Methods and systems for preparing a sample for thin film analysis
    1.
    发明授权
    Methods and systems for preparing a sample for thin film analysis 有权
    制备薄膜分析样品的方法和系统

    公开(公告)号:US07190441B1

    公开(公告)日:2007-03-13

    申请号:US11021555

    申请日:2004-12-22

    IPC分类号: G01N1/00

    摘要: Methods and systems for preparing a sample for thin film analysis are provided. One system includes an energy beam source configured to generate an energy beam. The system also includes an energy beam delivery subsystem configured to direct the energy beam to a sample and to modify the energy beam such that the energy beam has a substantially flat-top profile on the sample. The energy beam removes a portion of a contaminant layer on the sample to expose an analysis area of a thin film on the sample. One method includes generating an energy beam and modifying the energy beam such that the energy beam has a substantially flat-top profile. The method also includes directing the energy beam to a sample. The energy beam removes a portion of a contaminant layer on the sample to expose an analysis area of a thin film on the sample.

    摘要翻译: 提供了制备用于薄膜分析的样品的方法和系统。 一个系统包括被配置为产生能量束的能量束源。 该系统还包括能量束传送子系统,其配置成将能量束引导到样品并修改能量束,使得能量束在样品上具有基本上平顶的轮廓。 能量束去除样品上的污染物层的一部分以暴露样品上薄膜的分析区域。 一种方法包括产生能量束并修改能量束,使得能量束具有基本平坦的轮廓。 该方法还包括将能量束引导到样品。 能量束去除样品上的污染物层的一部分以暴露样品上薄膜的分析区域。