公开(公告)号：US20250006495A1

公开(公告)日：2025-01-02

申请号：US18216485

申请日：2023-06-29

Applicant: Intel Corporation

Inventor： Allen Gardiner ,  Nikhil Mehta ,  Shu Zhou ,  Travis LaJoie ,  Shem Ogadhoh ,  Akash Garg ,  Van Le ,  Christopher Pelto ,  Bernhard Sell

IPC: H01L21/033 ,  H10B12/00

Abstract: A method for manufacturing integrated circuit (IC) devices includes forming first and second mask patterns with overlapping and non-overlapping features. Non-overlapping features may be removed before etching a target material layer. A third mask pattern may be formed from the overlapping features and used to etch a target material layer. The third mask pattern may be employed to make regular arrays of substantially rectangular structures.
An IC device may include an IC die, an array of structures on a layer of the IC die, and multiple groups of parallel stripes of indentations or depressions in the layer. The structures may each include a transistor and a capacitor.

公开(公告)号：US11121073B2

公开(公告)日：2021-09-14

申请号：US15943565

申请日：2018-04-02

Applicant: Intel Corporation

Inventor： Travis Lajoie ,  Abhishek Sharma ,  Juan Alzate-Vinasco ,  Chieh-Jen Ku ,  Shem Ogadhoh ,  Allen Gardiner ,  Blake Lin ,  Yih Wang ,  Pei-Hua Wang ,  Jack T. Kavalieros ,  Bernhard Sell ,  Tahir Ghani

IPC: H01L23/522 ,  H01L49/02 ,  H01L27/108 ,  H01L23/532

Abstract: An interconnect structure is disclosed. The interconnect structure includes a first metal interconnect in a bottom dielectric layer, a via that extends through a top dielectric layer, a metal plate, an intermediate dielectric layer, and an etch stop layer, and a metal in the via to extend through the top dielectric layer, the metal plate, the intermediate dielectric layer and the etch stop layer to the top surface of the first metal interconnect. The metal plate is coupled to an MIM capacitor that is parallel to the via. The second metal interconnect is on top of the metal in the via.

公开(公告)号：US12176284B2

公开(公告)日：2024-12-24

申请号：US17398933

申请日：2021-08-10

Applicant: Intel Corporation

Inventor： Travis Lajoie ,  Abhishek Sharma ,  Juan Alzate-Vinasco ,  Chieh-Jen Ku ,  Shem Ogadhoh ,  Allen Gardiner ,  Blake Lin ,  Yih Wang ,  Pei-Hua Wang ,  Jack T. Kavalieros ,  Bernhard Sell ,  Tahir Ghani

IPC: H01L23/522 ,  H01L23/532 ,  H01L49/02 ,  H10B12/00

Abstract: An interconnect structure is disclosed. The interconnect structure includes a first metal interconnect in a bottom dielectric layer, a via that extends through a top dielectric layer, a metal plate, an intermediate dielectric layer, and an etch stop layer, and a metal in the via to extend through the top dielectric layer, the metal plate, the intermediate dielectric layer and the etch stop layer to the top surface of the first metal interconnect. The metal plate is coupled to an MIM capacitor that is parallel to the via. The second metal interconnect is on top of the metal in the via.