公开(公告)号：US20250085627A1

公开(公告)日：2025-03-13

申请号：US18830797

申请日：2024-09-11

Applicant: Inpria Corporation

Inventor： Brian J. Cardineau ,  Robert E. Jilek ,  Kai Jiang ,  Alexander C. Marwitz

IPC: G03F7/004 ,  G03F7/16 ,  G03F7/20

Abstract: Organotin patterning compositions can incorporate Sn—F bonds to improve pattering performance. A precursor solution for a radiation patterning composition can comprise a blend of an organic solvent, an organotin composition represented by the formula RSnL3, and a compound capable of generating Sn—F bonds wherein R is a substituted or unsubstituted hydrocarbyl ligand with 1 to 31 carbon atoms and an Sn—C bond and L is a hydrolysable ligand. The fluoride source can be an ammonium fluoride. The patterning structure on a substrate surface has RSnFn moieties, generally within an oxo-hydroxo network.

公开(公告)号：US20250074930A1

公开(公告)日：2025-03-06

申请号：US18816097

申请日：2024-08-27

Applicant: Inpria Corporation

Inventor： Alexander C. Marwitz ,  Kai Jiang ,  Bryan T. Novas ,  Robert E. Jilek ,  Christopher J. Reed ,  Brian J. Cardineau ,  Munendra Yadav

IPC: C07F7/22 ,  C09K11/06 ,  G03F7/004 ,  G03F7/20 ,  G03F7/32

Abstract: Organotin patterning compositions have radiation sensitive ligands with acetal functional groups. Precursor compositions are compositions comprising (OR4)(OR3)R2CR1SnL3, where the R groups are substituted or unsubstituted hydrocarbyl groups and L is a hydrolysable ligand. The precursors can be formed into coating that can be patterned with radiation, in particular EUV radiation. Coatings formed with blended precursors with hydrocarbyl-based ligands with some having acetal groups and others lacking acetal groups can be particularly effective for improving positive tone patterning.