-
公开(公告)号:US11195998B2
公开(公告)日:2021-12-07
申请号:US16895555
申请日:2020-06-08
Applicant: Intel Corporation
Inventor: Karthik Sarpatwari , Dale Collins , Anna Maria Conti , Fred Daniel Gealy, III , Andrea Gotti , Swapnil Lengade , Stephen Russell
Abstract: A memory structure can include a memory cell and a first barrier layer having a maximum hydrogen diffusion coefficient of 1×10−17 cm2/s, said first barrier layer adjacent to the memory cell to minimize contaminant movement to or from the memory cell.
-
公开(公告)号:US10680175B1
公开(公告)日:2020-06-09
申请号:US16229544
申请日:2018-12-21
Applicant: Intel Corporation
Inventor: Karthik Sarpatwari , Dale Collins , Anna Maria Conti , Fred Daniel Gealy, III , Andrea Gotti , Swapnil Lengade , Stephen Russell
Abstract: A memory structure can include a memory cell and a first barrier layer having a maximum hydrogen diffusion coefficient of 1×10−17 cm2/s, said first barrier layer adjacent to the memory cell to minimize contaminant movement to or from the memory cell.
-
公开(公告)号:US20200303642A1
公开(公告)日:2020-09-24
申请号:US16895555
申请日:2020-06-08
Applicant: Intel Corporation
Inventor: Karthik Sarpatwari , Dale Collins , Anna Maria Conti , Fred Daniel Gealy, III , Andrea Gotti , Swapnil Lengade , Stephen Russell
Abstract: A memory structure can include a memory cell and a first barrier layer having a maximum hydrogen diffusion coefficient of 1×10−17 cm2/s, said first barrier layer adjacent to the memory cell to minimize contaminant movement to or from the memory cell.
-
公开(公告)号:US11133461B2
公开(公告)日:2021-09-28
申请号:US14497801
申请日:2014-09-26
Applicant: Intel Corporation
Inventor: Christopher Petz , Dale Collins , Tsz-Wah Chan , Swapnil Lengade , Yongjun Hu , Allen McTeer
IPC: H01L45/00 , H01L21/768 , H01L27/24
Abstract: Devices and systems having a diffusion barrier for limiting diffusion of a phase change material including an electrode, a phase change material electrically coupled to the electrode, and a carbon and TiN (C:TiN) diffusion barrier disposed between the electrode and the phase change material to limit diffusion of the phase change material are disclosed and described.
-
-
-