公开(公告)号：US20140102488A1

公开(公告)日：2014-04-17

申请号：US14102830

申请日：2013-12-11

Applicant: Intermolecular, Inc.

Inventor： Satbir Kahlon ,  Frank Ma

IPC: H01L21/67 ,  B08B3/10

CPC classification number: H01L21/67051 ,  B08B3/10 ,  H01L21/67034 ,  H01L21/6719

Abstract: A method and system for cleaning a substrate in a multi-module cleaning assembly is provided. The method begins by receiving the substrate into the cleaning module. A cleaning chemistry, at a temperature elevated from an ambient temperature, is applied onto a top surface of the substrate. Concurrent with application of the cleaning chemistry, vapors are exhausted from the cleaning chemistry through a port located below a bottom surface of the substrate with the vapor exhaustion providing a negative pressure relative to a pressure external to the cleaning module. The application of the cleaning chemistry is terminated, followed by termination of the exhausting of the vapors. The substrate is dried after the flowing of inert gas is terminated.

Abstract translation: 提供了一种用于在多模块清洁组件中清洁基板的方法和系统。 该方法通过将衬底接收到清洁模块中开始。 在从环境温度升高的温度下的清洁化学品被施加到基底的顶表面上。 与清洁化学品的应用同时，蒸汽通过位于基底底表面下方的端口从清洁化学品中排出，蒸汽耗尽相对于清洁模块外部的压力提供负压。 终止清洁化学品的应用，然后终止蒸气排气。 在终止惰性气体的流动之后干燥基材。