FABRICATION OF GRAPHENE NANORIBBONS AND NANOWIRES
    1.
    发明申请
    FABRICATION OF GRAPHENE NANORIBBONS AND NANOWIRES 有权
    石墨纳米薄膜和纳米颗粒的制备

    公开(公告)号:US20140220773A1

    公开(公告)日:2014-08-07

    申请号:US14171642

    申请日:2014-02-03

    IPC分类号: H01L21/768 H01L21/311

    摘要: In some embodiments, the present disclosure pertains to methods of preparing graphene nanoribbons from a graphene film associated with a meniscus, where the method comprises patterning the graphene film while the meniscus acts as a mask above a region of the graphene film, and where the patterning results in formation of graphene nanoribbons from the meniscus-masked region of the graphene film. Additional embodiments of the present disclosure pertain to methods of preparing wires from a film associated with a meniscus, where the method comprises patterning the film while the meniscus acts as a mask above a region of the film, and where the patterning results in formation of a wire from the meniscus-masked region of the film. Additional embodiments of the present disclosure pertain to chemical methods of preparing wires from water-reactive materials.

    摘要翻译: 在一些实施方案中,本公开涉及从与弯液面相关联的石墨烯膜制备石墨烯纳米带的方法,其中所述方法包括图案化所述石墨烯膜,同时所述弯液面用作所述石墨烯膜的区域上方的掩模,并且其中所述图案化 导致从石墨烯膜的弯液面掩蔽区域形成石墨烯纳米带。 本公开的另外的实施例涉及从与弯液面相关联的膜制备线的方法,其中所述方法包括图案化所述膜,同时所述弯月面用作所述膜的区域上方的掩模,并且其中所述图案化导致形成 电线从弯月面掩盖的区域。 本公开的另外的实施方案涉及从水反应性材料制备电线的化学方法。

    Fabrication of graphene nanoribbons and nanowires using a meniscus as an etch mask
    2.
    发明授权
    Fabrication of graphene nanoribbons and nanowires using a meniscus as an etch mask 有权
    使用弯月面作为蚀刻掩模制造石墨烯纳米带和纳米线

    公开(公告)号:US09356151B2

    公开(公告)日:2016-05-31

    申请号:US14171642

    申请日:2014-02-03

    摘要: In some embodiments, the present disclosure pertains to methods of preparing graphene nanoribbons from a graphene film associated with a meniscus, where the method comprises patterning the graphene film while the meniscus acts as a mask above a region of the graphene film, and where the patterning results in formation of graphene nanoribbons from the meniscus-masked region of the graphene film. Additional embodiments of the present disclosure pertain to methods of preparing wires from a film associated with a meniscus, where the method comprises patterning the film while the meniscus acts as a mask above a region of the film, and where the patterning results in formation of a wire from the meniscus-masked region of the film. Additional embodiments of the present disclosure pertain to chemical methods of preparing wires from water-reactive materials.

    摘要翻译: 在一些实施方案中,本公开涉及从与弯液面相关联的石墨烯膜制备石墨烯纳米带的方法,其中所述方法包括图案化所述石墨烯膜,同时所述弯液面用作所述石墨烯膜的区域上方的掩模,并且其中所述图案化 导致从石墨烯膜的弯液面掩蔽区域形成石墨烯纳米带。 本公开的另外的实施例涉及从与弯液面相关联的膜制备线的方法,其中所述方法包括图案化所述膜,同时所述弯月面用作所述膜的区域上方的掩模,并且其中所述图案化导致形成 电线从弯月面掩盖的区域。 本公开的另外的实施方案涉及从水反应性材料制备电线的化学方法。