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公开(公告)号:US20230098233A1
公开(公告)日:2023-03-30
申请号:US17942441
申请日:2022-09-12
Applicant: Infineon Technologies AG
Inventor: Franz-Josef Pichler , Johannes Mueller , Christoph Ahamer , Gerald Lackner , Walter Leitgeb
IPC: H01L21/683
Abstract: A chuck for a laser beam wafer dicing equipment includes a wafer support plate having an upper surface for holding a wafer disposed on a dicing tape. The upper surface includes a topographically structured surface region that partly or completely overlaps an edge of the wafer when the wafer disposed on the dicing tape is placed on the upper surface. The topographically structured surface region provides for a reduction in an area of contact between the upper surface and the dicing tape.
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公开(公告)号:US12205842B2
公开(公告)日:2025-01-21
申请号:US17942441
申请日:2022-09-12
Applicant: Infineon Technologies AG
Inventor: Franz-Josef Pichler , Johannes Mueller , Christoph Ahamer , Gerald Lackner , Walter Leitgeb
IPC: H01T23/00 , H01L21/683
Abstract: A chuck for a laser beam wafer dicing equipment includes a wafer support plate having an upper surface for holding a wafer disposed on a dicing tape. The upper surface includes a topographically structured surface region that partly or completely overlaps an edge of the wafer when the wafer disposed on the dicing tape is placed on the upper surface. The topographically structured surface region provides for a reduction in an area of contact between the upper surface and the dicing tape.
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公开(公告)号:US20230100613A1
公开(公告)日:2023-03-30
申请号:US17942487
申请日:2022-09-12
Applicant: Infineon Technologies AG
Inventor: Franz-Josef Pichler , Johannes Mueller , Christoph Ahamer , Gerald Lackner , Walter Horst Leitgeb
IPC: H01L21/683 , H01L21/67 , H01L21/268 , H01L21/78
Abstract: A chuck for a laser beam wafer dicing equipment includes a wafer support plate having an upper surface for holding a wafer disposed on a dicing tape. The upper surface includes an annular groove that overlaps an edge of the wafer when the wafer disposed on the dicing tape is placed on the upper surface. The wafer support plate includes a ventilation channel configured to ventilate the annular groove.
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