公开(公告)号：US11411173B2

公开(公告)日：2022-08-09

申请号：US16009776

申请日：2018-06-15

Applicant: Intel Corporation

Inventor： Angeline Smith ,  Justin Brockman ,  Tofizur Rahman ,  Daniel Ouellette ,  Andrew Smith ,  Juan Alzate Vinasco ,  James ODonnell ,  Christopher Wiegand ,  Oleg Golonzka

IPC: H01L43/10 ,  H01L43/02 ,  H01L43/08 ,  H01L43/12

Abstract: Material stacks for perpendicular spin transfer torque memory (pSTTM) devices, pSTTM devices and computing platforms employing such material stacks, and methods for forming them are discussed. The material stacks include a cladding layer of predominantly tungsten on a protective layer, which is in turn on an oxide capping layer over a magnetic junction stack. The cladding layer reduces oxygen dissociation from the oxide capping layer for improved thermal stability and retention.

公开(公告)号：US20190386209A1

公开(公告)日：2019-12-19

申请号：US16009776

申请日：2018-06-15

Applicant: Intel Corporation

Inventor： Angeline Smith ,  Justin Brockman ,  Tofizur Rahman ,  Daniel Ouellette ,  Andrew Smith ,  Juan Alzate Vinasco ,  James ODonnell ,  Christopher Wiegand ,  Oleg Golonzka

IPC: H01L43/10 ,  H01L43/08 ,  H01L43/02 ,  H01L43/12

Abstract: Material stacks for perpendicular spin transfer torque memory (pSTTM) devices, pSTTM devices and computing platforms employing such material stacks, and methods for forming them are discussed. The material stacks include a cladding layer of predominantly tungsten on a protective layer, which is in turn on an oxide capping layer over a magnetic junction stack. The cladding layer reduces oxygen dissociation from the oxide capping layer for improved thermal stability and retention.