RADIATION-SENSITIVE RESIN COMPOSITION, POLYMER AND COMPOUND
    1.
    发明申请
    RADIATION-SENSITIVE RESIN COMPOSITION, POLYMER AND COMPOUND 有权
    辐射敏感性树脂组合物,聚合物和化合物

    公开(公告)号:US20130189621A1

    公开(公告)日:2013-07-25

    申请号:US13789701

    申请日:2013-03-08

    Abstract: A radiation-sensitive resin composition includes a polymer having a structural unit represented by a formula (I). In the formula (I), R1 represents a hydrogen atom or a methyl group. X represents a bivalent alicyclic hydrocarbon group not having or having a substituent. Y represents a bivalent hydrocarbon group having 1 to 20 carbon atoms. R2 represents a methyl group or a trifluoromethyl group.

    Abstract translation: 辐射敏感性树脂组合物包括具有由式(I)表示的结构单元的聚合物。 在式(I)中,R 1表示氢原子或甲基。 X表示不具有或具有取代基的二价脂环族烃基。 Y表示碳原子数为1〜20的二价烃基。 R2表示甲基或三氟甲基。

    RADIATION-SENSITIVE RESIN COMPOSITION, PATTERN-FORMING METHOD, POLYMER, AND COMPOUND
    2.
    发明申请
    RADIATION-SENSITIVE RESIN COMPOSITION, PATTERN-FORMING METHOD, POLYMER, AND COMPOUND 审中-公开
    辐射敏感性树脂组合物,图案形成方法,聚合物和化合物

    公开(公告)号:US20130260315A1

    公开(公告)日:2013-10-03

    申请号:US13905166

    申请日:2013-05-30

    Abstract: A radiation-sensitive resin composition includes a polymer component that includes one or more types of polymers, and a radiation-sensitive acid generator. At least one type of the polymer of the polymer component includes a first structural unit represented by a following formula (1). R1 represents a hydrogen atom, a fluorine atom, a methyl group or a trifluoromethyl group. R2 represents a linear alkyl group having 5 to 21 carbon atoms. Z represents a divalent alicyclic hydrocarbon group or an aliphatic heterocyclic group having a ring skeleton which has 4 to 20 atoms. A part or all of hydrogen atoms included in the alicyclic hydrocarbon group and the aliphatic heterocyclic group represented by Z are not substituted or substituted.

    Abstract translation: 辐射敏感性树脂组合物包括包含一种或多种聚合物的聚合物组分和辐射敏感性酸产生剂。 至少一种聚合物组分的聚合物包括由下式(1)表示的第一结构单元。 R1表示氢原子,氟原子,甲基或三氟甲基。 R2表示碳原子数为5〜21的直链烷基。 Z表示二价脂环族烃基或具有4〜20个原子的环骨架的脂肪族杂环基。 由脂环族烃基和Z表示的脂肪族杂环基中的一部分或全部氢原子不被取代或取代。

    RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, POLYMER AND COMPOUND
    3.
    发明申请
    RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, POLYMER AND COMPOUND 审中-公开
    辐射敏感性树脂组合物,形成耐火图案的方法,聚合物和化合物

    公开(公告)号:US20130022912A1

    公开(公告)日:2013-01-24

    申请号:US13629992

    申请日:2012-09-28

    Abstract: A radiation-sensitive resin composition includes a first polymer having a structural unit represented by a following formula (1), and a radiation-sensitive acid generator. RC in the formula (1) preferably represents an aliphatic polycyclic hydrocarbon group having a valency of (n+1) and having 4 to 30 carbon atoms. The structural unit represented by the formula (1) is preferably a structural unit represented by a n following formula (1-1).

    Abstract translation: 辐射敏感性树脂组合物包括具有由下式(1)表示的结构单元的第一聚合物和辐射敏感性酸产生剂。 式(1)中的RC优选表示具有(n + 1)价的且具有4〜30个碳原子的脂肪族多环烃基。 由式(1)表示的结构单元优选为由下式(1-1)表示的结构单元。

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