公开(公告)号：US20210278764A1

公开(公告)日：2021-09-09

申请号：US17320640

申请日：2021-05-14

Applicant: JSR CORPORATION

Inventor： Hiroki NAKAGAWA ,  Hiromitsu NAKASHIMA ,  Gouji WAKAMATSU ,  Kentarou GOTOU ,  Yukio NISHIMURA ,  Takeo SHIOYA

IPC: G03F7/004 ,  C08F220/18 ,  C08F220/24 ,  C08F220/28 ,  G03F7/039 ,  G03F7/20 ,  G03F7/16 ,  G03F7/32 ,  G03F7/38 ,  G03F7/40

Abstract: An object of the present invention is to provide a novel fluorine-containing polymer, a radiation-sensitive resin composition for liquid immersion lithography which contains the fluorine-containing polymer, which leads to a pattern having an excellent shape and excellent depth of focus, wherein the amount of an eluted component in a liquid for liquid immersion lithography such as water that comes in contact with the resist during exposure in liquid immersion lithography is little, and which provides a larger receding contact angle between the resist film and the liquid for liquid immersion lithography such as water, and a method for purifying the fluorine-containing polymer. The present resin composition comprises a novel fluorine-containing polymer (A) containing repeating units represented by the general formulae (1) and (2) and having Mw of 1,000-50,000, a resin (B) having an acid-unstable group, a radiation-sensitive acid generator (C), a nitrogen-containing compound (D) and a solvent (E).

公开(公告)号：US20160062237A1

公开(公告)日：2016-03-03

申请号：US14933641

申请日：2015-11-05

Applicant: JSR CORPORATION

Inventor： Hiroki NAKAGAWA ,  Hiromitsu NAKASHIMA ,  Gouji WAKAMATSU ,  Kentarou GOTOU ,  Yukio NISHIMURA ,  Takeo SHIOYA

IPC: G03F7/039 ,  G03F7/004

CPC classification number: G03F7/0046 ,  C08F220/18 ,  C08F220/24 ,  C08F220/28 ,  G03F7/0045 ,  G03F7/039 ,  G03F7/0397 ,  G03F7/162 ,  G03F7/168 ,  G03F7/2006 ,  G03F7/2041 ,  G03F7/322 ,  G03F7/38 ,  G03F7/40

Abstract: An object of the present invention is to provide a novel fluorine-containing polymer, a radiation-sensitive resin composition for liquid immersion lithography which contains the fluorine-containing polymer, which leads to a pattern having an excellent shape and excellent depth of focus, wherein the amount of an eluted component in a liquid for liquid immersion lithography such as water that comes in contact with the resist during exposure in liquid immersion lithography is little, and which provides a larger receding contact angle between the resist film and the liquid for liquid immersion lithography such as water, and a method for purifying the fluorine-containing polymer. The present resin composition comprises a novel fluorine-containing polymer (A) containing repeating units represented by the general formulae (1) and (2) and having Mw of 1,000-50,000, a resin (B) having an acid-unstable group, a radiation-sensitive acid generator (C), a nitrogen-containing compound (D) and a solvent (E).

公开(公告)号：US20190278175A9

公开(公告)日：2019-09-12

申请号：US16104182

申请日：2018-08-17

Applicant: JSR CORPORATION

Inventor： Hiroki NAKAGAWA ,  Hiromitsu NAKASHIMA ,  Gouji WAKAMATSU ,  Kentarou GOTOU ,  Yukio NISHIMURA ,  Takeo SHIOYA

IPC: G03F7/004 ,  G03F7/039 ,  C08F220/28 ,  C08F220/24 ,  C08F220/18 ,  G03F7/40 ,  G03F7/32 ,  G03F7/16 ,  G03F7/20 ,  G03F7/38

Abstract: An object of the present invention is to provide a novel fluorine-containing polymer, a radiation-sensitive resin composition for liquid immersion lithography which contains the fluorine-containing polymer, which leads to a pattern having an excellent shape and excellent depth of focus, wherein the amount of an eluted component in a liquid for liquid immersion lithography such as water that comes in contact with the resist during exposure in liquid immersion lithography is little, and which provides a larger receding contact angle between the resist film and the liquid for liquid immersion lithography such as water, and a method for purifying the fluorine-containing polymer. The present resin composition comprises a novel fluorine-containing polymer (A) containing repeating units represented by the general formulae (1) and (2) and having Mw of 1,000-50,000, a resin (B) having an acid-unstable group, a radiation-sensitive acid generator (C), a nitrogen-containing compound (D) and a solvent (E).

公开(公告)号：US20220137508A9

公开(公告)日：2022-05-05

申请号：US17320640

申请日：2021-05-14

Applicant: JSR CORPORATION

Inventor： Hiroki NAKAGAWA ,  Hiromitsu NAKASHIMA ,  Gouji WAKAMATSU ,  Kentarou GOTOU ,  Yukio NISHIMURA ,  Takeo SHIOYA

IPC: G03F7/004 ,  C08F220/18 ,  C08F220/24 ,  C08F220/28 ,  G03F7/039 ,  G03F7/20 ,  G03F7/16 ,  G03F7/32 ,  G03F7/38 ,  G03F7/40

Abstract: An object of the present invention is to provide a novel fluorine-containing polymer, a radiation-sensitive resin composition for liquid immersion lithography which contains the fluorine-containing polymer, which leads to a pattern having an excellent shape and excellent depth of focus, wherein the amount of an eluted component in a liquid for liquid immersion lithography such as water that comes in contact with the resist during exposure in liquid immersion lithography is little, and which provides a larger receding contact angle between the resist film and the liquid for liquid immersion lithography such as water, and a method for purifying the fluorine-containing polymer. The present resin composition comprises a novel fluorine-containing polymer (A) containing repeating units represented by the general formulae (1) and (2) and having Mw of 1,000-50,000, a resin (B) having an acid-unstable group, a radiation-sensitive acid generator (C), a nitrogen-containing compound (D) and a solvent (E).

公开(公告)号：US20190025695A1

公开(公告)日：2019-01-24

申请号：US16104182

申请日：2018-08-17

Applicant: JSR CORPORATION

Inventor： Hiroki NAKAGAWA ,  Hiromitsu NAKASHIMA ,  Gouji WAKAMATSU ,  Kentarou GOTOU ,  Yukio NISHIMURA ,  Takeo SHIOYA

IPC: G03F7/004 ,  G03F7/039 ,  C08F220/28 ,  C08F220/24 ,  C08F220/18 ,  G03F7/40 ,  G03F7/32 ,  G03F7/16 ,  G03F7/20 ,  G03F7/38

CPC classification number: G03F7/0046 ,  C08F220/18 ,  C08F220/24 ,  C08F220/28 ,  G03F7/0045 ,  G03F7/039 ,  G03F7/0397 ,  G03F7/162 ,  G03F7/168 ,  G03F7/2006 ,  G03F7/2041 ,  G03F7/322 ,  G03F7/38 ,  G03F7/40

Abstract: An object of the present invention is to provide a novel fluorine-containing polymer, a radiation-sensitive resin composition for liquid immersion lithography which contains the fluorine-containing polymer, which leads to a pattern having an excellent shape and excellent depth of focus, wherein the amount of an eluted component in a liquid for liquid immersion lithography such as water that comes in contact with the resist during exposure in liquid immersion lithography is little, and which provides a larger receding contact angle between the resist film and the liquid for liquid immersion lithography such as water, and a method for purifying the fluorine-containing polymer. The present resin composition comprises a novel fluorine-containing polymer (A) containing repeating units represented by the general formulae (1) and (2) and having Mw of 1,000-50,000, a resin (B) having an acid-unstable group, a radiation-sensitive acid generator (C), a nitrogen-containing compound (D) and a solvent (E).