公开(公告)号：US11300885B2

公开(公告)日：2022-04-12

申请号：US16045253

申请日：2018-07-25

Applicant: Intel Corporation

Inventor： Robert Bristol ,  Guojing Zhang ,  Tristan Tronic ,  John Magana ,  Chang Ju Choi ,  Arvind Sundaramurthy ,  Richard Schenker

IPC: G03F7/20 ,  G03F1/24

Abstract: Embodiments described herein comprise extreme ultraviolet (EUV) reticles and methods of forming EUV reticles. In an embodiment, the reticle may comprise a substrate and a mirror layer over the substrate. In an embodiment, the mirror layer comprises a plurality of alternating first mirror layers and second mirror layers. In an embodiment, a phase-shift layer is formed over the mirror layer. In an embodiment, openings for printable features and openings for non-printable features are formed into the phase-shift layer. In an embodiment, the non-printable features have a dimension that is smaller than a dimension of the printable features.

公开(公告)号：US20250164871A1

公开(公告)日：2025-05-22

申请号：US18512842

申请日：2023-11-17

Applicant: Intel Corporation

Inventor： Yoshihiro Tezuka ,  Annelise Rachel Beck ,  Chang Ju Choi ,  Eric Alan Frendberg ,  Richard Seiji Oka

IPC: G03F1/84 ,  G01N21/88 ,  G01N21/956

Abstract: Systems, apparatus, articles of manufacture, and methods to improve detection of defects in photomask blanks are disclosed. An example apparatus includes: interface circuitry; machine readable instructions; and programmable circuitry to at least one of instantiate or execute the machine readable instructions to: identify a first potential defect in a photomask blank based on an intensity value not satisfying a first threshold but satisfying a second threshold, the intensity value based on pixel data associated with a first type of inspection of the photomask blank; and designate the first potential defect as a detected defect based on first coordinates for the first potential defect being within a threshold distance of second coordinates for a second potential defect, the second potential defect identified based on a second type of inspection of the photomask blank.