公开(公告)号：US3562536A

公开(公告)日：1971-02-09

申请号：US3562536D

申请日：1968-08-30

Applicant: IBM

Inventor： BRUNNER ROLF H ,  WOODARD OLLIE C

IPC: G06K7/10 ,  G06K9/18 ,  H01L23/544 ,  G08C9/06

CPC classification number: G06K7/10871 ,  G06K9/183 ,  H01L23/544 ,  H01L2223/54413 ,  H01L2223/54453 ,  H01L2223/5446 ,  H01L2924/0002 ,  H01L2924/00

Abstract: Placement of coded indicia as etched lines in the kerf area of a semiconductor wafer. Scanning and image rotation are used to read out the indicia, which may be binary or frequency coded. Placement of the etched lines at a different angle from the circuit lines allows illumination of the etched lines with minimum interference from the circuit lines.

公开(公告)号：US3466514A

公开(公告)日：1969-09-09

申请号：US3466514D

申请日：1967-06-26

Applicant: IBM

Inventor： BRUNNER ROLF H ,  WEBER EDWARD V

IPC: B23Q1/48 ,  H01L21/68 ,  H02P1/54 ,  H02P5/46 ,  H02P7/68

CPC classification number: B23Q1/4866 ,  H01L21/681

公开(公告)号：US3921572A

公开(公告)日：1975-11-25

申请号：US44519974

申请日：1974-02-25

Applicant: IBM

Inventor： BRUNNER ROLF H ,  CARBONE QUIEDO J ,  LESTER WILLIAM C

IPC: C23C14/24 ,  C23C14/56 ,  H01L21/285 ,  C23C13/08

CPC classification number: C23C14/56

Abstract: Vacuum coating apparatus having isolatable coating and vacuum chambers whose volumes are correlated to each other to minimize contamination and pump-down time, with the coating chamber having a closure means mounting a substrate holder for positioning substrates in an evaporant stream from a vapor source contained in the vacuum chamber.

Abstract translation: 具有可分离的涂层和真空室的真空涂布装置，其体积彼此相关，以最小化污染和抽空时间，涂覆室具有封闭装置，该封闭装置安装用于将基板定位在蒸发源中的封闭装置， 真空室。

公开(公告)号：US3889632A

公开(公告)日：1975-06-17

申请号：US47500574

申请日：1974-05-31

Applicant: IBM

Inventor： BRUNNER ROLF H ,  LESTER WILLIAM C

IPC: B23K35/40 ,  C23C14/50 ,  H01L21/285 ,  C23C13/08

CPC classification number: C23C14/505

Abstract: A coating apparatus, such as for vacuum deposition, in which an access port, of a deposition chamber, is provided with a hatch door having mounted on its inner surface workpiece supports adapted for turning on two mutually perpendicular axii within a stream of coating material. Included is a modification in which a plurality of supports are concentrically orbited about a third axis with the coating stream.

Abstract translation: 一种用于真空沉积的涂覆装置，其中沉积室的进入端口设置有舱口门，该舱口门安装在其内表面上，适于在涂层材料流内转动两个相互垂直的轴线的工件支撑件。 包括的是一种修改，其中多个支撑体围绕第三轴同心地绕着涂层流动。