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Patent Agency Ranking
公开(公告)号：US3622309A
公开(公告)日：1971-11-23
申请号：US3622309D
申请日：1968-10-21
Applicant: IIT RES INST
Inventor： HILL VERNON L , NICHOLS HARRY R
IPC: C22C27/00
CPC classification number: C22C27/00 , Y10S420/903
Abstract: Hafnium tantalum alloy containing about 15 and about 35 weight percent tantalum, between about 0.03 and about 2.0 weight percent boron, and at least one additional alloying agent selected from chromium, silicon and aluminum.
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公开(公告)号：US3679494A
公开(公告)日：1972-07-25
申请号：US3679494D
申请日：1969-04-30
Applicant: IIT RES INST
Inventor： HILL VERNON L , NICHOLS HARRY R , HESS ALAN L
Abstract: IMPROVED ALLOYS OF HAFNIUM-TANTALUM SUITABLE FOR USE AS A CUTTING TOOL AND THE METHOD OF MAKING THE SAME. THE ALLOYS INCLUDE A NITRIDED CASE LAYER FORMED BY NITRIDING AT TEMPERATURES BETWEEN 2500*F. AND 4000*F. UNTIL THE NITRIDED LAYER IS AT LEAST 2 MILS THICK.
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公开(公告)号：US3622308A
公开(公告)日：1971-11-23
申请号：US3622308D
申请日：1968-10-21
Applicant: IIT RES INST
Inventor： HILL VERNON L , NICHOLS HARRY R
IPC: C22C27/00
CPC classification number: C22C27/00
Abstract: Hafnium base alloy containing between about 15 and about 35 weight percent tantalum and between about 2 and about 20 weight percent iridium. The alloy may also contain aluminum, silicon or chromium as additional alloying agents.
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公开(公告)号：US3446615A
公开(公告)日：1969-05-27
申请号：US3446615D
申请日：1967-05-11
Applicant: IIT RES INST
Inventor： HILL VERNON L , RAUSCH JOHN J , HESS ALAN L , THYNE RAY J VAN , NICHOLS HARRY R
CPC classification number: C23C24/106 , C22C28/00
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公开(公告)号：US3595644A
公开(公告)日：1971-07-27
申请号：US3595644D
申请日：1968-10-21
Applicant: IIT RES INST
Inventor： HILL VERNON L , NICHOLS HARRY R
Abstract: HAFNIUM BASE ALLOY CONTAINING BETWEEN ABOUT 15 AND ABOUT 35 WEIGHT PERCENT TANTALUM AND BETWEEN ABOUT 0.5 AND ABOUT 5 WEIGHT PERCENT CHROMIUM. THE ALLOY MAY CONTAIN UP TO ABOUT 3.5 WEIGHT PERCENT SILICON AND UP TO ABOUT 3.5 WEIGHT PERCENT ALUMINUM.
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