公开(公告)号：US3924134A

公开(公告)日：1975-12-02

申请号：US52831274

申请日：1974-11-29

Applicant: IBM

Inventor： UMAN MYRON F ,  WINNARD JAMES R ,  WINTERS HAROLD F

IPC: H01J3/04 ,  H01J27/00 ,  H01J27/14 ,  H01J37/08 ,  H05H7/08 ,  G01T1/20

CPC classification number: H01J27/14 ,  H01J37/08

Abstract: The ion source is comprised of two discharge chambers one of which is provided with a filament and an aperture leading into the other chamber which in turn has an extraction orifice. A low voltage arc discharge is operated in an inert gas atmosphere in the filament chamber while an arc of higher voltage is operated in the second ionization chamber which contains a vapor which will give the desired dopant ion species. The entire source is immersed in an axial magnetic field parallel to a line connecting the filament, the aperture between the two chambers and the extraction orifice.

Abstract translation: 离子源包括两个放电室，其中一个放电室设置有灯丝和通向另一个室的孔，该另一个室又具有抽出孔。 在灯丝室中的惰性气体气氛中操作低电压电弧放电，而在第二离子化室中操作较高电压的电弧，该第二电离室包含将产生所需掺杂剂离子种类的蒸气。 整个源被浸入平行于连接灯丝，两个室之间的孔和提取孔的线的轴向磁场。