公开(公告)号：US20240112962A1

公开(公告)日：2024-04-04

申请号：US17958281

申请日：2022-09-30

Applicant: Intel Corporation

Inventor： Xiao WEN ,  Dipto THAKURTA ,  Sairam SUBRAMANIAN ,  David SANCHEZ ,  Amit PALIWAL

IPC: H01L21/66 ,  G01R31/52

CPC classification number: H01L22/32 ,  G01R31/52 ,  G01R31/54

Abstract: Embodiments disclosed herein include an apparatus for alignment detection. In an embodiment, the apparatus comprises a substrate, and a plurality of devices on the substrate, where each of the plurality of devices comprises a process monitor structure with different offsets from a target value. In an embodiment, a plurality of electrically conductive traces are on the substrate, where each of the plurality of electrically conductive traces has a first end and a second end opposite the first end, and where each of the plurality of electrically conductive traces is electrically coupled at the first end, respectively, with each of the plurality of devices. In an embodiment, the second end of the each of the plurality of electrical traces is within a scan area on the substrate, and where the each of the plurality of electrically conductive traces are not directly electrically coupled with each other.