专利检索 ap:("JIANSHE TANG" OR "Wei Lu" OR "Bo Xie" OR "Elias Martinez" OR "Zhiyong Li" OR "Kent Child" OR "Richard Endo" OR "Konstantin Smekalin") AND inv:"JIANSHE TANG" 第 1 页

1.

发明申请
METHOD AND APPARATUS OF MULTI STEPS ATOMIZATION FOR GENERATING SMALLER DIW DROPPLETS FOR WAFER CLEANING 审中-公开
标题翻译：用于生成用于清洁的小型二极管的多步骤原理的方法和装置

公开(公告)号：US20080163891A1

公开(公告)日：2008-07-10

申请号：US11621855

申请日：2007-01-10

申请人： JIANSHE TANG , Wei Lu , Bo Xie , Elias Martinez , Zhiyong Li , Kent Child , Richard Endo , Konstantin Smekalin

发明人： JIANSHE TANG , Wei Lu , Bo Xie , Elias Martinez , Zhiyong Li , Kent Child , Richard Endo , Konstantin Smekalin

IPC分类号： B08B3/00

CPC分类号： H01L21/02065 , H01L21/02057 , H01L21/67051

摘要： An apparatus for cleaning a wafer has a first chamber and a component coupled to the first chamber. The first chamber has a first input to form de-ionized water droplets. The component is coupled to the first chamber to further atomize and apply the atomized de-ionized water droplets on the wafer.

摘要翻译： 用于清洁晶片的装置具有第一室和耦合到第一室的部件。第一室具有形成去离子水滴的第一输入。该组件耦合到第一室以进一步雾化并将雾化的去离子水滴施加在晶片上。

2.

发明申请
TWO STEP PROCESS FOR POST ASH CLEANING FOR CU/LOW-K DUAL DAMASCENE STRUCTURE WITH METAL HARD MASK 审中-公开
标题翻译：用于具有金属硬掩模的CU / LOW-K双重结构结构的自动清洁的两步法

公开(公告)号：US20080163897A1

公开(公告)日：2008-07-10

申请号：US11621867

申请日：2007-01-10

申请人： JIANSHE TANG , Willey Weng , Wei Lu , Han-Wen Chen , Tseng-Chung Lee , Ching Hwa Weng

发明人： JIANSHE TANG , Willey Weng , Wei Lu , Han-Wen Chen , Tseng-Chung Lee , Ching Hwa Weng

IPC分类号： B08B3/04

CPC分类号： C11D11/0047 , C11D3/3947 , C11D7/08 , H01L21/02063 , H01L21/02068

摘要： A method and apparatus for removing residue on a wafer is described. A first solution is applied to remove a first type of residue from a metal mask on the wafer. A second solution is applied to remove a second type of residue from the metal mask on the wafer.

摘要翻译： 描述了用于去除晶片上残留物的方法和装置。应用第一种方案从晶片上的金属掩模中除去第一类型的残留物。应用第二种解决方案来从晶片上的金属掩模中除去第二类型的残余物。