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公开(公告)号：US20220137511A1
公开(公告)日：2022-05-05
申请号：US17515949
申请日：2021-11-01
Inventor： Jinkyun LEE , Yejin KU , Hyuntaek OH
Abstract: Provided are a resist composition and a method of forming a pattern using the same. According to the inventive concept, the resist composition may include a copolymer represented by Formula 1 below.
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