公开(公告)号：US11561481B2

公开(公告)日：2023-01-24

申请号：US16932983

申请日：2020-07-20

申请人： International Business Machines Corporation

发明人： Cody J. Murray ,  Ekmini Anuja De Silva ,  Christopher Frederick Robinson ,  Luciana Meli

IPC分类号： G03F7/20 ,  G03F7/38 ,  G06T7/00

摘要： Techniques for using open frame (E0) exposures for lithographic tool track/cluster monitoring are provided. In one aspect, a method for monitoring a lithographic process includes: performing open frame exposures E0 of at least one wafer coated with a photoresist using a photolithography tool; baking and developing the at least one wafer; performing a defect inspection of the at least one wafer to generate a haze map; grouping haze data from the haze map; and analyzing the haze data to identify a maximum E0 response dose E′.

公开(公告)号：US20220019139A1

公开(公告)日：2022-01-20

申请号：US16932983

申请日：2020-07-20

申请人： International Business Machines Corporation

发明人： Cody J. Murray ,  Ekmini Anuja De Silva ,  Christopher Frederick Robinson ,  Luciana Meli

IPC分类号： G03F1/70 ,  G03F7/20 ,  G03F1/84 ,  G03F7/38 ,  G06T7/00

摘要： Techniques for using open frame (E0) exposures for lithographic tool track/cluster monitoring are provided. In one aspect, a method for monitoring a lithographic process includes: performing open frame exposures E0 of at least one wafer coated with a photoresist using a photolithography tool; baking and developing the at least one wafer; performing a defect inspection of the at least one wafer to generate a haze map; grouping haze data from the haze map; and analyzing the haze data to identify a maximum E0 response dose E′.