APPARATUS FOR PREVENTING WITHDRAWING OR INSERTING OF CARRIAGE IN CIRCUIT BREAKER
    2.
    发明申请
    APPARATUS FOR PREVENTING WITHDRAWING OR INSERTING OF CARRIAGE IN CIRCUIT BREAKER 有权
    防止在断路器中携带或插入运输的装置

    公开(公告)号:US20100230256A1

    公开(公告)日:2010-09-16

    申请号:US12718121

    申请日:2010-03-05

    CPC classification number: H02B11/133

    Abstract: An apparatus for preventing withdrawing and insertion of a carriage of a circuit breaker is disclosed. When a circuit breaker main body is inserted, an interlocking unit operates by interworking with the carriage withdrawing and inserting preventing apparatus, and while the circuit breaker is being closed, a withdrawal and insertion handle prevents a lead screw from being rotated by the interlocking unit. Thus, when the circuit breaker performs a closing operation, unnecessary withdrawing and inserting operation of the carriage is basically prevented to thus prevent various safety accidents, a contact resistance, a temperature increase, and damage to a device resulting from a breakdown.

    Abstract translation: 公开了一种用于防止断路器滑架的拆卸和插入的装置。 当插入断路器主体时,互锁单元通过与滑架退出和插入防止装置相互作用而操作,并且当断路器被关闭时,撤回和插入手柄防止引导螺钉被联锁单元旋转。 因此,当断路器执行闭合操作时,基本上防止了滑架的不必要的抽出和插入操作,从而防止了由于击穿而引起的各种安全事故,接触电阻,温度升高和对设备的损坏。

    JOINT STRUCTURE FOR FIXING BETWEEN SUNROOF AND HEADLINER
    3.
    发明申请
    JOINT STRUCTURE FOR FIXING BETWEEN SUNROOF AND HEADLINER 有权
    联合结构在SUNROO和HEADLINER之间固定

    公开(公告)号:US20110025102A1

    公开(公告)日:2011-02-03

    申请号:US12619340

    申请日:2009-11-16

    Applicant: Jae Yong LEE

    Inventor: Jae Yong LEE

    CPC classification number: B60J7/0007 B60J7/022 F16B5/0635

    Abstract: A joint structure for fixing between a sunroof and a headliner, may include a headliner defining an opening, wherein a portion of the headliner around the opening protrudes and is curved upwards to define the opening, and the headliner has a face fabric attached to a surface thereof, a bracket attached to an upper end portion and a lower portion of the headliner, outside of the opening, wherein the bracket has a support end portion protruding in a direction opposite to the opening, a clip into which the support end portion of the bracket is selectively fitted, and a sunroof frame coupled with an upper portion of the clip, wherein the sunroof is provided on the sunroof frame.

    Abstract translation: 用于在天窗和顶篷之间固定的接合结构可以包括限定开口的顶篷,其中,围绕所述开口的所述顶篷的一部分突出并且向上弯曲以限定所述开口,并且所述顶篷具有附接到表面的面织物 安装在该顶盖的上端部和下部的支架,该支架位于该开口的外侧,其中支架具有沿与开口相反的方向突出的支撑端部,夹子的支撑端部 支架被选择性地装配,以及与夹子的上部联接的天窗框架,其中天窗设置在天窗框架上。

    SUPER-RESOLUTION LITHOGRAPHY APPARATUS AND METHOD BASED ON MULTI LIGHT EXPOSURE METHOD
    4.
    发明申请
    SUPER-RESOLUTION LITHOGRAPHY APPARATUS AND METHOD BASED ON MULTI LIGHT EXPOSURE METHOD 有权
    基于多光子曝光方法的超分辨率光刻设备及方法

    公开(公告)号:US20100123889A1

    公开(公告)日:2010-05-20

    申请号:US12403111

    申请日:2009-03-12

    CPC classification number: G03F7/70408 G03F7/7005 G03F7/70466 G03F7/70575

    Abstract: Disclosed herein is a super-resolution lithography apparatus and method based on a multiple light exposure method. The super-resolution lithography apparatus comprises a photographic medium having energy levels of a first ground state, a second ground state, a first excited state, a second excited state and a quenching state; a first light source inducing energy level transition between the first ground state and the first excited state of the photographic medium; a second light source inducing energy level transition between the second ground state and the first excited state of the photographic medium; and a third light source inducing energy level transition between the second ground state and the second excited state of the photographic medium. Accordingly, the resolution of lithography can be improved simply by using a photographic medium having a simple structure and conventional laser beams and increasing the number of exposure steps. Furthermore, a multiple photon absorber that is difficult to obtain, a medium having a complicated energy level and a high-efficiency quantum optical light are unnecessary, and thus economic efficiency is improved.

    Abstract translation: 本文公开了一种基于多次曝光方法的超分辨率光刻设备和方法。 超分辨光刻设备包括具有第一基态,第二基态,第一激发态,第二激发态和淬灭态的能级的照相介质; 在照相介质的第一基态和第一激发态之间引起能级转变的第一光源; 第二光源,在所述第二基态和所述照相介质的所述第一激发态之间引起能级转变; 以及在照相介质的第二基态和第二激发态之间引起能级跃迁的第三光源。 因此,可以简单地通过使用具有简单结构和传统激光束的照相介质并增加曝光步骤的数量来改进光刻的分辨率。 此外,难以获得难以获得的多光子吸收体,具有复杂的能级和高效量子光的介质,因而提高了经济效率。

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