Surface measuring device and method thereof

    公开(公告)号:US09835449B2

    公开(公告)日:2017-12-05

    申请号:US14934607

    申请日:2015-11-06

    CPC classification number: G01B11/303 G01B21/04

    Abstract: A surface measuring device includes a rotary platform, a shifting lever, a measuring module, and a control module. The rotary platform carries an object under test and rotates the object under test at a rotating speed. The shifting lever is above the rotary platform. The measuring module disposed on the shifting lever moves to measurement positions on the shifting lever and performs a surface height measurement at a sampling frequency to sampling points on a surface of the object under test when located at one measurement position. The control module selectively adjusts the rotational speed for the rotary platform or the sampling frequency for the measuring module according to the measurement position of the measuring module on the shifting lever in order to fit a distance between the sampling points on at least one part of the surface of the object under test to a sampling rule.

    On-line measuring system, datum calibrating method, deviation measuring method and computer-readable medium

    公开(公告)号:US10260870B2

    公开(公告)日:2019-04-16

    申请号:US15855794

    申请日:2017-12-27

    Abstract: An on-line measuring system, a datum calibrating method, a deviation measuring method and a computer-readable medium are provided. The datum calibrating method includes following steps. A work piece is scanned by a scanning unit to obtain a global point cloud data. A local CAD data of the work piece is obtained according to a predetermined range. A local CAD geometric feature of the local CAD data is obtained. A local point cloud data of the global point cloud data is obtained according to a local range corresponding to the predetermined range. A local scanning geometric feature of the local point cloud data is obtained. The local scanning geometric feature and the local CAD geometric feature are compared to obtain at least one spatial freedom limit. A system basis is obtained according to six spatial freedom limits, if the number of the at least one spatial freedom limit reaches six.

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