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公开(公告)号：US20150155179A1
公开(公告)日：2015-06-04
申请号：US14560202
申请日：2014-12-04
Applicant: IMEC VZW
Inventor： Karolien Jans , Alexandra Dusa , Tim Stakenborg
IPC: H01L21/308 , H01L29/06
CPC classification number: H01L21/3085 , B81B2207/056 , B81C1/00206 , B82Y40/00 , G01N33/487 , H01L21/3086 , H01L21/32 , H01L21/32051 , H01L29/06
Abstract: A method for creating a pattern on a substrate (101) is presented, the method comprises: providing a substrate (101) comprising silicon; creating a sacrificial layer (102) on the substrate (101), wherein the sacrificial layer is formed on a first surface area (101a) of the substrate thereby leaving a second surface area (101b) exposed; depositing a first functional layer (103) at least on the second surface area (101b) of the substrate (101); removing the sacrificial layer (102); wherein: removing the sacrificial layer (102) is performed by etching the sacrificial layer (102) with an acidic aqueous solution that does not adversely affect the first functional layer (103) and the substrate (101).
Abstract translation: 提出了一种用于在衬底（101）上形成图案的方法，所述方法包括：提供包括硅的衬底（101）; 在所述基板（101）上形成牺牲层（102），其中所述牺牲层形成在所述基板的第一表面区域（101a）上，从而使第二表面区域（101b）露出; 至少在基板（101）的第二表面区域（101b）上沉积第一功能层（103）; 去除牺牲层（102）; 其中：通过用对第一功能层（103）和衬底（101）不产生不利影响的酸性水溶液蚀刻牺牲层（102）来进行去除牺牲层（102）。
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公开(公告)号：US11328151B2
公开(公告)日：2022-05-10
申请号：US16631396
申请日：2018-07-16
Applicant: IMEC VZW , Katholieke Universiteit Leuven, KU LEUVEN R&D
Inventor： Yuqian Li , Geert Vanmeerbeeck , Alexandra Dusa
Abstract: Disclosed herein are cell differentiating systems for differentiating cells. The systems comprise an input means for receiving a reconstructed image of a cell based on a holographic image of the cell in suspension, and a cell recognition means for determining cell characterization features from the reconstructed image of the cell for characterization of the cell. The cell recognition means thereby is configured for determining, as cell recognition features, image moments.
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公开(公告)号：US20200218882A1
公开(公告)日：2020-07-09
申请号：US16631396
申请日：2018-07-16
Applicant: IMEC VZW , Katholieke Universiteit Leuven, KU LEUVEN R&D
Inventor： Yuqian Li , Geert Vanmeerbeeck , Alexandra Dusa
Abstract: Disclosed herein are cell differentiating systems for differentiating cells. The systems comprise an input means for receiving a reconstructed image of a cell based on a holographic image of the cell in suspension, and a cell recognition means for determining cell characterization features from the reconstructed image of the cell for characterization of the cell. The cell recognition means thereby is configured for determining, as cell recognition features, image moments.
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公开(公告)号：US09373519B2
公开(公告)日：2016-06-21
申请号：US14560202
申请日：2014-12-04
Applicant: IMEC VZW
Inventor： Karolien Jans , Alexandra Dusa , Tim Stakenborg
IPC: H01L21/306 , H01L21/308 , H01L29/06 , H01L21/3205 , H01L21/32 , G01N33/487 , B82Y40/00
CPC classification number: H01L21/3085 , B81B2207/056 , B81C1/00206 , B82Y40/00 , G01N33/487 , H01L21/3086 , H01L21/32 , H01L21/32051 , H01L29/06
Abstract: A method for creating a pattern on a substrate (101) is presented, the method comprises: providing a substrate (101) comprising silicon; creating a sacrificial layer (102) on the substrate (101), wherein the sacrificial layer is formed on a first surface area (101a) of the substrate thereby leaving a second surface area (101b) exposed; depositing a first functional layer (103) at least on the second surface area (101b) of the substrate (101); removing the sacrificial layer (102); wherein: removing the sacrificial layer (102) is performed by etching the sacrificial layer (102) with an acidic aqueous solution that does not adversely affect the first functional layer (103) and the substrate (101).
Abstract translation: 提出了一种用于在衬底（101）上形成图案的方法，所述方法包括：提供包括硅的衬底（101）; 在所述基板（101）上形成牺牲层（102），其中所述牺牲层形成在所述基板的第一表面区域（101a）上，从而使第二表面区域（101b）露出; 至少在基板（101）的第二表面区域（101b）上沉积第一功能层（103）; 去除牺牲层（102）; 其中：通过用对第一功能层（103）和衬底（101）不产生不利影响的酸性水溶液蚀刻牺牲层（102）来进行去除牺牲层（102）。
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