公开(公告)号：US20140030660A1

公开(公告)日：2014-01-30

申请号：US14038861

申请日：2013-09-27

Applicant: JSR CORPORATION

Inventor： Kazunori TAKANASHI ,  Yoshio TAKIMOTO ,  Takashi MORI ,  Kazuo NAKAHARA ,  Masayuki MOTONARI

IPC: G03F7/11 ,  G03F7/26

CPC classification number: G03F7/11 ,  G03F7/0002 ,  G03F7/094 ,  G03F7/26

Abstract: A multilayer resist process pattern-forming method includes providing an inorganic film over a substrate. A protective film is provided on the inorganic film. A resist pattern is provided on the protective film. A pattern is provided on the substrate by etching that utilizes the resist pattern as a mask. A multilayer resist process inorganic film-forming composition includes a compound, an organic solvent, and a crosslinking accelerator. The compound includes a metal compound that includes a hydrolyzable group, a hydrolysate of a metal compound that includes a hydrolyzable group, a hydrolysis-condensation product of a metal compound that includes a hydrolyzable group, or a combination thereof. The compound includes at least one metal element belonging to Group 6, Group 12, or Group 13 of the Periodic Table of the Elements.

Abstract translation: 多层抗蚀剂工艺图案形成方法包括在衬底上提供无机膜。 在无机膜上设置保护膜。 在保护膜上设置抗蚀剂图案。 通过利用抗蚀剂图案作为掩模的蚀刻在衬底上提供图案。 多层抗蚀剂工艺无机成膜组合物包括化合物，有机溶剂和交联促进剂。 该化合物包括包含可水解基团的金属化合物，包含可水解基团的金属化合物的水解产物，包含可水解基团的金属化合物的水解缩合产物或其组合。 该化合物包括属于元素周期表第6族，第12族或第13族的至少一种金属元素。

公开(公告)号：US20140212813A1

公开(公告)日：2014-07-31

申请号：US14242957

申请日：2014-04-02

Applicant: JSR Corporation

Inventor： Yuusuke ASANO ,  Mitsuo SATOU ,  Hiromitsu NAKASHIMA ,  Kazuki KASAHARA ,  Yoshifumi OIZUMI ,  Masafumi HORI ,  Takanori KAWAKAMI ,  Yasuhiko MATSUDA ,  Kazuo NAKAHARA

IPC: G03F7/038

CPC classification number: G03F7/0392 ,  C08F20/22 ,  G03F7/0046 ,  G03F7/038 ,  G03F7/0388 ,  G03F7/039 ,  G03F7/20 ,  G03F7/2041 ,  G03F7/30 ,  G03F7/32

Abstract: A radiation-sensitive resin composition includes a first polymer including an acid-labile group, an acid generator to generate an acid upon exposure to radiation, and a second polymer including a fluorine atom and a functional group shown by a general formula (x). The second polymer has a fluorine atom content higher than a fluorine atom content of the first polymer. R1 represents an alkali-labile group. A represents an oxygen atom, —NR′—, —CO—O—# or —SO2—O—##, wherein the oxygen atom represented by A is not an oxygen atom bonded directly to an aromatic ring, a carbonyl group, or a sulfoxyl group, R′ represents a hydrogen atom or an alkali-labile group, and “#” and “##” each indicate a bonding hand bonded to R1. -A-R1   (x)

Abstract translation: 辐射敏感性树脂组合物包括包含酸不稳定基团的第一聚合物，暴露于辐射时产生酸的酸产生剂和包含氟原子的第二聚合物和由通式（x）表示的官能团。 第二聚合物的氟原子含量高于第一聚合物的氟原子含量。 R1表示碱不稳定基团。 A表示氧原子，-NR' - ， - CO-O - 或-SO 2 -O - ，其中由A表示的氧原子不是直接与芳环键合的氧原子，羰基或 磺酰基，R'表示氢原子或碱不稳定基团，“＃”和“##”表示与R1键合的键。 -A-R1（x）

公开(公告)号：US20130189621A1

公开(公告)日：2013-07-25

申请号：US13789701

申请日：2013-03-08

Applicant: JSR CORPORATION

Inventor： Hiromitsu NAKASHIMA ,  Reiko KIMURA ,  Kazuo NAKAHARA ,  Mitsuo SATO

IPC: G03F7/039

CPC classification number: G03F7/0395 ,  C07C69/716 ,  C07C69/72 ,  C07C2603/74 ,  C08F220/28 ,  G03F7/0397

Abstract: A radiation-sensitive resin composition includes a polymer having a structural unit represented by a formula (I). In the formula (I), R1 represents a hydrogen atom or a methyl group. X represents a bivalent alicyclic hydrocarbon group not having or having a substituent. Y represents a bivalent hydrocarbon group having 1 to 20 carbon atoms. R2 represents a methyl group or a trifluoromethyl group.

Abstract translation: 辐射敏感性树脂组合物包括具有由式（I）表示的结构单元的聚合物。 在式（I）中，R 1表示氢原子或甲基。 X表示不具有或具有取代基的二价脂环族烃基。 Y表示碳原子数为1〜20的二价烃基。 R2表示甲基或三氟甲基。

公开(公告)号：US20130288179A1

公开(公告)日：2013-10-31

申请号：US13929357

申请日：2013-06-27

Applicant: JSR CORPORATION

Inventor： Kazuo NAKAHARA ,  Ken MARUYAMA

IPC: G03F7/004

CPC classification number: G03F7/004 ,  C07C22/02 ,  C07C22/08 ,  C07C25/18 ,  C07C309/19 ,  C07C381/12 ,  C07C2601/08 ,  C07C2601/14 ,  C07C2601/16 ,  C07C2602/42 ,  C07D307/77 ,  C08K5/07 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/11 ,  G03F7/2041 ,  C08L101/02

Abstract: A radiation-sensitive resin composition includes a compound represented by a formula (1), and a polymer that includes a structural unit having an acid-labile group. R1 and R4 each independently represent a hydrogen atom, or the like. R2 and R3 each independently represent a hydrogen atom or the like. X1 and X2 each independently represent a hydrogen atom, or the like, or X1 and X2 taken together represent —S—, —O—, —SO2—, or the like. A represents an ethanediyl group, wherein at least one hydrogen atom included in X1, X2 and A is substituted by —Y—SO3−M+. Y represents an alkanediyl group having 1 to 10 carbon atoms, or the like. M+ represents a monovalent onium cation. In the case where —Y—SO3−M+ is present in a plurality of number, a plurality of Ys are each identical or different and a plurality of M+s are each identical or different.

Abstract translation: 辐射敏感性树脂组合物包括由式（1）表示的化合物和包含具有酸不稳定基团的结构单元的聚合物。 R 1和R 4各自独立地表示氢原子等。 R2和R3各自独立地表示氢原子等。 X1和X2各自独立地表示氢原子等，或者X1和X2一起表示-S-，-O-，-SO 2 - 等。 A表示乙二基，其中X1，X2和A中包含的至少一个氢原子被-Y-SO3-M +取代。 Y表示碳原子数1〜10的烷二基等。 M +表示单价鎓阳离子。 在-Y-SO3-M +存在多个数的情况下，多个Y分别相同或不同，多个M + s分别相同或不同。

公开(公告)号：US20130095428A1

公开(公告)日：2013-04-18

申请号：US13653468

申请日：2012-10-17

Applicant: JSR Corporation

Inventor： Kazuki KASAHARA ,  Kazuo NAKAHARA ,  Hiromu MIYATA ,  Tomoki NAGAI

IPC: G03F7/027

CPC classification number: G03F7/0397 ,  C08F220/18 ,  C08K5/42 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/11 ,  G03F7/2041 ,  G03F7/322 ,  G03F7/325 ,  C08L33/14 ,  C08F2220/1841 ,  C08F2220/283 ,  C08F2220/382 ,  C08F220/42 ,  C08F220/22 ,  C08F2220/1875 ,  C08L33/16

Abstract: A radiation-sensitive resin composition includes a compound represented by a following formula (1) and a base polymer. In the formula (1), R1 represents a monovalent cyclic organic group having a cyclic ester structure or a cyclic ketone structure; R2 represents a single bond or —CH2—; X is —O—*, —COO—*, —O—CO—O—* or —SO2-O—*, wherein * denotes a binding site to R3; R3 represents a bivalent chain hydrocarbon group having 1 to 5 carbon atoms; and M+ is a monovalent cation. The base polymer has a structural unit derived from (meth)acrylate that includes a lactone skeleton, a structural unit derived from (meth)acrylate that includes a cyclic carbonate skeleton, a structural unit derived from (meth)acrylate that includes a sultone skeleton, a structural unit derived from (meth)acrylate that includes a polar group, or a combination thereof. R1—R2—X—R3—CHF—CF2—SO3−M+  (1)

Abstract translation: 辐射敏感性树脂组合物包含由下式（1）表示的化合物和基础聚合物。 式（1）中，R 1表示具有环状酯结构或环状酮结构的1价的环状有机基团， R 2表示单键或-CH 2 - ; X是-O-，-COO- *，-O-CO-O- *或-SO2-O- *，其中*表示与R3的结合位点; R3表示碳原子数为1〜5的二价链烃基; M +是一价阳离子。 基础聚合物具有衍生自包含内酯骨架的（甲基）丙烯酸酯的结构单元，衍生自包含环状碳酸酯骨架的（甲基）丙烯酸酯的结构单元，衍生自包含磺内酯骨架的（甲基）丙烯酸酯的结构单元， 衍生自包括极性基团的（甲基）丙烯酸酯的结构单元或其组合。 R1-R2-X-R3-CHF-CF2-SO3-M +（1）

公开(公告)号：US20140363769A1

公开(公告)日：2014-12-11

申请号：US14470108

申请日：2014-08-27

Applicant: JSR CORPORATION

Inventor： Hayato NAMAI ,  Kazuo NAKAHARA ,  Norihiko IKEDA

IPC: G03F7/004 ,  C07D317/70 ,  G03F7/20

CPC classification number: G03F7/0045 ,  C07D317/70 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/11 ,  G03F7/20 ,  G03F7/2041

Abstract: A photoresist composition containing a polymer having a structural unit including an acid-labile group, and a compound represented by the formula (1). In the formula (1), R1 represents a hydrogen atom or a monovalent acid-labile group. R2 represents an alicyclic hydrocarbon group having 3 to 20 carbon atoms and a valency of (m+1). m is an integer of 2 to 5. R3 and R4 each independently represent a hydrogen atom, a fluorine atom, a monovalent hydrocarbon group having 1 to 20 carbon atoms or a monovalent fluorinated hydrocarbon group having 1 to 20 carbon atoms. n is an integer of 0 to 5. At least two of a plurality of R1 s optionally taken together represent a ring structure, together with a plurality of oxygen atoms bonding to R1 and the carbon atom(s) constituting R2 and bonding to these oxygen atoms. M+ represents a monovalent radiation-degradable onium cation.

Abstract translation: 一种含有具有包含酸不稳定基团的结构单元的聚合物和由式（1）表示的化合物的光致抗蚀剂组合物。 在式（1）中，R 1表示氢原子或一价酸不稳定基团。 R 2表示碳原子数3〜20的脂环式烃基，（m + 1）价。 m为2〜5的整数.R 3和R 4各自独立地表示氢原子，氟原子，碳原子数1〜20的一价烃基或碳原子数1〜20的1价氟代烃基。 n是0至5的整数。任选地并入多个R 1中的至少两个表示环结构，以及与R1结合的多个氧原子和构成R 2的碳原子并键合到这些氧上 原子 M +表示一价可辐射降解的鎓阳离子。