公开(公告)号：US20180366141A1

公开(公告)日：2018-12-20

申请号：US15622577

申请日：2017-06-14

Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION

Inventor： Maryam ASHOORI ,  Benjamin D. BRIGGS ,  Lawrence A. CLEVENGER ,  Leigh Anne H. CLEVENGER ,  Michael RIZZOLO

IPC: G10L25/63 ,  G06F19/00 ,  G10L15/26 ,  A61B5/16

Abstract: Embodiments of the present invention are directed to a computer program product for generating a personality shift determination. The computer program product can include a computer readable storage medium having program instructions embodied therewith, wherein the instructions are executable by a processor to cause the processor to perform a method. The method can include receiving a real-time audio input. The method can also include generating a real-time personality trait identification. The method can also include generating a current trait classification for the real-time personality trait identification. The method can also include comparing the current trait classification to a historic rate classification. The method can also include generating a personality shift determination.

公开(公告)号：US20200027840A1

公开(公告)日：2020-01-23

申请号：US16039570

申请日：2018-07-19

Applicant: International Business Machines Corporation

Inventor： Benjamin D. BRIGGS ,  Cornelius Brown PEETHALA ,  Michael RIZZOLO ,  Koichi MOTOYAMA ,  Gen TSUTSUI ,  Ruqiang BAO ,  Gangadhara Raja MUTHINTI ,  Lawrence A. CLEVENGER

IPC: H01L23/532 ,  H01L21/02 ,  H01L21/768 ,  H01L21/306 ,  H01L21/48

Abstract: A method for fabricating semiconductor wafers comprises creating a semiconductor wafer having a plurality of wide copper wires and a plurality of narrow copper wires embedded in a dielectric insulator. The width of each wide copper wire is greater than a cutoff value and each narrow copper is less than the cutoff value. An optical pass through layer is deposited over a top surface of the wafer and a photo-resist layer is deposited over the optical pass through layer. The wafer is exposed to a light source to selectively remove photo-resist, forming a self-aligned pattern where photo-resist only remains in areas above wide copper wires. The self-aligned pattern is transferred to the optical pass through layer and the remaining photo-resist is removed. The wafer is chemically etched to remove the narrow copper wires, defining narrow gaps in the dielectric insulator. The wafer is metallized with non-copper metal, forming narrow non-copper metal wires.

公开(公告)号：US20190215282A1

公开(公告)日：2019-07-11

申请号：US15865530

申请日：2018-01-09

Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION

Inventor： Benjamin D. BRIGGS ,  Lawrence A. CLEVENGER ,  Leigh Anne H. CLEVENGER ,  Christoper J. PENNY ,  Michael RIZZOLO ,  Aldis SIPOLINS

IPC: H04L12/58 ,  G06F17/27 ,  G06F15/18 ,  H04L29/08

Abstract: Context appropriate errors are injected into conversational text generated by conversational agents. The conversational agent creates an imperfect conversational text containing at least one text entry error added to the original conversational text. A confidence level that at least one of context and meaning of the imperfect conversational text is consistent with the context and meaning of the original conversational text is determined, and the imperfect conversational text is communicated to a human recipient if the confidence level is above a pre-defined threshold.

公开(公告)号：US20180254242A1

公开(公告)日：2018-09-06

申请号：US15966236

申请日：2018-04-30

Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION

Inventor： Benjamin D. BRIGGS ,  Lawrence A. CLEVENGER ,  Bartlet H. DeProspo ,  Michael RIZZOLO ,  Nicole A. SAULNIER

IPC: H01L23/528 ,  H01L21/768 ,  H01L23/532 ,  H01L23/522

CPC classification number: H01L23/528 ,  H01L21/76811 ,  H01L21/76816 ,  H01L21/7684 ,  H01L21/76877 ,  H01L23/5226 ,  H01L23/53228

Abstract: A method of forming a self-aligned pattern of vias in a semiconductor device comprises etching a pattern of lines that contain notches that are narrower than other parts of the line. Thereafter, vias are created where the notches are located. The locations of the vias are such that the effect of blown-out areas is minimized. Thereafter, the lines are etched and the vias and line areas are filled. The layers are planarized such that the metal fill is level with a surrounding ultra-low-k dielectric. Additional metal layers, lines, and vias can be created. Other embodiments are also described herein.

公开(公告)号：US20200176388A1

公开(公告)日：2020-06-04

申请号：US16782311

申请日：2020-02-05

Applicant: International Business Machines Corporation

Inventor： Benjamin D. BRIGGS ,  Cornelius Brown PEETHALA ,  Michael RIZZOLO ,  Koichi MOTOYAMA ,  Gen TSUTSUI ,  Ruqiang BAO ,  Gangadhara Raja MUTHINTI ,  Lawrence A. CLEVENGER

IPC: H01L23/532 ,  H01L21/02 ,  H01L21/48 ,  H01L21/768 ,  H01L21/306

Abstract: A semiconductor wafer has a top surface, a dielectric insulator, a plurality of narrow copper wires, a plurality of wide copper wires, an optical pass through layer over the top surface, and a self-aligned pattern in a photo-resist layer. The plurality of wide copper wires and the plurality of narrow copper wires are embedded in a dielectric insulator. The width of each wide copper wire is greater than the width of each narrow copper. An optical pass through layer is located over the top surface. A self-aligned pattern in a photo-resist layer, wherein photo-resist exists only in areas above the wide copper wires, is located above the optical pass through layer.

公开(公告)号：US20190114671A1

公开(公告)日：2019-04-18

申请号：US15783028

申请日：2017-10-13

Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION

Inventor： Benjamin D. BRIGGS ,  Lawrence A. CLEVENGER ,  Leigh Anne H. CLEVENGER ,  Christoper J. PENNY ,  Michael RIZZOLO ,  Aldis SIPOLINS

IPC: G06Q30/02 ,  G06F3/0481 ,  A61L9/00

Abstract: Three-dimensional positional spatial olfaction for virtual marketing associates a product with a product location within a virtual reality environment and identifies a product aroma associated with the product. A distance and a direction from the product location to a positional presence of a participant within the virtual reality environment is determined, and the product aroma is delivered to the participant in accordance with the distance and the direction. Delivery of the product aroma to the participant in accordance with the distance and the direction is used to lead the participant through the virtual reality environment to the product location where an interface for obtaining a physical copy of the product is displayed to the participant.

公开(公告)号：US20180366142A1

公开(公告)日：2018-12-20

申请号：US15804333

申请日：2017-11-06

Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION

Inventor： Maryam ASHOORI ,  Benjamin D. BRIGGS ,  Lawrence A. CLEVENGER ,  Leigh Anne H. CLEVENGER ,  Michael RIZZOLO

IPC: G10L25/63 ,  A61B5/16 ,  G10L15/26 ,  G06F19/00

Abstract: Embodiments of the present invention are directed to a computer program product for generating a personality shift determination. The computer program product can include a computer readable storage medium having program instructions embodied therewith, wherein the instructions are executable by a processor to cause the processor to perform a method. The method can include receiving a real-time audio input. The method can also include generating a real-time personality trait identification. The method can also include generating a current trait classification for the real-time personality trait identification. The method can also include comparing the current trait classification to a historic rate classification. The method can also include generating a personality shift determination.