公开(公告)号：US3868271A

公开(公告)日：1975-02-25

申请号：US36962073

申请日：1973-06-13

Applicant: IBM

Inventor： POLEY NEIL M ,  WHITAKER HOWARD L

IPC: H01J17/02 ,  B08B11/04 ,  C03C23/00 ,  H01J17/16 ,  B08B3/00

CPC classification number: C03C23/0075

Abstract: An improved method of cleaning a glass substrate prior to evaporation of chrome metal electrodes upon it. The substrate is cleaned by the use of glow discharge in a wet active gas, preferably air or forming gas.

Abstract translation: 一种在铬金属电极蒸发之前清洁玻璃基板的改进方法。 通过在湿活性气体中使用辉光放电来清洗基板，优选空气或形成气体。

公开(公告)号：US3627663A

公开(公告)日：1971-12-14

申请号：US3627663D

申请日：1968-03-25

Applicant: IBM

Inventor： DAVIDSE PIETER D ,  WHITAKER HOWARD L

IPC: C23C14/35 ,  H01J37/34 ,  C23C15/00

CPC classification number: C23C14/35 ,  H01J37/34

Abstract: A substrate to be coated by RF sputtering is partially or completely surrounded by a target, which has a similarly shaped cathode surrounding and supporting the target. The target and the cathode may be formed of a pair of parallel plates or a hollow member. By controlling the pressure of the gas within the partially evacuated chamber in which at least the target is disposed and/or the spacing of the cathode plates or the size and geometrical configuration of the hollow member, a single common negative glow can be produced by either having the negative glow from the two parallel cathode plates overlap or touch each other or having a single negative glow within the hollow member.

公开(公告)号：US3437505A

公开(公告)日：1969-04-08

申请号：US3437505D

申请日：1965-06-28

Applicant: IBM

Inventor： NARKEN BERNT ,  WHITAKER HOWARD L

IPC: C03C17/04 ,  B01J8/42 ,  B05D1/24 ,  C23D5/00 ,  C23D5/04 ,  H01B3/08 ,  H01L23/31 ,  C23D3/00 ,  B44D1/34

CPC classification number: B05D1/24 ,  B01J8/42 ,  C23D5/00 ,  H01B3/088 ,  H01L23/3157 ,  H01L2924/0002 ,  H01L2924/19041 ,  H01L2924/00