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公开(公告)号：US10720708B2
公开(公告)日：2020-07-21
申请号：US15657345
申请日：2017-07-24
申请人： InnoLux Corporation
发明人： Huei-Ying Chen , I-Yin Li , Chia-Chi Ho , Hsu-Kuan Hsu , Ker-Yih Kao , Chung-Kuang Wei , Chin-Lung Ting , Cheng-Chi Wang , Chien-Hsing Lee
摘要： An antenna device includes a first dielectric substrate, a first radiator disposed on the first dielectric substrate, a second dielectric substrate disposed on the first radiator, a second radiator disposed between the first dielectric substrate and the second dielectric substrate, a main radiator, disposed on the second dielectric substrate, and a modulation structure located between a first radiation portion of the first radiator and a second radiation portion of the second radiator. The first radiation portion, the modulation structure, and the second radiation portion are located in a central area.
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公开(公告)号：US11868040B2
公开(公告)日：2024-01-09
申请号：US17681145
申请日：2022-02-25
申请人： InnoLux Corporation
IPC分类号： G03F1/60
CPC分类号： G03F1/60
摘要： A method for forming a target substrate is provided. The method includes providing a mask substrate. The method also includes providing a second base with a material layer. The method further includes arranging the mask substrate and the second base correspondingly. In addition, the method includes performing exposure and development processes on the material layer to form the target substrate and removing the mask substrate.
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公开(公告)号：US11294273B2
公开(公告)日：2022-04-05
申请号：US16715929
申请日：2019-12-16
申请人： InnoLux Corporation
IPC分类号： G03F1/60
摘要： A method for forming a mask substrate is provided. The method includes providing a first base and providing a mask layer on the first base. The method also includes patterning the mask layer to form a pattern, wherein the first base and the pattern form a patterned substrate and providing a first substrate. The method further includes providing an optical layer on the first substrate or on the patterned substrate and assembling the first substrate and the patterned substrate to form the mask substrate.
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公开(公告)号：US09335634B2
公开(公告)日：2016-05-10
申请号：US14099263
申请日：2013-12-06
申请人： InnoLux Corporation
发明人： Ker-Yih Kao , Tsan-Jen Chen , Chien-Hsing Lee
CPC分类号： G03F7/70775 , G03F7/201 , G03F7/26
摘要： A display manufacturing method comprises steps of: moving a first substrate and a second substrate by a conveying apparatus; and implementing a first exposure and a second exposure of the first substrate and a first exposure and a second exposure of the second substrate by at least one light emitting element when the conveying apparatus drives the first and second substrates to pass through the light source module. When the first exposures of the first and second substrates are implemented, the moving directions of the first and second substrates are opposite, or when the second exposures of the first and second substrates are implemented, the moving directions of the first and second substrates are opposite. A photo alignment process is also disclosed.
摘要翻译： 显示器制造方法包括以下步骤：通过输送装置移动第一基板和第二基板; 以及当所述输送装置驱动所述第一和第二基板通过所述光源模块时，通过至少一个发光元件实施所述第一基板的第一曝光和第二曝光以及所述第二基板的第一曝光和第二曝光。 当实现第一和第二基板的第一曝光时，第一和第二基板的移动方向相反，或者当实现第一和第二基板的第二次曝光时，第一和第二基板的移动方向相反 。 还公开了照相校准过程。
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公开(公告)号：US09690216B2
公开(公告)日：2017-06-27
申请号：US15093499
申请日：2016-04-07
申请人： Innolux Corporation
发明人： Ker-Yih Kao , Tsan-Jen Chen , Chien-Hsing Lee
CPC分类号： G03F7/70775 , G03F7/201 , G03F7/26
摘要： A display manufacturing method comprises steps of: moving a first substrate and a second substrate by a conveying apparatus; and implementing a first exposure and a second exposure of the first substrate and a first exposure and a second exposure of the second substrate by at least one light emitting element when the conveying apparatus drives the first and second substrates to pass through the light source module. When the first exposures of the first and second substrates are implemented, the moving directions of the first and second substrates are opposite, or when the second exposures of the first and second substrates are implemented, the moving directions of the first and second substrates are opposite. A photo alignment process is also disclosed.
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6.发明授权公开(公告)号：US09588427B2
公开(公告)日：2017-03-07
申请号：US14281276
申请日：2014-05-19
申请人： InnoLux Corporation
发明人： Ker-Yih Kao , Tsan-Jen Chen , Chen-Kuan Kao , Chien-Hsing Lee
IPC分类号： G03F7/20
CPC分类号： G03F7/201
摘要： A light exposure system executing a light exposure process to a plurality of assembly cells, each of which includes a first substrate, a second substrate and a liquid crystal layer disposed between the first and second substrates, comprises: a transmission device; two moving stages disposed on the transmission device and carrying the assembly cells; and a light source module including at least a light emitting element, wherein the transmission device moves at least one of the moving stages carrying the assembly cell or the light source module, and the light emitting element emits the light to the assembly cell, wherein the assembly cells include a first assembly cell and a second assembly cell, the moving stages carry the first assembly cell and the second assembly cell, respectively, wherein when the light exposure process is executed to the first assembly cell, the second assembly cell receives the work of cell replacement and alignment, electrode contact and application of electric field, wherein when the light exposure process is executed to the second assembly cell, the first assembly cell receives the work of cell replacement and alignment, electrode contact and application of electric field. A light exposure process applied to the light exposure system is also disclosed.
摘要翻译： 对多个组装单元执行曝光处理的曝光系统，每个组装单元包括第一基板，第二基板和设置在第一和第二基板之间的液晶层，包括：传输装置; 两个移动台设置在传动装置上并且承载组件单元; 以及至少包括发光元件的光源模块，其中所述传输装置移动承载组装单元或光源模块的至少一个移动台，并且所述发光元件将光发射到所述组装单元，其中， 装配单元包括第一组装单元和第二组合单元，所述移动台分别承载第一组装单元和第二组合单元，其中当对第一组装单元执行曝光过程时，第二组合单元接收工件 的电池更换和对准，电极接触和施加电场，其中当对第二组装电池执行曝光处理时，第一组装电池接收电池更换和对准，电极接触和施加电场的工作。 还公开了应用于曝光系统的曝光过程。
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