公开(公告)号：US20230304795A1

公开(公告)日：2023-09-28

申请号：US17702839

申请日：2022-03-24

Applicant: Intel Corporation

Inventor： Adrian BAYRAKTAROGLU ,  David LAMPNER ,  Darko GRUJICIC

IPC: G01C19/56 ,  C25D21/10 ,  C25D17/26

CPC classification number: G01C19/56 ,  C25D21/10 ,  C25D17/26

Abstract: The present disclosure is directed to a monitoring system for a plating process using a monitoring device including a metrology component for collecting agitation intensity data on at least one agitation component within a plating equipment and transferring the collected agitation intensity data to a process control station.