公开(公告)号：US20140168778A1

公开(公告)日：2014-06-19

申请号：US13730588

申请日：2012-12-28

Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE

Inventor： Chun-Ting CHEN ,  Kun-Wei LIN ,  Li-Wen LAI

IPC: G02B1/11

CPC classification number: G02B1/115

Abstract: In an embodiment of the present disclosure, a composite graded refractive index layer structure is provided. The composite graded refractive index layer structure includes a substrate and a composite graded refractive index layer with varying compositions of zinc oxide and silicon oxide formed on the substrate, wherein the composite graded refractive index layer has a first surface where light penetrates thereinto and a second surface where light exits therefrom, and the composite graded refractive index layer has refractive index values which reduce from the first surface to the second surface. The present disclosure also provides an encapsulation structure including the composite graded refractive index layer structure.

Abstract translation: 在本公开的一个实施例中，提供了复合渐变折射率层结构。 复合渐变折射率层结构包括基底和在基底上形成的具有不同组成的氧化锌和氧化硅的复合渐变折射率层，其中复合渐变折射率层具有光穿透其中的第一表面和第二表面 其中光从其离开，并且复合渐变折射率层具有从第一表面到第二表面减小的折射率值。 本公开还提供了包括复合渐变折射率层结构的封装结构。

公开(公告)号：US20140054803A1

公开(公告)日：2014-02-27

申请号：US13728544

申请日：2012-12-27

Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE

Inventor： Chun-Ting CHEN ,  Li-Wen LAI ,  Kun-Wei LIN ,  Teng-Yen WANG

IPC: H01L23/31 ,  H01L21/56

CPC classification number: H01L23/3135 ,  H01L21/56 ,  H01L23/3192 ,  H01L51/0097 ,  H01L51/5256 ,  H01L2924/0002 ,  Y02E10/549 ,  Y02P70/521 ,  Y10T428/31663 ,  H01L2924/00

Abstract: An embodiment of the invention provides a compound barrier layer, including: a first barrier layer disposed on a substrate; and a second barrier layer disposed on the first barrier layer, wherein the first barrier layer and second barrier layer both include a plurality of alternately arranged inorganic material regions and organo-silicon material regions and the inorganic material regions and the organo-silicon material regions of the first barrier layer and second barrier layer are alternatively stacked vertically.

Abstract translation: 本发明的一个实施方案提供一种复合阻挡层，包括：设置在基底上的第一阻挡层; 以及设置在所述第一阻挡层上的第二阻挡层，其中所述第一阻挡层和所述第二阻挡层均包括多个交替布置的无机材料区域和有机硅材料区域，并且所述无机材料区域和所述有机硅材料区域 第一阻挡层和第二阻挡层交替地垂直堆叠。

公开(公告)号：US20240157496A1

公开(公告)日：2024-05-16

申请号：US18067904

申请日：2022-12-19

Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE

Inventor： Chun-Ting CHEN ,  Jheng-Jie LIN ,  Chien-Chih LIAO ,  Jen-Ji WANG

IPC: B23Q17/09 ,  B23Q17/12

CPC classification number: B23Q17/0971 ,  B23Q17/12

Abstract: A method for facilitating analysis of causes of machining defects is provided. The method is carried out by a computer system. The method includes the step of obtaining motion data and vibration acceleration data about the tip of a cutter mounted on a machine tool. The method further includes the step of obtaining time-frequency information about the vibration acceleration data by performing a time-frequency analysis on the vibration acceleration data. The method further includes the step of obtaining vibration-displacement data by normalizing the time-frequency information. The method further includes the step of obtaining amplitude-distribution data about the tip by synchronizing the motion data and the vibration-displacement data.