公开(公告)号：US20140102488A1

公开(公告)日：2014-04-17

申请号：US14102830

申请日：2013-12-11

申请人： Intermolecular, Inc.

发明人： Satbir Kahlon ,  Frank Ma

IPC分类号： H01L21/67 ,  B08B3/10

CPC分类号： H01L21/67051 ,  B08B3/10 ,  H01L21/67034 ,  H01L21/6719

摘要： A method and system for cleaning a substrate in a multi-module cleaning assembly is provided. The method begins by receiving the substrate into the cleaning module. A cleaning chemistry, at a temperature elevated from an ambient temperature, is applied onto a top surface of the substrate. Concurrent with application of the cleaning chemistry, vapors are exhausted from the cleaning chemistry through a port located below a bottom surface of the substrate with the vapor exhaustion providing a negative pressure relative to a pressure external to the cleaning module. The application of the cleaning chemistry is terminated, followed by termination of the exhausting of the vapors. The substrate is dried after the flowing of inert gas is terminated.

摘要翻译： 提供了一种用于在多模块清洁组件中清洁基板的方法和系统。 该方法通过将衬底接收到清洁模块中开始。 在从环境温度升高的温度下的清洁化学品被施加到基底的顶表面上。 与清洁化学品的应用同时，蒸汽通过位于基底底表面下方的端口从清洁化学品中排出，蒸汽耗尽相对于清洁模块外部的压力提供负压。 终止清洁化学品的应用，然后终止蒸气排气。 在终止惰性气体的流动之后干燥基材。

公开(公告)号：US20170104031A1

公开(公告)日：2017-04-13

申请号：US15287091

申请日：2016-10-06

申请人： Intermolecular, Inc.

发明人： Mark Clark ,  Prashant Phatak ,  Charlene Chen ,  Ashish Bodke ,  Salil Mujumdar ,  Federico Nardi ,  Satbir Kahlon ,  Sergey V. Barabash ,  Feihu Wang

IPC分类号： H01L27/24 ,  G11C11/16 ,  G11C13/00 ,  H01L45/00 ,  H01L27/22

CPC分类号： G11C11/1659 ,  G11C13/003 ,  G11C2213/53 ,  G11C2213/72 ,  G11C2213/76 ,  H01L27/224 ,  H01L27/2409 ,  H01L45/085 ,  H01L45/1233 ,  H01L45/1266 ,  H01L45/143 ,  H01L45/144

摘要： Provided are selector elements with active components comprising insulating matrices and mobile ions disposed within these insulating matrices. Also provided are methods of operating such selector elements. The insulating matrices and mobile ions may be formed from different combinations of materials. For example, the insulating matrix may comprise amorphous silicon or silicon oxide, while mobile ions may be silver ions. In another example, the active component comprises copper and germanium, selenium, or tellerium, e.g., Se61Cu39, Se67Cu33, or Se56Cu44. The active component may be a multilayered structure with a variable composition throughout the structure. For example, the concentration of mobile ions may be higher in a center of the structure, away from the electrode interfaces. In some embodiments, outer layers may be formed from Ge33Se24Cu47, while the middle layer may be formed from Ge47Se29Cu24.

公开(公告)号：US20160118309A1

公开(公告)日：2016-04-28

申请号：US14525944

申请日：2014-10-28

申请人： Intermolecular, Inc.

发明人： Rajesh Kelekar ,  Satbir Kahlon ,  Robert Sculac

IPC分类号： H01L21/66 ,  H01L21/288 ,  H01L21/67 ,  H01L21/311 ,  H01L21/3213 ,  H01L21/02 ,  H01L21/306

CPC分类号： H01L22/26 ,  H01L21/02057 ,  H01L21/02282 ,  H01L21/02623 ,  H01L21/288 ,  H01L21/30604 ,  H01L21/31111 ,  H01L21/31133 ,  H01L21/32134 ,  H01L21/67023 ,  H01L21/6704 ,  H01L21/67075 ,  H01L21/6708 ,  H01L21/6719 ,  H01L22/20

摘要： Embodiments provided herein describe systems and methods for processing substrates. A substrate having a first region and a second region is provided. A container is positioned proximate to the first region of the substrate. The container has an opening on an end thereof adjacent to the substrate. A processing liquid is dispensed into the container such that the processing liquid contacts the first region of the substrate through the opening. The gaseous pressure in a portion of the container devoid of the processing liquid is reduced. The reduction of the gaseous pressure prevents the processing liquid from flowing from the first region of the substrate to the second region of the substrate.

摘要翻译： 本文提供的实施例描述了用于处理衬底的系统和方法。 提供具有第一区域和第二区域的衬底。 容器位于基底的第一区域附近。 容器在与基板相邻的端部上具有开口。 处理液体被分配到容器中，使得处理液体通过开口接触基板的第一区域。 没有处理液体的容器的一部分中的气体压力降低。 气体压力的降低防止处理液体从衬底的第一区域流到衬底的第二区域。

公开(公告)号：US20160111302A1

公开(公告)日：2016-04-21

申请号：US14519363

申请日：2014-10-21

申请人： Intermolecular, Inc.

发明人： Satbir Kahlon ,  Bernardo Donoso ,  Jeffrey Chih-Hou Lowe ,  Robert Sculac

IPC分类号： H01L21/67 ,  B08B3/02 ,  B08B3/04 ,  B05B15/04 ,  B05B3/02

CPC分类号： B08B3/02 ,  B08B3/04 ,  B08B2203/0264 ,  H01L21/67051

摘要： Embodiments provided herein provide systems and methods for wet processing substrates with a rotating splash shield. The systems include a fluid dispenser configured to dispense a processing fluid. A substrate support configured to support and rotate a substrate is also included. The substrate support is disposed such that the processing fluid dispensed by the fluid dispenser flows onto the substrate. A splash shield is positioned on at least one side of the substrate support and is configured to rotate. The splash shield has an upper portion extending above an upper surface of the substrate and a lower portion extending below a lower surface of the substrate.

摘要翻译： 本文提供的实施例提供了用于湿处理具有旋转防溅罩的基板的系统和方法。 该系统包括配置成分配处理流体的流体分配器。 还包括构造成支撑和旋转衬底的衬底支撑件。 衬底支撑件设置成使得由流体分配器分配的处理流体流到衬底上。 防溅罩位于基板支撑件的至少一侧上并且被构造成旋转。 防溅罩具有在基板的上表面上方延伸的上部和在基板的下表面下方延伸的下部。

公开(公告)号：US09223319B2

公开(公告)日：2015-12-29

申请号：US13724786

申请日：2012-12-21

申请人： Intermolecular, Inc.

发明人： Satbir Kahlon ,  Jeffrey Chih-Hou Lowe ,  Wen-Guang Yu

IPC分类号： G05D11/13

CPC分类号： G05D11/138

摘要： A system and method for providing a plurality of diluted solutions are disclosed. Successive dilution operations are performed upon mixing vessels substantially simultaneously. Measured source volumes of a source solution are placed into the mixing vessels. First measured volumes of a liquid are added to the mixing vessels. Measured first waste volumes are dispensed from the mixing vessels. Second measured volumes of the liquid are added to the mixing vessels. Measured second waste volumes are dispensed from the mixing vessels. Third measured volumes of the liquid are added to the mixing vessels. Each vessel has an individual target dilution ratio. Measured volumes and number of dilution operations are individual to each of the mixing vessels.

摘要翻译： 公开了一种用于提供多种稀释溶液的系统和方法。 基本上同时进行混合容器的连续稀释操作。 将源溶液的测量源体积放入混合容器中。 将第一体积的液体加入到混合容器中。 测量的第一废物体积从混合容器中分配。 将液体的第二测量体积加到混合容器中。 从混合容器中分配测量的第二废物体积。 将液体的第三测量体积加到混合容器中。 每个容器具有单独的目标稀释比。 测量体积和稀释操作次数对于每个混合容器是独立的。

公开(公告)号：US20140174481A1

公开(公告)日：2014-06-26

申请号：US14189014

申请日：2014-02-25

申请人： Intermolecular, Inc.

发明人： Satbir Kahlon ,  Jeffrey Chih-Hou Lowe ,  Frank C. Ma ,  Sandeep Mariserla ,  Robert Anthony Sculac

IPC分类号： H01L21/02

CPC分类号： H01L21/02041 ,  B08B3/04 ,  C11D11/0047 ,  C11D11/0064 ,  C11D11/007 ,  H01L21/67028 ,  H01L21/67109 ,  H01L21/67115 ,  H01L21/6719

摘要： The embodiments describe methods for controlling the particles generated when cleaning and drying a wafer in a spin rinse dryer (SRD) module. In some embodiments, the substrate surface is cooled by dispensing deionized (DI) water across the surface of the substrate, while the substrate rests on the SRD chuck. In addition, a method for controlling the particles generated when sleeves in a processing module or SRD contact a substrate surface during a clamping operation or when the sleeves are removed from the substrate surface is provided. A bottom edge or lip of the sleeves and/or the surface of the wafer contacting the sleeve is wetted during clamping/unclamping operations. Alternatively, the substrate may be wetted prior to clamping/unclamping operations.

摘要翻译： 实施例描述了用于控制在旋转冲洗干燥器（SRD）模块中清洁和干燥晶片时产生的颗粒的方法。 在一些实施例中，通过在衬底的表面上分配去离子（DI）水来冷却衬底表面，同时衬底搁置在SRD卡盘上。 此外，提供了一种用于控制在夹持操作期间或当衬套从衬底表面移除时在处理模块或SRD中的套筒接触衬底表面时产生的颗粒的方法。 在夹紧/松开操作期间，套筒的底部边缘或/或与晶片接触的晶片表面被润湿。 或者，在夹紧/松开操作之前可以润湿基底。

公开(公告)号：US09076674B2

公开(公告)日：2015-07-07

申请号：US13626649

申请日：2012-09-25

申请人： Intermolecular, Inc.

发明人： Satbir Kahlon

IPC分类号： H01L21/66 ,  H01L21/67

CPC分类号： H01L22/10 ,  H01L21/6719

摘要： A method for combinatorially processing a substrate is provided. The method includes providing a substrate disposed on a substrate support. The method further includes rigidly locking a top portion of a sleeve to a bottom portion of a process head of a combinatorial processing device, where the combinatorial processing device is operable to concurrently process different regions of the substrate differently. The method includes raising the substrate and the substrate support to contact a sealing surface of the sleeve with a surface of the substrate and combinatorially processing the different regions of the substrate.

摘要翻译： 提供了一种用于组合处理衬底的方法。 该方法包括提供设置在基板支撑件上的基板。 该方法还包括将套筒的顶部刚性地锁定到组合处理装置的过程头部的底部，其中组合处理装置可操作以不同地同时处理衬底的不同区域。 该方法包括升高衬底和衬底支撑件以使衬套的密封表面与衬底的表面接触并且组合地处理衬底的不同区域。

公开(公告)号：US08893923B2

公开(公告)日：2014-11-25

申请号：US13687906

申请日：2012-11-28

申请人： Intermolecular, Inc.

发明人： Satbir Kahlon ,  Aaron T. Francis ,  Chi-I Lang ,  Gregory P. Lim ,  Jeffrey Chih-Hou Lowe ,  Robert Anthony Sculac

IPC分类号： B67B7/00 ,  H01L21/00

CPC分类号： H01L21/00 ,  H01L21/67017 ,  H01L21/6715 ,  Y10T137/0318 ,  Y10T137/0424 ,  Y10T137/86493 ,  Y10T137/87249 ,  Y10T137/87281

摘要： Provided are methods and systems for dispensing different chemicals used for high productivity combinatorial processing. A dispense panel may include multiple inlet lines for supplying different chemicals. Each inlet line is connected to its own three-way valve that either allows the supplied chemical to flow from the inlet line towards a dispense valve connected to a dispense manifold (during dispensing of the supplied chemical) or allows another chemical to flow from the dispense valve to a waste manifold (during priming of the dispense manifold with this other chemical). Specifically, during priming a chemical supplied from its inlet line and is passed through a corresponding three-way valve and is directed to its dispense valve and then into the dispense manifold. Other dispense valves and three-way valves of the dispense panel allow this chemical to flow out of the dispense manifold, thereby priming remaining parts of the panel.

摘要翻译： 提供了用于分配用于高生产率组合处理的不同化学品的方法和系统。 分配面板可以包括用于供应不同化学品的多个入口管线。 每个入口管路连接到其自己的三通阀，其允许供应的化学品从入口管线流向连接到分配歧管的分配阀（在分配供应的化学品期间）或允许另一种化学品从分配流出 阀门到废液歧管（在使用这种其他化学品的分配歧管启动期间）。 具体来说，在从其入口管线引入化学物质并通过相应的三通阀时，被引导到其分配阀然后进入分配歧管。 分配面板的其他分配阀和三通阀允许该化学品流出分配歧管，从而引发面板的剩余部分。

公开(公告)号：US20140177378A1

公开(公告)日：2014-06-26

申请号：US13724786

申请日：2012-12-21

申请人： INTERMOLECULAR, INC.

发明人： Satbir Kahlon ,  Jeffrey Chih-Hou Lowe ,  Wen Guang David Yu

IPC分类号： B01F15/04

CPC分类号： G05D11/138

摘要： A system and method for providing a plurality of diluted solutions are disclosed. Successive dilution operations are performed upon mixing vessels substantially simultaneously. Measured source volumes of a source solution are placed into the mixing vessels. First measured volumes of a liquid are added to the mixing vessels. Measured first waste volumes are dispensed from the mixing vessels. Second measured volumes of the liquid are added to the mixing vessels. Measured second waste volumes are dispensed from the mixing vessels. Third measured volumes of the liquid are added to the mixing vessels. Each vessel has an individual target dilution ratio. Measured volumes and number of dilution operations are individual to each of the mixing vessels.

摘要翻译： 公开了一种用于提供多种稀释溶液的系统和方法。 基本上同时进行混合容器的连续稀释操作。 将源溶液的测量源体积放入混合容器中。 将第一体积的液体加入到混合容器中。 测量的第一废物体积从混合容器中分配。 将液体的第二测量体积加到混合容器中。 从混合容器中分配测量的第二废物体积。 将液体的第三测量体积加到混合容器中。 每个容器具有单独的目标稀释比。 测量体积和稀释操作次数对于每个混合容器是独立的。

公开(公告)号：US20140174656A1

公开(公告)日：2014-06-26

申请号：US13722170

申请日：2012-12-20

申请人： INTERMOLECULAR, INC.

发明人： Satbir Kahlon ,  Jeffrey Lowe

IPC分类号： B05C11/00

CPC分类号： H01L21/67017 ,  H01L21/67086

摘要： Methods and apparatuses for combinatorial processing are disclosed. Apparatuses include a wet etch module (WEM) operable to combinatorially etch a substrate having at least two site-isolated regions. The WEM includes a dispense manifold operable to dispense fluids and a mixing vessel unit operable to mix fluids. The WEM further includes a reactor unit operable to receive fluids from the dispense manifold or the mixing vessel unit. The reactor unit can apply a combinatorial process on a substrate having at least two site-isolated regions within the WEM. In addition, a secondary containment unit, having a leak sensor therein, is coupled to the dispense manifold, mixing vessel unit, or reactor unit to receive fluid leaks within the system. When the leak sensor detects a fluid leak, a warning may be generated. Advantageously, the generated warning does not impede substrate processing within the WEM.

摘要翻译： 公开了用于组合处理的方法和装置。 设备包括湿蚀刻模块（WEM），其可操作以组合蚀刻具有至少两个位置隔离区域的衬底。 WEM包括可分配流体的分配歧管和可操作以混合流体的混合容器单元。 WEM还包括可操作以从分配歧管或混合容器单元接收流体的反应器单元。 反应器单元可以在WEM中具有至少两个位置隔离区域的基底上施加组合方法。 此外，在其中具有泄漏传感器的辅助容纳单元联接到分配歧管，混合容器单元或反应器单元以接收系统内的流体泄漏。 当泄漏传感器检测到液体泄漏时，可能会产生警告。 有利地，产生的警告不妨碍WEM内的衬底处理。