公开(公告)号：US3446615A

公开(公告)日：1969-05-27

申请号：US3446615D

申请日：1967-05-11

Applicant: IIT RES INST

Inventor： HILL VERNON L ,  RAUSCH JOHN J ,  HESS ALAN L ,  THYNE RAY J VAN ,  NICHOLS HARRY R

IPC: C22C28/00 ,  C23C24/10 ,  C22C31/00

CPC classification number: C23C24/106 ,  C22C28/00

公开(公告)号：US3595644A

公开(公告)日：1971-07-27

申请号：US3595644D

申请日：1968-10-21

Applicant: IIT RES INST

Inventor： HILL VERNON L ,  NICHOLS HARRY R

IPC: C22C27/00 ,  C22C28/00

CPC classification number: C22C28/00 ,  C22C27/00

Abstract: HAFNIUM BASE ALLOY CONTAINING BETWEEN ABOUT 15 AND ABOUT 35 WEIGHT PERCENT TANTALUM AND BETWEEN ABOUT 0.5 AND ABOUT 5 WEIGHT PERCENT CHROMIUM. THE ALLOY MAY CONTAIN UP TO ABOUT 3.5 WEIGHT PERCENT SILICON AND UP TO ABOUT 3.5 WEIGHT PERCENT ALUMINUM.

公开(公告)号：US3679494A

公开(公告)日：1972-07-25

申请号：US3679494D

申请日：1969-04-30

Applicant: IIT RES INST

Inventor： HILL VERNON L ,  NICHOLS HARRY R ,  HESS ALAN L

IPC: C22C27/00 ,  C23C8/24 ,  C23C11/14

CPC classification number: C23C8/24 ,  C22C27/00

Abstract: IMPROVED ALLOYS OF HAFNIUM-TANTALUM SUITABLE FOR USE AS A CUTTING TOOL AND THE METHOD OF MAKING THE SAME. THE ALLOYS INCLUDE A NITRIDED CASE LAYER FORMED BY NITRIDING AT TEMPERATURES BETWEEN 2500*F. AND 4000*F. UNTIL THE NITRIDED LAYER IS AT LEAST 2 MILS THICK.

公开(公告)号：US3622308A

公开(公告)日：1971-11-23

申请号：US3622308D

申请日：1968-10-21

Applicant: IIT RES INST

Inventor： HILL VERNON L ,  NICHOLS HARRY R

IPC: C22C27/00

CPC classification number: C22C27/00

Abstract: Hafnium base alloy containing between about 15 and about 35 weight percent tantalum and between about 2 and about 20 weight percent iridium. The alloy may also contain aluminum, silicon or chromium as additional alloying agents.

公开(公告)号：US3622309A

公开(公告)日：1971-11-23

申请号：US3622309D

申请日：1968-10-21

Applicant: IIT RES INST

Inventor： HILL VERNON L ,  NICHOLS HARRY R

IPC: C22C27/00

CPC classification number: C22C27/00 ,  Y10S420/903

Abstract: Hafnium tantalum alloy containing about 15 and about 35 weight percent tantalum, between about 0.03 and about 2.0 weight percent boron, and at least one additional alloying agent selected from chromium, silicon and aluminum.