Exposure system and method for manufacturing device
    4.
    发明授权
    Exposure system and method for manufacturing device 失效
    曝光系统及其制造方法

    公开(公告)号:US07106414B2

    公开(公告)日:2006-09-12

    申请号:US10969971

    申请日:2004-10-22

    IPC分类号: G03B27/42 G03B27/52 G03B27/32

    摘要: An exposure system is provided which can maintain a predetermined performance of the exposure apparatus stably by maintaining a cooling capacity by preventing a negative pressure from being generated in a circulation path of the liquid and preventing the back pressure from increasing even if at least a part of a temperature adjusting device is disposed under a disposition surface of the exposure apparatus due to the disposition area. A sealed tank which stores the cooling agent which is circulated in the circuiting systems and a pump, etc., which circulates the cooling agent are disposed under the disposition surface FL of the exposure system. The reticle stage and the wafer stage which are objects of which the temperature is supposed to be controlled are disposed above the disposition surface FL. A tank which open to air is provided so as to prevent the negative pressure from being generated in the reticle stage, etc. such that the tank and the tank are connected by a connecting piping arrangement. Also, the piping arrangement which eliminates the bubbles which are contained in the cooling agent which is circulated in the circulating systems are connected to the circulating systems.

    摘要翻译: 提供一种曝光系统,其可以通过防止在液体的循环路径中产生负压并通过保持冷却能力来稳定地保持曝光装置的预定性能,并且即使在至少一部分 温度调节装置由于配置区域而设置在曝光装置的配置表面下。 储存在循环系统中循环的冷却剂的密封罐和循环冷却剂的泵等设置在曝光系统的配置面FL的下方。 作为温度被控制的对象的标线片台和晶片台设置在配置面FL上方。 设置有开放空气的罐,以防止在标线片等中产生负压,使得罐和罐通过连接配管装置连接。 此外,消除在循环系统中循环的冷却剂中包含的气泡的管道装置连接到循环系统。

    Exposure system and method for manufacturing device
    5.
    发明申请
    Exposure system and method for manufacturing device 失效
    曝光系统及其制造方法

    公开(公告)号:US20050140946A1

    公开(公告)日:2005-06-30

    申请号:US10969971

    申请日:2004-10-22

    IPC分类号: G03F7/20 G03B27/52

    摘要: An exposure system is provided which can maintain a predetermined performance of the exposure apparatus stably by maintaining a cooling capacity by preventing a negative pressure from being generated in a circulation path of the liquid and preventing the back pressure from increasing even if at least a part of a temperature adjusting device is disposed under a disposition surface of the exposure apparatus due to the disposition area. A sealed tank which stores the cooling agent which is circulated in the circuiting systems and a pump, etc., which circulates the cooling agent are disposed under the disposition surface FL of the exposure system. The reticle stage and the wafer stage which are objects of which the temperature is supposed to be controlled are disposed above the disposition surface FL. A tank which open to air is provided so as to prevent the negative pressure from being generated in the reticle stage, etc. such that the tank and the tank are connected by a connecting piping arrangement. Also, the piping arrangement which eliminates the bubbles which are contained in the cooling agent which is circulated in the circulating systems are connected to the circulating systems.

    摘要翻译: 提供一种曝光系统,其可以通过防止在液体的循环路径中产生负压并通过保持冷却能力来稳定地保持曝光装置的预定性能,并且即使在至少一部分 温度调节装置由于配置区域而设置在曝光装置的配置表面下。 储存在循环系统中循环的冷却剂的密封罐和循环冷却剂的泵等设置在曝光系统的配置面FL的下方。 作为温度被控制的对象的标线片台和晶片台设置在配置面FL上方。 设置有开放空气的罐,以防止在标线片等中产生负压,使得罐和罐通过连接配管装置连接。 此外,消除在循环系统中循环的冷却剂中包含的气泡的管道装置连接到循环系统。