摘要:
Systems and method in accordance with an embodiment of the present invention can includes an implant comprising a first wing, a spacer extending from the first wing, and a distraction guide. The distraction guide is arranged in a first configuration to pierce and/or distract tissue associated with adjacent spinous processes extending from vertebrae of a targeted motion segment. The implant can be positioned between the adjacent spinous processes and once positioned, the implant can be arranged in a second configuration. When arranged in a second configuration, the distraction guide can act as a second wing. The first wing and the second wing can limit or block movement of the implant along a longitudinal axis of the implant.
摘要:
Systems and method in accordance with the embodiments of the present invention can include an implant for positioning within a cervical facet joint for distracting the cervical spine, thereby increasing the area of the canals and openings through which the spinal cord and nerves must pass, and decreasing pressure on the spinal cord and/or nerve roots. The implant can be inserted laterally or posteriorly.
摘要:
Systems in accordance with embodiments of the present invention can include an implant comprising a spacer for defining a minimum space between adjacent spinous processes, a distraction guide for piercing and distracting an interspinous ligament during implantation, a binder for limiting or preventing flexion motion of the targeted motion segment, and a tensioner tool for applying tension to the binder. In one embodiment, the tensioner engages the implant and draws the binder through the capture device and applies tension to the binder. In one embodiment, the tensioner tool has a tension gauge with which a physician may measure the tension applied to the binder. The binder may be grasped by the capture device when the desired tension is achieved.
摘要:
A spinal implant adapted to be inserted into an interspinous space between adjacent spinous processes includes a proximal section, a central section, and a distal section disposed sequentially along a longitudinal axis. The distal section has feature(s) that allow the implant to be inserted laterally into the interspinous space, such as an approximately helical groove and/or a thread-like structure. The distal tip of the implant tapers inwardly, and may be rounded. The proximal section may include an outwardly extending wing or flange. The implant may include a main body that includes the wing or flange and a spacer slidably mated to the main body through the wing or flange.
摘要:
Systems and method in accordance with an embodiment of the present invention can includes an implant comprising a spacer and a frame having a central body and a helical shaped wing extending from the central body. The frame can be positioned near about adjacent spinous processes, and can be rotated and urged so that the adjacent spinous processes pass within a groove of the wing, thereby allowing the wing to be arranged on an opposite side of the adjacent spinous processes. The spacer can then be arranged over the frame so that the spacer contacts and distracts the spinous processes, thereby limiting relative movement of the adjacent spinous processes during extension.
摘要:
Systems and method in accordance with the embodiments of the present invention can include an implant for positioning at a vertebra for resisting the expulsion of a bone graft from within an intervertebral space. The implant includes a buttress plate having an intervertebral plate and an anchoring plate connected such that the intervertebral plate can move relative to the anchoring plate.
摘要:
Systems and method in accordance with embodiments of the present invention can includes an implant having a spacer with an expandable portion. An insert can be positioned within a groove of the spacer to distract the expandable portion away from the main portion of the spacer. The expandable portion can optionally include a grip that can at least partially deform to conform to a contour of a spinous process to provide a frictional grip to prevent the implant from shifting position. Implants in accordance with the present invention can also include a binder that can be arranged around the adjacent spinous processes to limit flexion movement.
摘要:
A spine distraction implant alleviates pain associated with spinal stenosis and facet arthropathy by expanding the volume in the spine canal and/or neural foramen. The implant provides a spinal extension stop while allowing freedom of spinal flexion. An interspinous process implant with a selectably expandable spacer can be placed between adjacent spinous processes. a device implanted between the spinous processes of adjacent vertebrae of the spine can be used for relieving pain associated with the vertebrae and surrounding tissues and structures by maintaining and/or adding distraction between adjacent vertebrae. A tissue expander can be adapted to move from a first insertion position, for ease of implantation between spinous processes, to a second retention position that prevents displacement of the implant. An embodiment of a system can include an implant having a spacer with a thickness and a wing, wherein a first configuration of the wing has a first height substantially similar to the thickness and wherein the wing is adapted to be selectably arranged in a second configuration such that the wing has a second height greater than the first height. A periphery of the implant has a shape generally conformal with a shape of an inner surface of a cannula and a cross-sectional diameter smaller than an inner diameter of the cannula. The cannula is inserted such that a proximal end of the cannula is arranged between the adjacent spinous processes. The implant is then urged into position between the adjacent spinous processes by way of the cannula, and subsequently arranged in a second configuration to fix the implant in position.
摘要:
An embodiment of a system in accordance with the present invention can include an implant having a first wing, a spacer with a thickness and a second wing, wherein a first configuration of the second wing has a first height substantially similar to the thickness and wherein the second wing is adapted to be selectably arranged in a second configuration such that the second wing has a second height greater than the first height. The implant is then urged into position between adjacent spinous processes and subsequently arranged in a second configuration to fix the implant in position.
摘要:
A spinal implant adapted to be inserted into an interspinous space between adjacent spinous processes includes a proximal section, a central section, and a distal section disposed sequentially along a longitudinal axis. The distal section has feature(s) that allow the implant to be inserted laterally into the interspinous space, such as an approximately helical groove and/or a thread-like structure. The distal tip of the implant tapers inwardly, and may be rounded. The proximal section may include an outwardly extending wing or flange. The implant may include a main body that includes the wing or flange and a spacer slidably mated to the main body through the wing or flange.