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1.
公开(公告)号:US12067338B2
公开(公告)日:2024-08-20
申请号:US17585101
申请日:2022-01-26
Applicant: Intel Corporation
Inventor: Ranjith Kumar , Quan Shi , Mark T. Bohr , Andrew W. Yeoh , Sourav Chakravarty , Barbara A. Chappell , M. Clair Webb
IPC: G06F30/392 , G06F30/20 , G06F30/337 , G06F30/347 , G06F30/373 , G06F30/3947 , H01L27/02 , H01L27/092 , H01L27/118 , H01L27/00 , H01L27/11
CPC classification number: G06F30/392 , G06F30/337 , G06F30/347 , H01L27/0207 , H01L27/0924 , H01L27/11807 , G06F30/20 , G06F30/373 , G06F30/3947 , H01L2027/11875
Abstract: Multi version library cell handling and integrated circuit structures fabricated therefrom are described. In an example, an integrated circuit structure includes a plurality of gate lines parallel along a first direction of a substrate and having a pitch along a second direction orthogonal to the first direction. A first version of a cell type is over a first portion of the plurality of gate lines, the first version of the cell type including a first plurality of interconnect lines having a second pitch along the second direction, the second pitch less than the first pitch.
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2.
公开(公告)号:US11271010B2
公开(公告)日:2022-03-08
申请号:US16629802
申请日:2017-09-20
Applicant: Intel Corporation
Inventor: Ranjith Kumar , Quan Shi , Mark T. Bohr , Andrew W. Yeoh , Sourav Chakravarty , Barbara A. Chappell , M. Clair Webb
IPC: H01L27/118 , G06F30/392 , H01L27/02 , H01L27/092
Abstract: Multi version library cell handling and integrated circuit structures fabricated therefrom are described. In an example, an integrated circuit structure includes a plurality of gate lines parallel along a first direction of a substrate and having a pitch along a second direction orthogonal to the first direction. A first version of a cell type is over a first portion of the plurality of gate lines, the first version of the cell type including a first plurality of interconnect lines having a second pitch along the second direction, the second pitch less than the first pitch.
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公开(公告)号:US11068640B2
公开(公告)日:2021-07-20
申请号:US16649588
申请日:2017-12-28
Applicant: Intel Corporation
Inventor: Ranjith Kumar , Mark T. Bohr , Ruth A. Brain , Marni Nabors , Tai-Hsuan Wu , Sourav Chakravarty
IPC: G06F30/3953 , G06F113/18 , G06F115/08 , H01L23/50 , H01L23/522
Abstract: An integrated circuit structure includes a metal level comprising a plurality of interconnect lines along a first direction. A cell is on the metal level, wherein one or more of the plurality of interconnect lines that extend through the cell comprise a power shared track that is segmented inside the cell into one or more power segments and one or more signal segments so that both power and signals share a same track.
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