公开(公告)号：US20230197599A1

公开(公告)日：2023-06-22

申请号：US17554112

申请日：2021-12-17

Applicant: Intel Corporation

Inventor： Bernd Waidhas ,  Harald Gossner ,  Wolfgang Molzer ,  Georg Seidemann ,  Michael Langenbuch ,  Martin Ostermayr ,  Joachim Singer ,  Thomas Wagner ,  Klaus Herold

IPC: H01L23/522 ,  H01L21/8238 ,  H01L23/528 ,  H01L23/535 ,  H01L27/092

CPC classification number: H01L23/5226 ,  H01L21/823821 ,  H01L21/823871 ,  H01L23/5286 ,  H01L23/535 ,  H01L27/0924

Abstract: IC devices including BPRs with integrated decoupling capacitance are disclosed. An example IC device includes a first layer comprising a transistor and a support structure adjoining the first layer. The support structure includes BPRs, which are power rails buried in the support structure, and a decoupling capacitor based on the BPRs. The conductive cores of the BPRs are the electrodes of the decoupling capacitor. The dielectric barriers of the BPRs can be the dielectric of the decupling capacitor. The dielectric of the decupling capacitor may also include a dielectric element between the BPRs. Additionally or alternatively, the IC device includes another decoupling capacitor at the backside of the support structure. The other decoupling capacitor is coupled to the BPRs and can provide additional decoupling capacitance for stabilizing power supply facilitated by the BPRs.

公开(公告)号：US20230197615A1

公开(公告)日：2023-06-22

申请号：US17557134

申请日：2021-12-21

Applicant: Intel Corporation

Inventor： Peter Baumgartner ,  Bernd Waidhas ,  Wolfgang Molzer ,  Klaus Herold ,  Joachim Singer ,  Michael Langenbuch ,  Thomas Wagner

IPC: H01L23/528 ,  H01L23/64 ,  H01L23/522

CPC classification number: H01L23/5286 ,  H01L23/645 ,  H01L23/5226

Abstract: IC devices including transformers that includes two electrically conductive layers are disclosed. An example IC device includes a transformer that includes a first coil, a second coil, and a magnetic core coupled to the two coils. The first coil includes a portion or the whole electrically conductive layers at the backside of a support structure. The second coil includes a portion or the whole electrically conductive layers at either the frontside or the backside of the support structure. The two coils may have a lateral coupling, vertical coupling, or other types of couplings. The transformer is coupled to a semiconductor device over or at least partially in the support structure. The semiconductor device may be at the frontside of the support structure. The transformer can be coupled to the semiconductor device by TSVs. The IC device may also include BPRs that facilitate backside power delivery to the semiconductor device.

公开(公告)号：US20230187353A1

公开(公告)日：2023-06-15

申请号：US17552010

申请日：2021-12-15

Applicant: Intel Corporation

Inventor： Martin Ostermayr ,  Klaus Herold ,  Joachim Singer ,  Thomas Wagner

IPC: H01L23/528

CPC classification number: H01L23/5286

Abstract: Signal routing using structures based on buried power rails (BPRs) is described. An example IC device includes a support structure, a plurality of IC components provided over the support structure, and first and second electrically conductive structures having respective portions that are buried in the support structure, such structures referred to as “buried signal rails” (BSRs). The first BSR may be electrically coupled to a terminal of one of the plurality of IC components, the second BSR may be electrically coupled to a terminal of another one of the plurality of IC components, and the IC device may further include a bridge interconnect embedded within the support structure, the bridge interconnect having a first end in contact with the first BSR and a second end in contact with the second BSR. Implementing BSRs in IC devices may allow significantly increasing standard cell library density and provide geometry-free signal routing.