公开(公告)号：US20060213900A1

公开(公告)日：2006-09-28

申请号：US11386222

申请日：2006-03-22

申请人： Hiroto Matsuda ,  Kazuhiro Nobori ,  Yasuyoshi Imai ,  Tetsuya Kawajiri

发明人： Hiroto Matsuda ,  Kazuhiro Nobori ,  Yasuyoshi Imai ,  Tetsuya Kawajiri

IPC分类号： H05B3/68

CPC分类号： H02N13/00 ,  H01L21/6833 ,  H05B3/143

摘要： An electrostatic chuck includes, a base plate made of ceramic, an electrode for generating an electrostatic clamping force, and a dielectric material layer formed on the electrode and made of ceramic having a volume resistivity of not less than 1×1015 Ω·cm at 100° C. and the same main constituent as the base plate. The base plate has a higher thermal conductivity than the dielectric material layer.

摘要翻译： 静电吸盘包括：由陶瓷制成的基板，用于产生静电夹持力的电极和形成在电极上并由体积电阻率不小于1×10 15 /℃的陶瓷制成的介电材料层 > 100℃时的Omeg·cm，与基板相同的主要成分。 基板具有比介电材料层更高的热导率。

公开(公告)号：US06292346B1

公开(公告)日：2001-09-18

申请号：US09357395

申请日：1999-07-20

申请人： Masashi Ohno ,  Hirokazu Ichikawa ,  Naohito Yamada ,  Tetsuya Kawajiri

发明人： Masashi Ohno ,  Hirokazu Ichikawa ,  Naohito Yamada ,  Tetsuya Kawajiri

IPC分类号： H02N1300

CPC分类号： H01L21/67103 ,  H01L21/6831 ,  H02N13/00 ,  Y10T29/49002

摘要： A semiconductor wafer-holder having a member for holding the semiconductor wafer with a basic member made of a ceramic nitride, a cooling equipment made of a metal, and an intervened layer between the semiconductor wafer-holding member and the cooling equipment, the intervened layer being composed of a metallic foil or a carbon sheet having a thickness of not more than 500 &mgr;m.

摘要翻译： 一种半导体晶片保持器，其具有用于将半导体晶片保持为具有由陶瓷氮化物制成的基本构件的部件，由金属制成的冷却设备以及在半导体晶片保持构件和冷却设备之间的介入层，所述介入层 由金属箔或厚度不大于500μm的碳片组成。

公开(公告)号：US07848075B2

公开(公告)日：2010-12-07

申请号：US11777318

申请日：2007-07-13

申请人： Kazuhiro Nobori ,  Tetsuya Kawajiri ,  Akiyoshi Hattori

发明人： Kazuhiro Nobori ,  Tetsuya Kawajiri ,  Akiyoshi Hattori

IPC分类号： H01L21/683

CPC分类号： H01L21/6831 ,  H01L21/68757

摘要： An electrostatic chuck with a heater including: a base which is composed of a sintered body containing alumina, an electrode disposed in an upper part of the base, and a resistance heating element embedded in a lower part of the base. The base includes a dielectric layer between the electrode and an upper surface of the base and a supporting member between the electrode and a lower surface of the base. The dielectric layer has a carbon content of not more than 100 ppm, and the supporting member has a carbon content of 0.03 to 0.25 wt %. Moreover, the resistance heating element is formed into a coil and mainly composed of niobium.

摘要翻译： 一种具有加热器的静电卡盘，包括：由包含氧化铝的烧结体构成的基底，设置在基部的上部的电极和嵌入基座的下部的电阻加热元件。 底座包括电极和基座的上表面之间的电介质层，以及在电极和底座的下表面之间的支撑构件。 电介质层的碳含量不大于100ppm，并且支撑构件的碳含量为0.03-0.25重量％。 此外，电阻加热元件形成为主要由铌构成的线圈。

公开(公告)号：US20080186647A1

公开(公告)日：2008-08-07

申请号：US12018970

申请日：2008-01-24

申请人： Tetsuya KAWAJIRI ,  Kazuhiro Nobori

发明人： Tetsuya KAWAJIRI ,  Kazuhiro Nobori

IPC分类号： H01L21/683 ,  B05D1/00

CPC分类号： H02N13/00

摘要： An electrostatic chuck includes an ESC electrode E1 that is disc-shaped in plan view, an ESC electrode E2 that is doughnut-shaped in plan view, and a dielectric layer formed to cover surfaces of the ESC electrodes E1 and E2. The dielectric layer includes a disc-shaped dielectric region R1 formed in an area corresponding to the surface of the ESC electrode E1, and a doughnut-shaped dielectric region R2 formed in an area corresponding to the surface of the ESC electrode E2, and these two dielectric regions R1 and R2 are sintered seamlessly into an integrated form. The dielectric regions R1 and R2 are formed using different materials having different volume resistivities with the same kind of sintering additives. To each of the ESC electrodes E1 and E2, a terminal for voltage application is connected so that voltage can be applied individually to the ESC electrodes E1 and E2.

摘要翻译： 静电卡盘包括俯视为圆盘状的ESC电极E 1，俯视为圆环状的ESC电极E 2，以及形成为覆盖ESC电极E 1，E 2的表面的电介质层。 电介质层包括在与ESC电极E 1的表面相对应的区域中形成的圆盘形电介质区域R 1和形成在与ESC电极E 2的表面对应的区域中的环形电介质区域R 2 ，并且这两个电介质区域R 1和R 2无缝地烧结成一体形式。 使用与相同种类的烧结添加剂不同的体积电阻率的不同材料形成电介质区域R 1和R 2。 对于每个ESC电极E 1和E 2，连接用于施加电压的端子，以便可以向ESC电极E 1和E 2分别施加电压。

公开(公告)号：US07067200B2

公开(公告)日：2006-06-27

申请号：US10623052

申请日：2003-07-18

申请人： Tomoyuki Fujii ,  Hideyoshi Tsuruta ,  Tetsuya Kawajiri

发明人： Tomoyuki Fujii ,  Hideyoshi Tsuruta ,  Tetsuya Kawajiri

IPC分类号： B32B7/04 ,  B32B7/10 ,  B32B15/04 ,  B23K35/26 ,  B23K101/36

CPC分类号： B23K35/26 ,  B32B15/04 ,  B32B18/00 ,  B32B2309/022 ,  B32B2311/24 ,  C04B35/6455 ,  C04B37/006 ,  C04B37/023 ,  C04B37/026 ,  C04B2235/6567 ,  C04B2235/6581 ,  C04B2235/96 ,  C04B2237/12 ,  C04B2237/122 ,  C04B2237/125 ,  C04B2237/343 ,  C04B2237/346 ,  C04B2237/366 ,  C04B2237/368 ,  C04B2237/40 ,  C04B2237/402 ,  C04B2237/405 ,  C04B2237/406 ,  C04B2237/407 ,  C04B2237/408 ,  C04B2237/62 ,  C04B2237/68 ,  C04B2237/704 ,  C04B2237/706 ,  C04B2237/708 ,  C04B2237/72 ,  Y10T428/12396 ,  Y10T428/12528 ,  Y10T428/12535 ,  Y10T428/12681 ,  Y10T428/12708

摘要： A joined body and method of producing the joined body are provided. A first member containing at least a ceramic and a second member containing at least one of a metal and a metal composite are joined with each other via a metal adhesive. The metal adhesive contains at least indium and at least one material containing at least a component capable of reducing the melting point of indium and is provided between the first and second members to provide a laminate. The laminate is heated at a temperature in a solid-liquid coexisting range of an alloy comprising indium and the indium melting point reducing component to join the first and second members.

摘要翻译： 提供一种接合体及其制造方法。 含有至少陶瓷的第一构件和含有金属和金属复合物中的至少一种的第二构件通过金属粘合剂相互连接。 金属粘合剂至少含有铟和至少一种至少含有能够降低铟的熔点的成分的材料，并且设置在第一和第二构件之间以提供层压体。 将层压体在包含铟和铟熔点降低组分的合金的固液共存范围内加热，以使第一和第二构件接合。

公开(公告)号：US06728091B2

公开(公告)日：2004-04-27

申请号：US10157774

申请日：2002-05-29

申请人： Hideyoshi Tsuruta ,  Masahito Eguchi ,  Tetsuya Kawajiri ,  Ikuhisa Morioka

发明人： Hideyoshi Tsuruta ,  Masahito Eguchi ,  Tetsuya Kawajiri ,  Ikuhisa Morioka

IPC分类号： H02N1300

CPC分类号： H01L21/6833 ,  Y10T279/23 ,  Y10T428/31663 ,  Y10T428/31721 ,  Y10T428/31938

摘要： An electrostatic adsorption device has a dielectric layer, electrodes, a cooling member and an insulating adhesive. The dielectric layer is made of a ceramic dielectric material and has an adsorption face and a back face. The electrodes are provided on the back face of the dielectric layer and gaps are defined between the portions of the electrodes. The insulating adhesive is provided between the back face of the dielectric layer and the cooling member. The insulating adhesive covers the electrodes and the back face and is provided in the gaps.

摘要翻译： 静电吸附装置具有电介质层，电极，冷却构件和绝缘粘合剂。 电介质层由陶瓷电介质材料制成，具有吸附面和背面。 电极设置在电介质层的背面，间隙限定在电极部分之间。 绝缘粘合剂设置在电介质层的背面和冷却部件之间。 绝缘粘合剂覆盖电极和背面并设置在间隙中。

公开(公告)号：US06432208B1

公开(公告)日：2002-08-13

申请号：US09670580

申请日：2000-09-27

申请人： Satoru Kawakami ,  Katsuhiko Iwabuchi ,  Ryo Kuwajima ,  Ryusuke Ushikoshi ,  Naohito Yamada ,  Tetsuya Kawajiri

发明人： Satoru Kawakami ,  Katsuhiko Iwabuchi ,  Ryo Kuwajima ,  Ryusuke Ushikoshi ,  Naohito Yamada ,  Tetsuya Kawajiri

IPC分类号： C23C1600

CPC分类号： H01L21/67103 ,  C23C16/4586 ,  C23C16/46 ,  H01J2237/2001

摘要： In a plasma processing apparatus, a temperature control of a substrate to be processed is improved. A ceramic made support member having a substantially cylindrical shape is provided in a process chamber. An upper end of the support member is airtightly connected to a back surface of a placement table by solid state bonding. A lower end of the support member is airtightly connected to a bottom of the process chamber via a lower cooling jacket and O-rings. A cooling jacket made of a disc-like aluminum block is provided in an atmosphere chamber formed inside the support member. The cooling jacket is mounted to the back surface of the placement table via a heat conductive sheet member.

摘要翻译： 在等离子体处理装置中，提高了待处理基板的温度控制。 在处理室中设置具有大致圆柱形状的陶瓷制的支撑构件。 支撑构件的上端通过固态粘合气密地连接到放置台的后表面。 支撑构件的下端经由下部冷却套和O形环气密地连接到处理室的底部。 在形成在支撑构件内部的气氛室中设置由盘状铝块制成的冷却套。 冷却套通过导热板构件安装到放置台的后表面。

公开(公告)号：US08136820B2

公开(公告)日：2012-03-20

申请号：US11841172

申请日：2007-08-20

申请人： Ikuhisa Morioka ,  Kazuhiro Nobori ,  Tetsuya Kawajiri ,  Akiyoshi Hattori

发明人： Ikuhisa Morioka ,  Kazuhiro Nobori ,  Tetsuya Kawajiri ,  Akiyoshi Hattori

IPC分类号： B23B31/28 ,  H01L21/683

CPC分类号： H01L21/6831 ,  Y10T279/23

摘要： An electrostatic chuck with a heater includes: a base formed of a sintered body containing alumina; an ESC electrode provided in an upper portion side in the base; and a resistance heating body embedded in a lower portion side in the base. The base is composed of a dielectric layer from the ESC electrode to an upper surface of the base, and of a support member from the ESC electrode to a lower surface of the base. In the support member, a carbon content differs between an ESC electrode neighborhood in contact with the dielectric layer and a lower region below the ESC electrode neighborhood, a carbon content in the dielectric layer is 100 wt ppm or less, the carbon content in the ESC electrode neighborhood is 0.13 wt % or less, the carbon content in the lower region is 0.03 wt % or more and 0.5 wt % or less, and the carbon content in the ESC electrode neighborhood is smaller than the carbon content in the lower region. The resistance heating body contains niobium or platinum.

摘要翻译： 具有加热器的静电卡盘包括：由含有氧化铝的烧结体形成的基体; 设置在所述基座的上部侧的ESC电极; 以及嵌入基座的下部侧的电阻加热体。 基体由从ESC电极到基底的上表面的电介质层和从ESC电极到基底的下表面的支撑构件构成。 在支撑构件中，与电介质层接触的ESC电极附近和ESC电极附近的下部区域之间的碳含量不同，电介质层中的碳含量为100重量ppm以下，ESC中的碳含量 电极附近为0.13重量％以下，下部区域的碳含量为0.03重量％以上且0.5重量％以下，ESC电极附近的碳含量低于下部区域的碳含量。 电阻加热体包含铌或铂。

公开(公告)号：US20080138645A1

公开(公告)日：2008-06-12

申请号：US11867044

申请日：2007-10-04

申请人： Tetsuya KAWAJIRI ,  Yasufumi Aihara ,  Tomoyuki Fujii

发明人： Tetsuya KAWAJIRI ,  Yasufumi Aihara ,  Tomoyuki Fujii

IPC分类号： B32B3/26

CPC分类号： H02N13/00 ,  H01L21/6833 ,  H01L21/68757 ,  Y10T428/12479 ,  Y10T428/24959 ,  Y10T428/249957 ,  Y10T428/249967 ,  Y10T428/249982 ,  Y10T428/249985 ,  Y10T428/265 ,  Y10T428/31678

摘要： A substrate supporting member includes: a plate-shaped ceramic body having a surface serving as a substrate supporting surface; a plate-shaped composite material body which is joined to a surface of the ceramic body opposite to the substrate supporting surface with a joint material interposed therebetween and made of porous ceramic with pores filled with metal, the composite material body having a porosity of more than 0% and not more than 5%; and a metallic plate which is joined to a surface of the composite material body opposite to the surface joined to the ceramic body with a joint material interposed therebetween.

摘要翻译： 基板支撑构件包括：具有用作基板支撑表面的表面的板状陶瓷体; 一种板状复合材料体，其与陶瓷体的与基板支撑面相对的表面与介于其间的接合材料接合，并由具有填充金属的孔的多孔陶瓷制成，复合材料体的孔隙率大于 0％不超过5％; 以及金属板，其与所述复合材料体的与所述陶瓷体接合的表面相对的表面接合，其间插入有接合材料。

公开(公告)号：US20070146961A1

公开(公告)日：2007-06-28

申请号：US11611905

申请日：2006-12-18

申请人： Ikuhisa Morioka ,  Hideyoshi Tsuruta ,  Tetsuya Kawajiri ,  Takeru Torigoe

发明人： Ikuhisa Morioka ,  Hideyoshi Tsuruta ,  Tetsuya Kawajiri ,  Takeru Torigoe

IPC分类号： H01L21/683

CPC分类号： H02N13/00 ,  H01L21/6831 ,  H01L21/6875

摘要： An electrostatic chuck includes: a base body; an electrode formed on the base body and generating coulomb force; and a dielectric layer formed on the base body and electrode, having a plurality of projections on a first main face on the side supporting a substrate attracted by the coulomb force, and supporting the substrate on the upper surfaces of these projections. The projections are arranged at substantially uniform intervals. The surface roughness (Ra) of the projection upper faces is 0.5 μm or smaller. The height of the projections is 5 to 20 μm. The relation A1/2×B2>200 is satisfied where A (number/100 cm2) is the number of the projections per unit area of 100 cm2 in the first main face, and B (μm) is the height of the projections.

摘要翻译： 静电卡盘包括：基体; 形成在基体上并产生库仑力的电极; 以及形成在基体和电极上的电介质层，在支撑被库仑力吸引的基板的一侧的第一主面上具有多个突起，并且将基板支撑在这些突起的上表面上。 突起以大致均匀的间隔布置。 投影面的表面粗糙度（Ra）为0.5μm以下。 突起的高度为5至20毫米。 满足关系A <1/2>×B <2> 200，其中A（数/ 100cm 2）是每单位的突起数 第一主面的面积为100cm 2，B（mum）是突起的高度。