  B01D53/0454 ,  B01D2253/102 ,  B01D2253/206 ,  B01D2253/3425 ,  B01D2257/30 ,  B01D2257/70 ,  B01D2258/0216 ,  B01D2267/40 ,  F24F3/161 ,  F24F2003/1621 ,  G03F7/70858 ,  G03F7/70916

摘要： Disclosed is a semiconductor exposure apparatus which includes a chamber for accommodating therein a main unit of the exposure apparatus, a gas controlling unit for controlling a gas in the chamber, a chemical filter for attracting a chemical substance in a controlling gas, and a dust removing filter for catching a dust particle in a controlling gas, wherein a gas blowing area of the chemical filter is smaller than that of the dust removing filter, wherein said chemical filter and said dust removing filter are disposed separately from each other. The chemical filter is mounted obliquely with respect to a direction of flow of a supplied gas. A gas rectifying device is disposed at a gas inlet side of the chemical filter and the dust removing filter. The chemical filter can he a pleat filter, and it is mounted so that the pleat thereof is orthogonal to the direction of flow of the supplied air.

摘要翻译： 公开了一种半导体曝光装置，其包括容纳曝光装置的主单元的室，用于控制室内的气体的气体控制单元，用于吸附控制气体中的化学物质的化学过滤器，以及除尘 用于捕获控制气体中的尘埃颗粒的过滤器，其中所述化学过滤器的气体吹入区域小于所述除尘过滤器的气体吹送区域，其中所述化学过滤器和所述除尘过滤器彼此分开设置。 化学过滤器相对于供应气体的流动方向倾斜地安装。 气体整流装置设置在化学过滤器和除尘过滤器的气体入口侧。 化学过滤器可以是褶式过滤器，并且其安装成使得其褶皱与供应空气的流动方向正交。

公开(公告)号：US20060033893A1

公开(公告)日：2006-02-16

申请号：US10976848

申请日：2004-11-01

申请人： Hitoshi Nakano

发明人： Hitoshi Nakano

IPC分类号： G03B27/52

CPC分类号： G03F7/70933

摘要： An atmosphere control technique for an exposure apparatus. An exposure apparatus to which this technique is applied includes, for example, a chamber which contains a space through which exposure light passes, a circulation system which has a path and circulates an inert gas through the path and the chamber, at least one valve provided in the path, a supply system which has a supply port at one end of a zone of the path defined by the at least one valve and supplies an inert gas to the supply port, and an exhaust system which has an exhaust port at the other end of the zone and exhausts a gas from the exhaust port.

公开(公告)号：US06665046B2

公开(公告)日：2003-12-16

申请号：US09879912

申请日：2001-06-14

申请人： Hideki Nogawa ,  Hitoshi Nakano

发明人： Hideki Nogawa ,  Hitoshi Nakano

IPC分类号： G03B2752

CPC分类号： G03F7/70933 ,  G03F7/70525 ,  G03F7/70866 ,  G03F7/70883

摘要： A scan type exposure apparatus for transferring an image of a pattern formed on a mask onto a substrate by synchronously scanning the mask and the substrate in a scanning direction. The apparatus includes a movable stage for holding a substrate thereon, an optical system through which an exposure light path extends, a cover member for encircling the exposure light path, from an end of the optical system toward the stage, and a gas supplying port for discharging an inactive gas into the cover member, wherein the gas is supplied at a predetermined angle with respect to the scan direction.

摘要翻译： 一种扫描型曝光装置，用于通过沿扫描方向同步扫描掩模和基板，将形成在掩模上的图案的图像转印到基板上。 该装置包括：用于保持基板的可移动台，曝光光路延伸穿过的光学系统，用于环绕曝光光路的盖构件，从光学系统的端部朝向平台;以及气体供给口，用于 将惰性气体排放到盖构件中，其中气体相对于扫描方向以预定角度被供应。