公开(公告)号：US20250112174A1

公开(公告)日：2025-04-03

申请号：US18374618

申请日：2023-09-28

Applicant: Intel Corporation

Inventor： Siddarth KUMAR ,  Shripad GOKHALE ,  Edvin CETEGEN ,  Praneeth NAMPALLY ,  Astitva TRIPATHI ,  Sairam AGRAHARAM

IPC: H01L23/00 ,  H01L21/3205

Abstract: Embodiments herein relate to systems, apparatuses, techniques or processes for forming an annealed shape metal alloy (SMA) on a wafer or a die complex. In embodiments, the annealed SMA, when heated above a transition temperature, may enter an Austenite phase and return to the shape that the wafer or die complex had when it was annealed. In embodiments, this may maintain a shape of a wafer or a die complex during higher temperature processing, for example during reflow, when the package undergoes fabrication. Other embodiments may be described and/or claimed.