RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, POLYMER AND POLYMERIZABLE COMPOUND
    1.
    发明申请
    RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, POLYMER AND POLYMERIZABLE COMPOUND 审中-公开
    辐射敏感性树脂组合物,形成耐蚀图案的方法,聚合物和聚合物

    公开(公告)号:US20140212813A1

    公开(公告)日:2014-07-31

    申请号:US14242957

    申请日:2014-04-02

    Abstract: A radiation-sensitive resin composition includes a first polymer including an acid-labile group, an acid generator to generate an acid upon exposure to radiation, and a second polymer including a fluorine atom and a functional group shown by a general formula (x). The second polymer has a fluorine atom content higher than a fluorine atom content of the first polymer. R1 represents an alkali-labile group. A represents an oxygen atom, —NR′—, —CO—O—# or —SO2—O—##, wherein the oxygen atom represented by A is not an oxygen atom bonded directly to an aromatic ring, a carbonyl group, or a sulfoxyl group, R′ represents a hydrogen atom or an alkali-labile group, and “#” and “##” each indicate a bonding hand bonded to R1. -A-R1   (x)

    Abstract translation: 辐射敏感性树脂组合物包括包含酸不稳定基团的第一聚合物,暴露于辐射时产生酸的酸产生剂和包含氟原子的第二聚合物和由通式(x)表示的官能团。 第二聚合物的氟原子含量高于第一聚合物的氟原子含量。 R1表示碱不稳定基团。 A表示氧原子,-NR' - , - CO-O - 或-SO 2 -O - ,其中由A表示的氧原子不是直接与芳环键合的氧原子,羰基或 磺酰基,R'表示氢原子或碱不稳定基团,“#”和“##”表示与R1键合的键。 -A-R1(x)

    RADIATION-SENSITIVE RESIN COMPOSITION, POLYMER, AND RESIST PATTERN-FORMING METHOD
    2.
    发明申请
    RADIATION-SENSITIVE RESIN COMPOSITION, POLYMER, AND RESIST PATTERN-FORMING METHOD 有权
    辐射敏感性树脂组合物,聚合物和电阻形成方法

    公开(公告)号:US20130203000A1

    公开(公告)日:2013-08-08

    申请号:US13830880

    申请日:2013-03-14

    Abstract: A radiation-sensitive resin composition includes a polymer component, a radiation-sensitive acid generating agent, and a nitrogen-containing compound having a ring structure. The polymer component includes, in an identical polymer or different polymers, a first structural unit represented by a formula (1) and a second structural unit represented by a formula (2). R1 represents a hydrogen atom or a methyl group. Z is a group which represents a divalent monocyclic alicyclic hydrocarbon group taken together with R2. R2 represents a carbon atom. R3 represents a methyl group or an ethyl group. R4 represents a hydrogen atom or a methyl group. X is a group which represents a divalent bridged alicyclic hydrocarbon group having no less than 10 carbon atoms taken together with R5. R5 represents a carbon atom. R6 represents a branched alkyl group having 3 or 4 carbon atoms.

    Abstract translation: 辐射敏感性树脂组合物包括聚合物组分,辐射敏感性酸产生剂和具有环结构的含氮化合物。 聚合物组分包括在相同聚合物或不同聚合物中的由式(1)表示的第一结构单元和由式(2)表示的第二结构单元。 R1表示氢原子或甲基。 Z表示与R2一起取代的二价单环脂肪族烃基的基团。 R2表示碳原子。 R3表示甲基或乙基。 R4表示氢原子或甲基。 X表示与R5一起具有不少于10个碳原子的二价桥连脂环烃基的基团。 R5表示碳原子。 R6表示具有3或4个碳原子的支链烷基。

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