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公开(公告)号：US20080049374A1
公开(公告)日：2008-02-28
申请号：US11841172
申请日：2007-08-20
IPC分类号： H01L21/683
CPC分类号： H01L21/6831 , Y10T279/23
摘要： An electrostatic chuck with a heater includes: a base formed of a sintered body containing alumina; an ESC electrode provided in an upper portion side in the base; and a resistance heating body embedded in a lower portion side in the base. The base is composed of a dielectric layer from the ESC electrode to an upper surface of the base, and of a support member from the ESC electrode to a lower surface of the base. In the support member, a carbon content differs between an ESC electrode neighborhood in contact with the dielectric layer and a lower region below the ESC electrode neighborhood, a carbon content in the dielectric layer is 100 wt ppm or less, the carbon content in the ESC electrode neighborhood is 0.13 wt % or less, the carbon content in the lower region is 0.03 wt % or more but 0.5 wt % or less, and the carbon content in the ESC electrode neighborhood is smaller than the carbon content in the lower region. The resistance heating body contains niobium or platinum.
摘要翻译： 具有加热器的静电卡盘包括：由含有氧化铝的烧结体形成的基体; 设置在所述基座的上部侧的ESC电极; 以及嵌入基座的下部侧的电阻加热体。 基体由从ESC电极到基体的上表面的电介质层和从ESC电极到基底的下表面的支撑体构成。 在支撑构件中，与电介质层接触的ESC电极附近和ESC电极附近的下部区域之间的碳含量不同，电介质层中的碳含量为100重量ppm以下，ESC中的碳含量 电极附近为0.13重量％以下，下部区域的碳含量为0.03重量％以上且0.5重量％以下，ESC电极附近的碳含量低于下部区域的碳含量。 电阻加热体包含铌或铂。
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公开(公告)号：US08136820B2
公开(公告)日：2012-03-20
申请号：US11841172
申请日：2007-08-20
IPC分类号： B23B31/28 , H01L21/683
CPC分类号： H01L21/6831 , Y10T279/23
摘要： An electrostatic chuck with a heater includes: a base formed of a sintered body containing alumina; an ESC electrode provided in an upper portion side in the base; and a resistance heating body embedded in a lower portion side in the base. The base is composed of a dielectric layer from the ESC electrode to an upper surface of the base, and of a support member from the ESC electrode to a lower surface of the base. In the support member, a carbon content differs between an ESC electrode neighborhood in contact with the dielectric layer and a lower region below the ESC electrode neighborhood, a carbon content in the dielectric layer is 100 wt ppm or less, the carbon content in the ESC electrode neighborhood is 0.13 wt % or less, the carbon content in the lower region is 0.03 wt % or more and 0.5 wt % or less, and the carbon content in the ESC electrode neighborhood is smaller than the carbon content in the lower region. The resistance heating body contains niobium or platinum.
摘要翻译： 具有加热器的静电卡盘包括：由含有氧化铝的烧结体形成的基体; 设置在所述基座的上部侧的ESC电极; 以及嵌入基座的下部侧的电阻加热体。 基体由从ESC电极到基底的上表面的电介质层和从ESC电极到基底的下表面的支撑构件构成。 在支撑构件中，与电介质层接触的ESC电极附近和ESC电极附近的下部区域之间的碳含量不同，电介质层中的碳含量为100重量ppm以下，ESC中的碳含量 电极附近为0.13重量％以下，下部区域的碳含量为0.03重量％以上且0.5重量％以下，ESC电极附近的碳含量低于下部区域的碳含量。 电阻加热体包含铌或铂。
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公开(公告)号：US06728091B2
公开(公告)日：2004-04-27
申请号：US10157774
申请日：2002-05-29
IPC分类号： H02N1300
CPC分类号： H01L21/6833 , Y10T279/23 , Y10T428/31663 , Y10T428/31721 , Y10T428/31938
摘要： An electrostatic adsorption device has a dielectric layer, electrodes, a cooling member and an insulating adhesive. The dielectric layer is made of a ceramic dielectric material and has an adsorption face and a back face. The electrodes are provided on the back face of the dielectric layer and gaps are defined between the portions of the electrodes. The insulating adhesive is provided between the back face of the dielectric layer and the cooling member. The insulating adhesive covers the electrodes and the back face and is provided in the gaps.
摘要翻译： 静电吸附装置具有电介质层，电极，冷却构件和绝缘粘合剂。 电介质层由陶瓷电介质材料制成，具有吸附面和背面。 电极设置在电介质层的背面，间隙限定在电极部分之间。 绝缘粘合剂设置在电介质层的背面和冷却部件之间。 绝缘粘合剂覆盖电极和背面并设置在间隙中。
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公开(公告)号：US20070146961A1
公开(公告)日：2007-06-28
申请号：US11611905
申请日：2006-12-18
IPC分类号： H01L21/683
CPC分类号： H02N13/00 , H01L21/6831 , H01L21/6875
摘要： An electrostatic chuck includes: a base body; an electrode formed on the base body and generating coulomb force; and a dielectric layer formed on the base body and electrode, having a plurality of projections on a first main face on the side supporting a substrate attracted by the coulomb force, and supporting the substrate on the upper surfaces of these projections. The projections are arranged at substantially uniform intervals. The surface roughness (Ra) of the projection upper faces is 0.5 μm or smaller. The height of the projections is 5 to 20 μm. The relation A1/2×B2>200 is satisfied where A (number/100 cm2) is the number of the projections per unit area of 100 cm2 in the first main face, and B (μm) is the height of the projections.
摘要翻译： 静电卡盘包括：基体; 形成在基体上并产生库仑力的电极; 以及形成在基体和电极上的电介质层，在支撑被库仑力吸引的基板的一侧的第一主面上具有多个突起，并且将基板支撑在这些突起的上表面上。 突起以大致均匀的间隔布置。 投影面的表面粗糙度（Ra）为0.5μm以下。 突起的高度为5至20毫米。 满足关系A <1/2>×B <2> 200，其中A（数/ 100cm 2）是每单位的突起数 第一主面的面积为100cm 2，B（mum）是突起的高度。
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公开(公告)号：US20090159588A1
公开(公告)日：2009-06-25
申请号：US12206142
申请日：2008-09-08
IPC分类号： H05B3/68
CPC分类号： H01L21/67103
摘要： A heating apparatus 10 includes a ceramic base 11 having a heating surface 11a and provided with a resistance heating body 12 embedded therein, and a temperature adjusting member 21 fixedly fastened proximal to a back surface of the ceramic base 11. A heat conductive member 14 having a thermal conductivity higher than the ceramic base 11 is provided between the heating surface of the ceramic base 11 and the resistance heating body 12. A gas is introduced to an air gap 31 between the ceramic base 11 and the temperature adjusting member 21 while controlling the gas pressure.
摘要翻译： 加热装置10包括具有加热面11a并嵌入有电阻加热体12的陶瓷基体11，以及固定在陶瓷基体11的背面附近固定的温度调整部件21.导热部件14具有 在陶瓷基体11的加热面和电阻加热体12之间设置比陶瓷基体11高的导热系数。在陶瓷基体11和温度调整部件21之间的气隙31中引入气体， 气压。
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公开(公告)号：US07763831B2
公开(公告)日：2010-07-27
申请号：US11939760
申请日：2007-11-14
CPC分类号： H05B3/143 , H01L21/67103
摘要： A heating device has a ceramic base with a heating surface, and a heating body embedded in the ceramic base. The heating device includes a thermal conductive member positioned between the heating surface and the heating body in the ceramic base. The thermal conductive member has a thermal conductivity that is higher than the ceramic base and as such, the heating device achieves superior temperature uniformity of a heated object particularly in a semiconductor device manufacturing process.
摘要翻译： 加热装置具有带有加热面的陶瓷基体和埋在陶瓷基体中的加热体。 加热装置包括位于陶瓷基体内的加热面与加热体之间的导热部件。 导热部件的导热率高于陶瓷基体，因此加热装置特别是在半导体器件制造工序中，能够实现加热对象的优异的温度均匀性。
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公开(公告)号：US07576967B2
公开(公告)日：2009-08-18
申请号：US11687824
申请日：2007-03-19
IPC分类号： H01T23/00
CPC分类号： H01L21/6831
摘要： An electrostatic chuck includes a ceramic base having an electrode embedded in vicinity to a holding face for holding a substrate. On a back side of this ceramic base, provided are a terminal connected to the electrode, a wafer temperature control member, and an insulating member for insulating the temperature control member from the terminal. This insulating member has a flange portion on its end portion in contact with the ceramic base, and is made of highly thermal conductive ceramics.
摘要翻译： 静电吸盘包括具有嵌入到用于保持基板的保持面附近的电极的陶瓷基体。 在该陶瓷基体的背面设置有与电极连接的端子，晶片温度控制部件以及用于将温度控制部件与端子绝缘的绝缘部件。 该绝缘构件在其与陶瓷基体接触的端部具有凸缘部，并且由高导热性陶瓷制成。
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公开(公告)号：US20070223175A1
公开(公告)日：2007-09-27
申请号：US11687824
申请日：2007-03-19
IPC分类号： H01L21/683
CPC分类号： H01L21/6831
摘要： An electrostatic chuck includes a ceramic base having an electrode embedded in vicinity to a holding face for holding a substrate. On a back side of this ceramic base, provided are a terminal connected to the electrode, a wafer temperature control member, and an insulating member for insulating the temperature control member from the terminal. This insulating member has a flange portion on its end portion in contact with the ceramic base, and is made of highly thermal conductive ceramics.
摘要翻译： 静电吸盘包括具有嵌入到用于保持基板的保持面附近的电极的陶瓷基体。 在该陶瓷基体的背面设置有与电极连接的端子，晶片温度控制部件以及用于将温度控制部件与端子绝缘的绝缘部件。 该绝缘构件在其与陶瓷基体接触的端部具有凸缘部，并且由高导热性陶瓷制成。
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