公开(公告)号：US20230197599A1

公开(公告)日：2023-06-22

申请号：US17554112

申请日：2021-12-17

Applicant: Intel Corporation

Inventor： Bernd Waidhas ,  Harald Gossner ,  Wolfgang Molzer ,  Georg Seidemann ,  Michael Langenbuch ,  Martin Ostermayr ,  Joachim Singer ,  Thomas Wagner ,  Klaus Herold

IPC: H01L23/522 ,  H01L21/8238 ,  H01L23/528 ,  H01L23/535 ,  H01L27/092

CPC classification number: H01L23/5226 ,  H01L21/823821 ,  H01L21/823871 ,  H01L23/5286 ,  H01L23/535 ,  H01L27/0924

Abstract: IC devices including BPRs with integrated decoupling capacitance are disclosed. An example IC device includes a first layer comprising a transistor and a support structure adjoining the first layer. The support structure includes BPRs, which are power rails buried in the support structure, and a decoupling capacitor based on the BPRs. The conductive cores of the BPRs are the electrodes of the decoupling capacitor. The dielectric barriers of the BPRs can be the dielectric of the decupling capacitor. The dielectric of the decupling capacitor may also include a dielectric element between the BPRs. Additionally or alternatively, the IC device includes another decoupling capacitor at the backside of the support structure. The other decoupling capacitor is coupled to the BPRs and can provide additional decoupling capacitance for stabilizing power supply facilitated by the BPRs.

公开(公告)号：US20230187477A1

公开(公告)日：2023-06-15

申请号：US17548546

申请日：2021-12-12

Applicant: Intel Corporation

Inventor： Martin Ostermayr ,  Georg Seidemann ,  Walther Lutz ,  Joachim Assenmacher

IPC: H01L49/02 ,  H01L29/732

CPC classification number: H01L28/60 ,  H01L29/732

Abstract: Capacitors based on stacks of nanoribbons and associated devices and systems are disclosed. In particular, a stack of at least two nanoribbons may be used to provide a two-terminal device referred to herein as a “nanoribbon-based capacitor,” where one nanoribbon serves as a first capacitor electrode and another nanoribbon serves as a second capacitor electrode. Using portions of nanoribbon stacks to implement nanoribbon-based capacitors could provide an appealing alternative to conventional capacitor implementations because it would require only modest process changes compared to fabrication of nanoribbon-based FETs and because nanoribbon-based capacitors could be placed close to active devices. Furthermore, with a few additional process steps, nanoribbon-based capacitors may, advantageously, be extended to implement other circuit blocks such as nanoribbon-based BJTs or three-nanoribbon arrangements with a common connection between two anodes and a separate connection to a cathode.

公开(公告)号：US20230163170A1

公开(公告)日：2023-05-25

申请号：US17530836

申请日：2021-11-19

Applicant: Intel Corporation

Inventor： Martin Ostermayr ,  Joachim Assenmacher ,  Georg Seidemann ,  Klaus Herold ,  Walther Lutz

IPC: H01L29/06 ,  H01L29/423 ,  H01L29/786 ,  H01L29/66

CPC classification number: H01L29/0673 ,  H01L29/42392 ,  H01L29/78696 ,  H01L29/66742

Abstract: Fabrication methods that may provide greater versatility in tuning threshold voltage of transistors implemented in different nanoribbons within a given stack and in tuning threshold voltage of transistors implemented in adjacent nanoribbon stacks, as well as corresponding devices, are disclosed. An example fabrication method includes selectively doping portions of semiconductor layers from which individual nanoribbons will be formed later. The selective doping is performed on a layer-by-layer basis, i.e., after a given semiconductor layer is deposited and before the next layer is deposited. In this manner, some nanoribbons of a given nanoribbon stack may be doped, while other nanoribbons of the same stack may be substantially undoped, or, more generally, different nanoribbons of a given nanoribbon stack may have different dopant concentrations. The differences in the dopant concentration of different nanoribbons within the stack advantageously allows forming transistors with different threshold voltages in a single nanoribbon stack.

公开(公告)号：US20230187353A1

公开(公告)日：2023-06-15

申请号：US17552010

申请日：2021-12-15

Applicant: Intel Corporation

Inventor： Martin Ostermayr ,  Klaus Herold ,  Joachim Singer ,  Thomas Wagner

IPC: H01L23/528

CPC classification number: H01L23/5286

Abstract: Signal routing using structures based on buried power rails (BPRs) is described. An example IC device includes a support structure, a plurality of IC components provided over the support structure, and first and second electrically conductive structures having respective portions that are buried in the support structure, such structures referred to as “buried signal rails” (BSRs). The first BSR may be electrically coupled to a terminal of one of the plurality of IC components, the second BSR may be electrically coupled to a terminal of another one of the plurality of IC components, and the IC device may further include a bridge interconnect embedded within the support structure, the bridge interconnect having a first end in contact with the first BSR and a second end in contact with the second BSR. Implementing BSRs in IC devices may allow significantly increasing standard cell library density and provide geometry-free signal routing.