公开(公告)号：US20160062237A1

公开(公告)日：2016-03-03

申请号：US14933641

申请日：2015-11-05

Applicant: JSR CORPORATION

Inventor： Hiroki NAKAGAWA ,  Hiromitsu NAKASHIMA ,  Gouji WAKAMATSU ,  Kentarou GOTOU ,  Yukio NISHIMURA ,  Takeo SHIOYA

IPC: G03F7/039 ,  G03F7/004

CPC classification number: G03F7/0046 ,  C08F220/18 ,  C08F220/24 ,  C08F220/28 ,  G03F7/0045 ,  G03F7/039 ,  G03F7/0397 ,  G03F7/162 ,  G03F7/168 ,  G03F7/2006 ,  G03F7/2041 ,  G03F7/322 ,  G03F7/38 ,  G03F7/40

Abstract: An object of the present invention is to provide a novel fluorine-containing polymer, a radiation-sensitive resin composition for liquid immersion lithography which contains the fluorine-containing polymer, which leads to a pattern having an excellent shape and excellent depth of focus, wherein the amount of an eluted component in a liquid for liquid immersion lithography such as water that comes in contact with the resist during exposure in liquid immersion lithography is little, and which provides a larger receding contact angle between the resist film and the liquid for liquid immersion lithography such as water, and a method for purifying the fluorine-containing polymer. The present resin composition comprises a novel fluorine-containing polymer (A) containing repeating units represented by the general formulae (1) and (2) and having Mw of 1,000-50,000, a resin (B) having an acid-unstable group, a radiation-sensitive acid generator (C), a nitrogen-containing compound (D) and a solvent (E).

公开(公告)号：US20190278175A9

公开(公告)日：2019-09-12

申请号：US16104182

申请日：2018-08-17

Applicant: JSR CORPORATION

Inventor： Hiroki NAKAGAWA ,  Hiromitsu NAKASHIMA ,  Gouji WAKAMATSU ,  Kentarou GOTOU ,  Yukio NISHIMURA ,  Takeo SHIOYA

IPC: G03F7/004 ,  G03F7/039 ,  C08F220/28 ,  C08F220/24 ,  C08F220/18 ,  G03F7/40 ,  G03F7/32 ,  G03F7/16 ,  G03F7/20 ,  G03F7/38

Abstract: An object of the present invention is to provide a novel fluorine-containing polymer, a radiation-sensitive resin composition for liquid immersion lithography which contains the fluorine-containing polymer, which leads to a pattern having an excellent shape and excellent depth of focus, wherein the amount of an eluted component in a liquid for liquid immersion lithography such as water that comes in contact with the resist during exposure in liquid immersion lithography is little, and which provides a larger receding contact angle between the resist film and the liquid for liquid immersion lithography such as water, and a method for purifying the fluorine-containing polymer. The present resin composition comprises a novel fluorine-containing polymer (A) containing repeating units represented by the general formulae (1) and (2) and having Mw of 1,000-50,000, a resin (B) having an acid-unstable group, a radiation-sensitive acid generator (C), a nitrogen-containing compound (D) and a solvent (E).

公开(公告)号：US20220260908A9

公开(公告)日：2022-08-18

申请号：US17458783

申请日：2021-08-27

Applicant: JSR CORPORATION

Inventor： Tetsurou KANEKO ,  Hiromitsu NAKASHIMA ,  Yuushi MATSUMURA ,  Junya SUZUKI ,  Shuto MORI ,  Hiroyuki ISHII

IPC: G03F7/038 ,  G03F7/20 ,  G03F7/004 ,  G03F7/32 ,  G03F7/38 ,  G03F7/40

Abstract: A radiation-sensitive resin composition includes: a first polymer having a first structural unit which includes a phenolic hydroxyl group, and a second structural unit which includes an acid-labile group and a carboxy group which is protected by the acid-labile group; a second polymer having a third structural unit represented by the following formula (S-1), and a fourth structural unit which is a structural unit other than the third structural unit and is represented by the following formula (S-2); and a radiation-sensitive acid generator, wherein the acid-labile group includes a monocyclic or polycyclic ring structure having no fewer than 3 and no more than 20 ring atoms.

公开(公告)号：US20220137508A9

公开(公告)日：2022-05-05

申请号：US17320640

申请日：2021-05-14

Applicant: JSR CORPORATION

Inventor： Hiroki NAKAGAWA ,  Hiromitsu NAKASHIMA ,  Gouji WAKAMATSU ,  Kentarou GOTOU ,  Yukio NISHIMURA ,  Takeo SHIOYA

IPC: G03F7/004 ,  C08F220/18 ,  C08F220/24 ,  C08F220/28 ,  G03F7/039 ,  G03F7/20 ,  G03F7/16 ,  G03F7/32 ,  G03F7/38 ,  G03F7/40

Abstract: An object of the present invention is to provide a novel fluorine-containing polymer, a radiation-sensitive resin composition for liquid immersion lithography which contains the fluorine-containing polymer, which leads to a pattern having an excellent shape and excellent depth of focus, wherein the amount of an eluted component in a liquid for liquid immersion lithography such as water that comes in contact with the resist during exposure in liquid immersion lithography is little, and which provides a larger receding contact angle between the resist film and the liquid for liquid immersion lithography such as water, and a method for purifying the fluorine-containing polymer. The present resin composition comprises a novel fluorine-containing polymer (A) containing repeating units represented by the general formulae (1) and (2) and having Mw of 1,000-50,000, a resin (B) having an acid-unstable group, a radiation-sensitive acid generator (C), a nitrogen-containing compound (D) and a solvent (E).

公开(公告)号：US20190025695A1

公开(公告)日：2019-01-24

申请号：US16104182

申请日：2018-08-17

Applicant: JSR CORPORATION

Inventor： Hiroki NAKAGAWA ,  Hiromitsu NAKASHIMA ,  Gouji WAKAMATSU ,  Kentarou GOTOU ,  Yukio NISHIMURA ,  Takeo SHIOYA

IPC: G03F7/004 ,  G03F7/039 ,  C08F220/28 ,  C08F220/24 ,  C08F220/18 ,  G03F7/40 ,  G03F7/32 ,  G03F7/16 ,  G03F7/20 ,  G03F7/38

CPC classification number: G03F7/0046 ,  C08F220/18 ,  C08F220/24 ,  C08F220/28 ,  G03F7/0045 ,  G03F7/039 ,  G03F7/0397 ,  G03F7/162 ,  G03F7/168 ,  G03F7/2006 ,  G03F7/2041 ,  G03F7/322 ,  G03F7/38 ,  G03F7/40

Abstract: An object of the present invention is to provide a novel fluorine-containing polymer, a radiation-sensitive resin composition for liquid immersion lithography which contains the fluorine-containing polymer, which leads to a pattern having an excellent shape and excellent depth of focus, wherein the amount of an eluted component in a liquid for liquid immersion lithography such as water that comes in contact with the resist during exposure in liquid immersion lithography is little, and which provides a larger receding contact angle between the resist film and the liquid for liquid immersion lithography such as water, and a method for purifying the fluorine-containing polymer. The present resin composition comprises a novel fluorine-containing polymer (A) containing repeating units represented by the general formulae (1) and (2) and having Mw of 1,000-50,000, a resin (B) having an acid-unstable group, a radiation-sensitive acid generator (C), a nitrogen-containing compound (D) and a solvent (E).

公开(公告)号：US20130022912A1

公开(公告)日：2013-01-24

申请号：US13629992

申请日：2012-09-28

Applicant: JSR CORPORATION

Inventor： Mitsuo SATO ,  Yusuke ANNO ,  Hiromitsu NAKASHIMA

IPC: C08F222/18 ,  G03F7/20 ,  C07C69/653 ,  G03F7/004

CPC classification number: G03F7/0397 ,  C08F220/28 ,  G03F7/0046 ,  G03F7/0382 ,  G03F7/2041

Abstract: A radiation-sensitive resin composition includes a first polymer having a structural unit represented by a following formula (1), and a radiation-sensitive acid generator. RC in the formula (1) preferably represents an aliphatic polycyclic hydrocarbon group having a valency of (n+1) and having 4 to 30 carbon atoms. The structural unit represented by the formula (1) is preferably a structural unit represented by a n following formula (1-1).

Abstract translation: 辐射敏感性树脂组合物包括具有由下式（1）表示的结构单元的第一聚合物和辐射敏感性酸产生剂。 式（1）中的RC优选表示具有（n + 1）价的且具有4〜30个碳原子的脂肪族多环烃基。 由式（1）表示的结构单元优选为由下式（1-1）表示的结构单元。

公开(公告)号：US20210278764A1

公开(公告)日：2021-09-09

申请号：US17320640

申请日：2021-05-14

Applicant: JSR CORPORATION

Inventor： Hiroki NAKAGAWA ,  Hiromitsu NAKASHIMA ,  Gouji WAKAMATSU ,  Kentarou GOTOU ,  Yukio NISHIMURA ,  Takeo SHIOYA

IPC: G03F7/004 ,  C08F220/18 ,  C08F220/24 ,  C08F220/28 ,  G03F7/039 ,  G03F7/20 ,  G03F7/16 ,  G03F7/32 ,  G03F7/38 ,  G03F7/40

Abstract: An object of the present invention is to provide a novel fluorine-containing polymer, a radiation-sensitive resin composition for liquid immersion lithography which contains the fluorine-containing polymer, which leads to a pattern having an excellent shape and excellent depth of focus, wherein the amount of an eluted component in a liquid for liquid immersion lithography such as water that comes in contact with the resist during exposure in liquid immersion lithography is little, and which provides a larger receding contact angle between the resist film and the liquid for liquid immersion lithography such as water, and a method for purifying the fluorine-containing polymer. The present resin composition comprises a novel fluorine-containing polymer (A) containing repeating units represented by the general formulae (1) and (2) and having Mw of 1,000-50,000, a resin (B) having an acid-unstable group, a radiation-sensitive acid generator (C), a nitrogen-containing compound (D) and a solvent (E).

公开(公告)号：US20140212813A1

公开(公告)日：2014-07-31

申请号：US14242957

申请日：2014-04-02

Applicant: JSR Corporation

Inventor： Yuusuke ASANO ,  Mitsuo SATOU ,  Hiromitsu NAKASHIMA ,  Kazuki KASAHARA ,  Yoshifumi OIZUMI ,  Masafumi HORI ,  Takanori KAWAKAMI ,  Yasuhiko MATSUDA ,  Kazuo NAKAHARA

IPC: G03F7/038

CPC classification number: G03F7/0392 ,  C08F20/22 ,  G03F7/0046 ,  G03F7/038 ,  G03F7/0388 ,  G03F7/039 ,  G03F7/20 ,  G03F7/2041 ,  G03F7/30 ,  G03F7/32

Abstract: A radiation-sensitive resin composition includes a first polymer including an acid-labile group, an acid generator to generate an acid upon exposure to radiation, and a second polymer including a fluorine atom and a functional group shown by a general formula (x). The second polymer has a fluorine atom content higher than a fluorine atom content of the first polymer. R1 represents an alkali-labile group. A represents an oxygen atom, —NR′—, —CO—O—# or —SO2—O—##, wherein the oxygen atom represented by A is not an oxygen atom bonded directly to an aromatic ring, a carbonyl group, or a sulfoxyl group, R′ represents a hydrogen atom or an alkali-labile group, and “#” and “##” each indicate a bonding hand bonded to R1. -A-R1   (x)

Abstract translation: 辐射敏感性树脂组合物包括包含酸不稳定基团的第一聚合物，暴露于辐射时产生酸的酸产生剂和包含氟原子的第二聚合物和由通式（x）表示的官能团。 第二聚合物的氟原子含量高于第一聚合物的氟原子含量。 R1表示碱不稳定基团。 A表示氧原子，-NR' - ， - CO-O - 或-SO 2 -O - ，其中由A表示的氧原子不是直接与芳环键合的氧原子，羰基或 磺酰基，R'表示氢原子或碱不稳定基团，“＃”和“##”表示与R1键合的键。 -A-R1（x）

公开(公告)号：US20140023968A1

公开(公告)日：2014-01-23

申请号：US14037659

申请日：2013-09-26

Applicant: JSR CORPORATION

Inventor： Hiromitsu NAKASHIMA ,  Toru KIMURA ,  Yusuke ASANO ,  Masafumi HORI ,  Reiko KIMURA ,  Kazuki KASAHARA ,  Hiromu MIYATA ,  Masafumi YOSHIDA

IPC: G03F7/004 ,  G03F7/20

CPC classification number: G03F7/0041 ,  C08F220/22 ,  C08F220/24 ,  C08F220/28 ,  C08F2220/283 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/11 ,  G03F7/2041 ,  H01L21/027 ,  H01L21/0274

Abstract: A resist pattern-forming method includes providing a resist film having a surface free energy of 30 to 40 mN/m on a substrate using a radiation-sensitive resin composition. The resist film is exposed by applying radiation via a mask. The exposed resist film is developed. It is preferable that the exposing of the resist film includes exposing the resist film via an immersion liquid that is provided over the resist film

Abstract translation: 抗蚀剂图案形成方法包括使用辐射敏感性树脂组合物在基板上提供具有30至40mN / m的表面自由能的抗蚀剂膜。 通过经由掩模施加辐射来曝光抗蚀剂膜。 显影出抗蚀剂膜。 优选的是，抗蚀剂膜的曝光包括通过设置在抗蚀剂膜上的浸渍液体曝光抗蚀剂膜

公开(公告)号：US20130189621A1

公开(公告)日：2013-07-25

申请号：US13789701

申请日：2013-03-08

Applicant: JSR CORPORATION

Inventor： Hiromitsu NAKASHIMA ,  Reiko KIMURA ,  Kazuo NAKAHARA ,  Mitsuo SATO

IPC: G03F7/039

CPC classification number: G03F7/0395 ,  C07C69/716 ,  C07C69/72 ,  C07C2603/74 ,  C08F220/28 ,  G03F7/0397

Abstract: A radiation-sensitive resin composition includes a polymer having a structural unit represented by a formula (I). In the formula (I), R1 represents a hydrogen atom or a methyl group. X represents a bivalent alicyclic hydrocarbon group not having or having a substituent. Y represents a bivalent hydrocarbon group having 1 to 20 carbon atoms. R2 represents a methyl group or a trifluoromethyl group.

Abstract translation: 辐射敏感性树脂组合物包括具有由式（I）表示的结构单元的聚合物。 在式（I）中，R 1表示氢原子或甲基。 X表示不具有或具有取代基的二价脂环族烃基。 Y表示碳原子数为1〜20的二价烃基。 R2表示甲基或三氟甲基。