公开(公告)号：US07209214B2

公开(公告)日：2007-04-24

申请号：US11017230

申请日：2004-12-21

申请人： Jan Hauschild ,  Marco Pieters ,  Coen Van De Vin

发明人： Jan Hauschild ,  Marco Pieters ,  Coen Van De Vin

IPC分类号： G03B27/32 ,  G03B27/52

CPC分类号： G03F7/70641

摘要： A method and system for performing a focus test in a lithographic apparatus. According to the method, a substrate is provided with a layer of radiation sensitive material, the substrate is illuminated in the lithographic apparatus using a first focus sensitive feature and a second focus feature, and the substrate is analyzed to provide results of the focus test using the first focus sensitive feature as imaged on the substrate. The focus test is performed on a regular production wafer, and the results of the focus test are allowed if predetermined statistic properties associated with the second focus feature as imaged on the substrate are within predetermined limits. The second focus feature may be focus sensitive or focus insensitive.

摘要翻译： 一种用于在光刻设备中执行聚焦测试的方法和系统。 根据该方法，衬底设置有一层辐射敏感材料，使用第一焦点敏感特征和第二焦点特征在光刻设备中照射衬底，并且分析衬底以提供聚焦测试的结果，使用 第一个焦点敏感特征成像在基底上。 如果在基板上成像的与第二焦点特征相关联的预定统计特性在预定限度内，则可以在常规生产晶片上执行聚焦测试，并且允许聚焦测试的结果。 第二个焦点特征可能是焦点敏感或焦点不敏感。

公开(公告)号：US20060132744A1

公开(公告)日：2006-06-22

申请号：US11017230

申请日：2004-12-21

申请人： Jan Hauschild ,  Marco Pieters ,  Coen Van De Vin

发明人： Jan Hauschild ,  Marco Pieters ,  Coen Van De Vin

IPC分类号： G03B27/52

CPC分类号： G03F7/70641

摘要： A method and system for performing a focus test in a lithographic apparatus. According to the method, a substrate is provided with a layer of radiation sensitive material, the substrate is illuminated in the lithographic apparatus using a first focus sensitive feature and a second focus feature, and the substrate is analyzed to provide results of the focus test using the first focus sensitive feature as imaged on the substrate. The focus test is performed on a regular production wafer, and the results of the focus test are allowed if predetermined statistic properties associated with the second focus feature as imaged on the substrate are within predetermined limits. The second focus feature may be focus sensitive or focus insensitive.

摘要翻译： 一种用于在光刻设备中执行聚焦测试的方法和系统。 根据该方法，衬底设置有一层辐射敏感材料，使用第一焦点敏感特征和第二焦点特征在光刻设备中照射衬底，并且分析衬底以提供聚焦测试的结果，使用 第一个焦点敏感特征成像在基底上。 如果在基板上成像的与第二焦点特征相关联的预定统计特性在预定限度内，则可以在常规生产晶片上执行聚焦测试，并且允许聚焦测试的结果。 第二个焦点特征可能是焦点敏感或焦点不敏感。