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公开(公告)号：US07816471B2
公开(公告)日：2010-10-19
申请号：US12645842
申请日：2009-12-23
IPC分类号： C08F124/00
CPC分类号： C08F220/18 , C08F6/00 , C08F6/02 , C08F6/06 , G03F7/0397
摘要： Process for producing photoresist polymeric compound having repeated units corresponding to at least one monomer selected from monomer (a) having lactone skeleton, monomer (b) having group which becomes soluble in alkali by elimination with acid, and monomer (c) having alicyclic skeleton having hydroxyl group. Process includes (A) polymerizing mixture of monomers containing at least one monomer selected from the above monomers (a), (b), and (c), and (B) extracting polymer formed in the polymerization by using organic solvent and water to partition the formed polymer into organic solvent layer and metal component impurity into aqueous layer, or passing polymer solution, which contains polymer having repeated units corresponding to at least one of the above monomers (a), (b), and (c) and metal content of which is 1000 ppb by weight or less relative to the polymer through filter comprising porous polyolefin membrane having cation-exchange group. The photoresist polymeric compounds have a metallic impurity content that is extremely low.
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公开(公告)号：US07662897B2
公开(公告)日：2010-02-16
申请号：US11335580
申请日：2006-01-20
IPC分类号： C08F124/00
CPC分类号： C08F220/18 , C08F6/00 , C08F6/02 , C08F6/06 , G03F7/0397
摘要： Process for producing photoresist polymeric compound having repeated units corresponding to at least one monomer selected from monomer (a) having lactone skeleton, monomer (b) having group which becomes soluble in alkali by elimination with acid, and monomer (c) having alicyclic skeleton having hydroxyl group. Process includes (A) polymerizing mixture of monomers containing at least one monomer selected from the above monomers (a), (b), and (c), and (B) extracting polymer formed in the polymerization by using organic solvent and water to partition the formed polymer into organic solvent layer and metal component impurity into aqueous layer, or passing polymer solution, which contains polymer having repeated units corresponding to at least one of the above monomers (a), (b), and (c) and metal content of which is 1000 ppb by weight or less relative to the polymer through filter comprising porous polyolefin membrane having cation-exchange group. The photoresist polymeric compounds have a metallic impurity content that is extremely low.
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公开(公告)号：US07655743B2
公开(公告)日：2010-02-02
申请号：US12146594
申请日：2008-06-26
IPC分类号： C08F124/00
CPC分类号： C08F220/18 , C08F6/00 , C08F6/02 , C08F6/06 , G03F7/0397
摘要： Process for producing photoresist polymeric compound having repeated units corresponding to at least one monomer selected from monomer (a) having lactone skeleton, monomer (b) having group which becomes soluble in alkali by elimination with acid, and monomer (c) having alicyclic skeleton having hydroxyl group. Process includes (A) polymerizing mixture of monomers containing at least one monomer selected from the above monomers (a), (b), and (c), and (B) extracting polymer formed in the polymerization by using organic solvent and water to partition the formed polymer into organic solvent layer and metal component impurity into aqueous layer, or passing polymer solution, which contains polymer having repeated units corresponding to at least one of the above monomers (a), (b), and (c) and metal content of which is 1000 ppb by weight or less relative to the polymer through filter comprising porous polyolefin membrane having cation-exchange group. The photoresist polymeric compounds have a metallic impurity content that is extremely low.
摘要翻译： 具有对应于选自具有内酯骨架的单体（a）的单体的重复单元的反应单元的光致抗蚀剂聚合物的制造方法，具有通过用酸去除而变得易溶于碱的单体（b）和具有脂环族骨架的单体（c）具有 羟基。 方法包括（A）含有至少一种选自上述单体（a），（b）和（c）的单体的单体的混合物的聚合，和（B）通过使用有机溶剂和水来分离聚合中形成的聚合物 将形成的聚合物转化为有机溶剂层和金属组分杂质进入水层或通过聚合物溶液，其含有具有对应于上述单体（a），（b）和（c）中的至少一种的重复单元的聚合物和金属含量 其相对于包含具有阳离子交换基团的多孔聚烯烃膜的聚合物通过过滤器为1000ppb或更小。 光致抗蚀剂聚合物的金属杂质含量极低。
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公开(公告)号：US20060116493A1
公开(公告)日：2006-06-01
申请号：US11335580
申请日：2006-01-20
IPC分类号： C08F24/00
CPC分类号： C08F220/18 , C08F6/00 , C08F6/02 , C08F6/06 , G03F7/0397
摘要： Process for producing photoresist polymeric compound having repeated units corresponding to at least one monomer selected from monomer (a) having lactone skeleton, monomer (b) having group which becomes soluble in alkali by elimination with acid, and monomer (c) having alicyclic skeleton having hydroxyl group. Process includes (A) polymerizing mixture of monomers containing at least one monomer selected from the above monomers (a), (b), and (c), and (B) extracting polymer formed in the polymerization by using organic solvent and water to partition the formed polymer into organic solvent layer and metal component impurity into aqueous layer, or passing polymer solution, which contains polymer having repeated units corresponding to at least one of the above monomers (a), (b), and (c) and metal content of which is 1000 ppb by weight or less relative to the polymer through filter comprising porous polyolefin membrane having cation-exchange group. The photoresist polymeric compounds have a metallic impurity content that is extremely low.
摘要翻译： 具有对应于选自具有内酯骨架的单体（a）的单体的重复单元的反应单元的光致抗蚀剂聚合物的制造方法，具有通过用酸去除而变得易溶于碱的单体（b）和具有脂环族骨架的单体（c）具有 羟基。 方法包括（A）含有至少一种选自上述单体（a），（b）和（c）的单体的单体的混合物的聚合，和（B）通过使用有机溶剂和水来分离聚合中形成的聚合物 将形成的聚合物转化为有机溶剂层和金属组分杂质进入水层或通过聚合物溶液，其含有具有对应于上述单体（a），（b）和（c）中的至少一种的重复单元的聚合物和金属含量 其相对于包含具有阳离子交换基团的多孔聚烯烃膜的聚合物通过过滤器为1000ppb以下。 光致抗蚀剂聚合物的金属杂质含量极低。
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公开(公告)号：US20050100815A1
公开(公告)日：2005-05-12
申请号：US10476211
申请日：2003-03-14
CPC分类号： C08F220/18 , C08F6/00 , C08F6/02 , C08F6/06 , G03F7/0397
摘要： The process for producing a photoresist polymeric compound of the present invention is characterized by a process for producing a photoresist polymeric compound having a repeated unit corresponding to at least one monomer selected from a monomer (a) having a lactone skeleton, a monomer (b) having a group which becomes soluble in alkali by elimination with an acid and a monomer (c) having an alicyclic skeleton having a hydroxyl group, wherein the process comprises the step of; (i) the polymerization step (A) polymerizing a mixture of monomers containing at least one monomer selected from the above monomers (a), (b) and (c), and the extraction step (B) of extracting a polymer formed in the polymerization by using an organic solvent and water to partition the formed polymer into an organic solvent layer and a metal component as an impurity into an aqueous layer, or (ii) the step (I) passing a polymer solution, which contains a polymer having a repeated unit corresponding to at least one of the above monomers (a), (b) and (c), and a metal content of which is 1000 ppb by weight or less relative to the polymer, through a filter comprising a porous polyolefin membrane having cation-exchange group. The method of the present invention can efficiently provide a photoresist polymeric compound having an impurity content such as metal of extremely low.
摘要翻译： 制备本发明的光致抗蚀剂聚合物的方法的特征在于一种制备光致抗蚀剂聚合物的方法，其具有对应于至少一种选自具有内酯骨架的单体（a），单体（b） 具有通过用酸去除碱溶性的基团和具有羟基的脂环骨架的单体（c），其中该方法包括以下步骤： （i）聚合步骤（A）聚合含有至少一种选自上述单体（a），（b）和（c）的单体的单体的混合物和提取步骤（B） 通过使用有机溶剂和水将形成的聚合物分解成有机溶剂层和作为杂质的金属组分进入水层进行聚合，或（ii）通过聚合物溶液的步骤（I），所述聚合物溶液含有具有 对应于上述单体（a），（b）和（c）中的至少一种的重复单元，其金属含量相对于聚合物为1000ppb以下，通过包含多孔聚烯烃膜的过滤器，所述多孔聚烯烃膜具有 阳离子交换基团。 本发明的方法可以有效地提供具有非常低的金属杂质含量的光致抗蚀剂聚合物。
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公开(公告)号：US07015291B2
公开(公告)日：2006-03-21
申请号：US10476211
申请日：2003-03-14
IPC分类号： C08F124/00
CPC分类号： C08F220/18 , C08F6/00 , C08F6/02 , C08F6/06 , G03F7/0397
摘要： Process for producing photoresist polymeric compound having repeated units corresponding to at least one monomer selected from monomer (a) having lactone skeleton, monomer (b) having group which becomes soluble in alkali by elimination with acid, and monomer (c) having alicyclic skeleton having hydroxyl group. Process includes (A) polymerizing mixture of monomers containing at least one monomer selected from the above monomers (a), (b), and (c), and (B) extracting polymer formed in the polymerization by using organic solvent and water to partition the formed polymer into organic solvent layer and metal component impurity into aqueous layer, or passing polymer solution, which contains polymer having repeated units corresponding to at least one of the above monomers (a), (b), and (c) and metal content of which is 1000 ppb by weight or less relative to the polymer through filter comprising porous polyolefin membrane having cation-exchange group. The photoresist polymeric compounds have a metallic impurity content that is extremely low.
摘要翻译： 具有对应于选自具有内酯骨架的单体（a）的单体的重复单元的反应单元的光致抗蚀剂聚合物的制造方法，具有通过用酸去除而变得易溶于碱的单体（b）和具有脂环族骨架的单体（c）具有 羟基。 方法包括（A）含有至少一种选自上述单体（a），（b）和（c）的单体的单体的混合物的聚合，和（B）通过使用有机溶剂和水来分离聚合中形成的聚合物 将形成的聚合物转化为有机溶剂层和金属组分杂质进入水层或通过聚合物溶液，其含有具有对应于上述单体（a），（b）和（c）中的至少一种的重复单元的聚合物和金属含量 其相对于包含具有阳离子交换基团的多孔聚烯烃膜的聚合物通过过滤器为1000ppb以下。 光致抗蚀剂聚合物的金属杂质含量极低。
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公开(公告)号：US20060116494A1
公开(公告)日：2006-06-01
申请号：US11335589
申请日：2006-01-20
IPC分类号： C08F24/00
CPC分类号： C08F220/18 , C08F6/00 , C08F6/02 , C08F6/06 , G03F7/0397
摘要： Process for producing photoresist polymeric compound having repeated units corresponding to at least one monomer selected from monomer (a) having lactone skeleton, monomer (b) having group which becomes soluble in alkali by elimination with acid, and monomer (c) having alicyclic skeleton having hydroxyl group. Process includes (A) polymerizing mixture of monomers containing at least one monomer selected from the above monomers (a), (b), and (c), and (B) extracting polymer formed in the polymerization by using organic solvent and water to partition the formed polymer into organic solvent layer and metal component impurity into aqueous layer, or passing polymer solution, which contains polymer having repeated units corresponding to at least one of the above monomers (a), (b), and (c) and metal content of which is 1000 ppb by weight or less relative to the polymer through filter comprising porous polyolefin membrane having cation-exchange group. The photoresist polymeric compounds have a metallic impurity content that is extremely low.
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公开(公告)号：US08771248B2
公开(公告)日：2014-07-08
申请号：US12663808
申请日：2008-06-10
申请人： Hitoshi Watanabe , Hideki Kondo
发明人： Hitoshi Watanabe , Hideki Kondo
CPC分类号： A61F13/2062 , A61F13/206 , A61F13/2065 , A61F13/2085 , A61F13/34 , Y10S604/904
摘要： It is intended to provide a tampon wherein a string-shaped member is bonded to a cylindrical absorbent in the state of not being exposed on the absorbent surface. A tampon comprising an absorbent (2), which is obtained by molding a sheet member into a cylindrical shape, and a string-shaped member (4) which is bonded to the absorbent (2) and extends from one end of the absorbent (2). The string-shaped member (4) has a first string part which is bonded along the first direction of one face of the sheet member constituting the absorbent (2) and a second string part which extends from the sheet member. A first folding part is formed in one side of the second direction that is perpendicular to the first direction of the first string member, while a second folding part is formed in the other side of the second direction. Owing to this constitution, the absorbent (2) is deformed by bending respectively from the first folding part and the second folding part and thus molded into a cylindrical shape from which the first string part is not exposed.
摘要翻译： 旨在提供一种止血塞，其中在不暴露在吸收性表面上的状态下，将线状构件结合到圆柱形吸收体。 一种棉塞，其包括通过将片状部件成型为圆筒形而获得的吸收体（2）和与吸收体（2）接合并从吸收体（2）的一端延伸的线状部件 ）。 线状构件（4）具有沿着构成吸收体（2）的片状构件的一面的第一方向的第一串部和从片状部件延伸的第二线部。 第一折叠部分形成在垂直于第一绳构件的第一方向的第二方向的一侧，而第二折叠部分形成在第二方向的另一侧。 由于这种结构，吸收体（2）通过分别从第一折叠部分和第二折叠部分弯曲变形，并且因此被模制成圆柱形状，第一弦部分不暴露于其中。
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公开(公告)号：US08381907B2
公开(公告)日：2013-02-26
申请号：US12595169
申请日：2008-04-08
申请人： Hideki Kondo , Masashi Hosokawa , Hitoshi Watanabe
发明人： Hideki Kondo , Masashi Hosokawa , Hitoshi Watanabe
IPC分类号： B65D33/00 , A61F13/551
CPC分类号： B65D75/5827 , A61F13/551 , A61F13/55175 , A61F13/55185 , A61F15/003
摘要： An individual package of sanitary tampon that can be easily opened and can avoid any unintended seal breakage while being carried. The individual package of tampon comprises a vertically long, flat bag body made of a sheet-shaped member and a tampon with applicator individually enclosed in the bag body. The individual package further comprises a seal breaking part with one or more cut portions provided continuously or intermittently along a given direction of the sheet-shaped member and a buffer structure part provided on one side or both sides of the seal breaking part in the seal breaking direction. The buffer structure part has a slack portion formed by slacking the sheet-shaped member.
摘要翻译： 卫生棉塞的单个包装，可以方便地打开，并可以在携带时避免任何意外的密封破损。 单个棉条包括由片状构件制成的垂直长的扁平袋体和具有单独封闭在袋体内的涂抹器的棉塞。 单个包装还包括具有沿着片状构件的给定方向连续或间歇地设置的一个或多个切割部分的密封断裂部分和设置在密封断裂部分中的密封断裂部分的一侧或两侧上的缓冲结构部分 方向。 缓冲结构部分具有通过松弛片状构件形成的松弛部分。
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10.发明授权Optical film, its manufacturing method, anti-glare polarizer using the same, and display apparatus 有权光学膜，其制造方法，使用其的防眩偏振片和显示装置公开(公告)号：US08325418B2
公开(公告)日：2012-12-04
申请号：US12520946
申请日：2008-06-20
IPC分类号： G02B5/30
CPC分类号： G02B1/118 , G02B5/0226 , G02B5/0268 , G02B5/0278 , G02B5/3025 , Y10T428/24479
摘要： An anti-glare film is provided and includes micro concave/convex portions on a surface. An average interval between the micro concave and convex portions is equal to 300 μm or less. A differentiation with respect to angle d{Log(I(α))}/dα of a logarithm intensity of reflection Log(I(α)) in a direction of a deviation angle α from a direction of specular reflection has an extreme value. A differentiation d{Log(P(β)}/dβ of a histogram P(β) to an inclination angle β of the micro concave/convex portions has an extreme value. In the anti-glare film 1, a value C(2.0) of transmitted image clarity measured by using an optical comb of a comb width of 2 mm in accordance with JIS-K7105 is equal to 30% or more, and a ratio C(0.125)/C(2.0) of the value C(2.0) measured by using the optical comb of the comb width of 2 mm and a value C(0.125) measured by using an optical comb having a comb width of 0.125 mm is equal to 0.1 or more.
摘要翻译： 提供防眩膜并且在表面上包括微凹部/凸部。 微凹凸部之间的平均间隔为300μm以下。 在与镜面反射方向的偏离角α的方向上的反射Log（I（α））的对数强度Log（I（α））} /dα的角度d {Log（I（α））/dα的区别具有极值。 直方图P（＆bgr）与微凹凸部的倾斜角度bgr的微分d {Log（P（＆bgr;）} / d＆bgr）具有极值，在防眩光膜1中， 通过使用根据JIS-K7105的梳子宽度为2mm的光梳测量的透射图像清晰度的值C（2.0）等于或大于30％，并且C（0.125）/ C（2.0） 通过使用梳宽度为2mm的光梳测量的值C（2.0）和通过使用梳宽为0.125mm的光梳测量的值C（0.125）等于或大于0.1。
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