摘要:
A method of manufacturing a magnetic recording medium comprises steps of providing a non-magnetic substrate having at least one surface; forming a layer of a sol-gel on the surface, partially drying the sol-gel layer at room temperature to remove a portion of the solvent therein to form a partially dried sol-gel layer of hardness less than that of the substrate; mechanically texturing the surface of the partially dried sol-gel layer; and depositing a layer stack including at least one magnetic layer thereover. Embodiments of the invention include embossing a servo pattern in the as-deposited sol-gel layer prior to partial drying and mechanically texturing, followed by sintering at an elevated temperature to form a substantially fully dried layer having a density and hardness similar to that of glass, and formation of a thin film magnetic media layer stack thereon.
摘要:
A method of manufacturing a magnetic recording medium comprises steps of providing a non-magnetic substrate having at least one surface; forming a layer of a sol-gel on the surface, partially drying the sol-gel layer at room temperature to remove a portion of the solvent therein to form a partially dried sol-gel layer of hardness less than that of the substrate; mechanically texturing the surface of the partially dried sol-gel layer; and depositing a layer stack including at least one magnetic layer thereover. Embodiments of the invention include embossing a servo pattern in the as-deposited sol-gel layer prior to partial drying and mechanically texturing, followed by sintering at an elevated temperature to form a substantially fully dried layer having a density and hardness similar to that of glass, and formation of a thin film magnetic media layer stack thereon.
摘要:
Embodiments of the invention generally provide an electron beam substrate processing system. In one embodiment, the present invention provides an electron beam substrate processing system where a spindle shaft used to rotate substrates during processing includes two encoder wheels. One encoder wheel is configured to provide a rotational speed data signal to a rotational speed control system. Another encoder wheel is configured to provide a pattern generator clock signal at a higher frequency than the rotational speed data signal to a pattern generator. In one embodiment of the present invention, at least one of the encoder wheels is positioned adjacent the substrate to minimize torsional and differential movements between the at least one encoder wheel and the substrate.
摘要:
A polarization detection system structured for optical read-out of disc-shaped optical data/information storage and retrieval media with surfaces comprised of pits or marks configured as multilevel oriented nano-structures (ONS) with varying pit or mark orientations and widths. The polarization detection system comprises: an optical beam source; a stage for mounting and rotating an optical disc medium about a central axis; at least one photodetector; a beam splitter positioned in an optical path between the source and stage, for directing an incident beam from the source onto an optical disc mounted on the stage and a return beam from the disc onto the photodetector; and an optical polarizer positioned in an optical path between the beam splitter and the at least one photodetector, for detection and analysis of changes in polarization of the return beam effected by variation of the orientation of the walls and/or widths of the pits or marks of the disc.
摘要:
A method of performing writable optical recording of a medium to form multilevel oriented nano-structures therein, comprises steps of providing a disc-shaped, writable recording medium having a planar surface; and encoding data/information in the medium by forming a plurality of multilevel nano-structured pits in the surface by scanning with a focused spot of optical energy to form at least one data track therein, including scanning the optical spot in a cross-track direction while rotating the disc about a central axis.
摘要:
Embodiments of the invention generally provide an electron beam substrate processing system. In one embodiment, the present invention provides an electron beam substrate processing system where a spindle shaft used to rotate substrates during processing includes at least one optical encoder wheel assembly. The optical encoder wheel assembly is configured to provide rotational speed data signal to a rotational speed control system and a pattern generation clock circuit configured to a provide a corrected pattern generator clock signal to a pattern generator circuit. The pattern generation circuit is used to control modulation of an electron beam used for substrate processing. In one aspect of the present invention, repeatable deviations of the rotational speed are measured and processed during substrate processing to correct for such repeatable deviations to increase substrate pattern writing accuracy.
摘要:
An apparatus for and method of writing multiple radial locations during a single rotation by deflection and modulation of a recording beam, employs an electron beam with a width that is narrower than a radial width of the exposure pattern. Instead of employing multiple exposure passes, with each offset from the other by a certain radial distance, the apparatus performs the write of the pattern in a single pass. During this single pass, controlled by a single rotation of the turntable on which the disk recording medium is located, the electron beam is deflected in a radial direction by a required amount and modulated in synchronization with the radial deflection. This synchronization of the beam modulation with the beam deflection allows a plurality of tracks to be written or exposed in a single pass.
摘要:
Embodiments of the invention generally provide an electron beam substrate processing system. In one embodiment, the present invention provides an electron beam substrate processing system where a spindle shaft used to rotate substrates during processing includes at least one optical encoder wheel assembly. The optical encoder wheel assembly is configured to provide rotational speed data signal to a rotational speed control system and a pattern generation clock circuit configured to a provide an angular pattern generator clock signal and to a pattern generator circuit. The pattern generation circuit is configured to control modulation of an electron beam used for substrate processing. In one aspect of the present invention, while the spindle shaft is rotated at a constant linear velocity, the pattern generation circuit controls the modulation of an electron beam such that written mark lengths are sized to be about constant in angular dimension.
摘要:
Embodiments of the invention generally provide an electron beam substrate processing system. In one embodiment, the present invention provides an electron beam substrate processing system where a spindle shaft used to rotate substrates during processing includes at least one optical encoder wheel assembly. The optical encoder wheel assembly is configured to provide rotational speed data signal to a rotational speed control system and a pattern generation clock circuit configured to a provide an angular pattern generator clock signal and to a pattern generator circuit. The pattern generation circuit is configured to control modulation of an electron beam used for substrate processing. In one aspect of the present invention, while the spindle shaft is rotated at a constant linear velocity, the pattern generation circuit controls the modulation of an electron beam such that written mark lengths are sized to be about constant in angular dimension.
摘要:
Embodiments of the invention generally provide an electron beam substrate processing system. In one embodiment, the present invention provides an electron beam substrate processing system where a spindle shaft used to rotate substrates during processing includes at least one optical encoder wheel assembly. The optical encoder wheel assembly is configured to provide rotational speed data signal to a rotational speed control system and a pattern generation clock circuit configured to a provide a corrected pattern generator clock signal to a pattern generator circuit. The pattern generation circuit is used to control modulation of an electron beam used for substrate processing. In one aspect of the present invention, repeatable deviations of the rotational speed are measured and processed during substrate processing to correct for such repeatable deviations to increase substrate pattern writing accuracy.