公开(公告)号：US20150011034A1

公开(公告)日：2015-01-08

申请号：US14495111

申请日：2014-09-24

Applicant: Japan Display Inc.

Inventor： Toshimasa ISHIGAKI ,  Fumio Takahashi ,  Hideki Kuriyama

IPC: H01L27/12 ,  H01L21/02 ,  H01L21/288

CPC classification number: G02F1/136227 ,  G02F2201/40 ,  H01L21/02112 ,  H01L21/288 ,  H01L27/1248 ,  H01L27/1259 ,  H01L29/78606 ,  H01L33/08

Abstract: A manufacturing method of a display device having an array substrate includes the steps of forming a projection of an organic material in a pixel on the array substrate by patterning a photosensitive material or by inkjet, forming a TFT on the array substrate, wherein a source electrode of the TFT is formed to extend on at least part of the upper surface of the projection, forming an inorganic passivation layer over the TFT and over at least part of the upper surface of the projection, forming an organic passivation layer over the inorganic passivation layer, forming an upper insulating layer over at least part of the organic passivation layer, forming a contact hole in the inorganic passivation layer and the upper insulation layer over the upper surface of the projection, and forming a pixel electrode on the upper insulation layer which contacts the source electrode.

Abstract translation: 具有阵列基板的显示装置的制造方法包括以下步骤：通过图案化感光材料或通过喷墨形成阵列基板上的像素中的有机材料的突起，在阵列基板上形成TFT，其中源电极 形成为在突起的上表面的至少一部分上延伸，在TFT上方以及在突起的上表面的至少一部分之上形成无机钝化层，在无机钝化层上形成有机钝化层 在所述有机钝化层的至少一部分上形成上绝缘层，在所述无机钝化层和所述突起的上表面上方形成上绝缘层的接触孔，并在所述上绝缘层上形成像素电极， 源电极。

公开(公告)号：US09136288B2

公开(公告)日：2015-09-15

申请号：US14495111

申请日：2014-09-24

Applicant: Japan Display Inc.

Inventor： Toshimasa Ishigaki ,  Fumio Takahashi ,  Hideki Kuriyama

IPC: H01L27/12 ,  H01L21/02 ,  H01L21/288 ,  H01L33/08 ,  G02F1/1362

CPC classification number: G02F1/136227 ,  G02F2201/40 ,  H01L21/02112 ,  H01L21/288 ,  H01L27/1248 ,  H01L27/1259 ,  H01L29/78606 ,  H01L33/08

Abstract: A manufacturing method of a display device having an array substrate includes the steps of forming a projection of an organic material in a pixel on the array substrate by patterning a photosensitive material or by inkjet, forming a TFT on the array substrate, wherein a source electrode of the TFT is formed to extend on at least part of the upper surface of the projection, forming an inorganic passivation layer over the TFT and over at least part of the upper surface of the projection, forming an organic passivation layer over the inorganic passivation layer, forming an upper insulating layer over at least part of the organic passivation layer, forming a contact hole in the inorganic passivation layer and the upper insulation layer over the upper surface of the projection, and forming a pixel electrode on the upper insulation layer which contacts the source electrode.

Abstract translation: 具有阵列基板的显示装置的制造方法包括以下步骤：通过图案化感光材料或通过喷墨形成阵列基板上的像素中的有机材料的突起，在阵列基板上形成TFT，其中源电极 形成为在突起的上表面的至少一部分上延伸，在TFT上方以及在突起的上表面的至少一部分之上形成无机钝化层，在无机钝化层上形成有机钝化层 在所述有机钝化层的至少一部分上形成上绝缘层，在所述无机钝化层和所述突起的上表面上方形成上绝缘层的接触孔，并在所述上绝缘层上形成像素电极， 源电极。

公开(公告)号：US09146424B2

公开(公告)日：2015-09-29

申请号：US14040956

申请日：2013-09-30

Applicant: Japan Display Inc.

Inventor： Hideki Kuriyama ,  Hirotaka Imayama

IPC: G02F1/1343 ,  G02F1/139 ,  G02F1/1337

CPC classification number: G02F1/133707 ,  G02F1/134363 ,  G02F2001/13373

Abstract: Screen brightness is improved in an IPS type liquid crystal display device.A common electrode having a slit is disposed over a rectangular pixel electrode with an insulating film attached therebetween. The slit has a linear part and a bend part. The bend part is necessary for preventing pressing domain. The transmittance in the bend part is increased by making the thickness of the insulating film below the bend part of the slit to less than the thickness of the insulating film at the linear part of the slit, thereby increasing the transmittance of the entire pixel. Thus, the screen brightness can be improved.

Abstract translation: IPS型液晶显示装置的屏幕亮度得到改善。 具有狭缝的公共电极设置在矩形像素电极上，其间具有绝缘膜。 狭缝具有直线部分和弯曲部分。 弯曲部分是防止按压区域所必需的。 通过使狭缝的弯曲部下方的绝缘膜的厚度小于狭缝的直线部分处的绝缘膜的厚度，从而提高了整个像素的透射率，从而增加弯曲部的透射率。 因此，可以提高屏幕亮度。

公开(公告)号：US09362409B2

公开(公告)日：2016-06-07

申请号：US14798413

申请日：2015-07-13

Applicant: Japan Display Inc.

Inventor： Toshimasa Ishigaki ,  Fumio Takahashi ,  Hideki Kuriyama

IPC: H01L33/08 ,  H01L27/12 ,  G02F1/1362 ,  H01L29/786

CPC classification number: G02F1/136227 ,  G02F2201/40 ,  H01L21/02112 ,  H01L21/288 ,  H01L27/1248 ,  H01L27/1259 ,  H01L29/78606 ,  H01L33/08

Abstract: A manufacturing method of a display device having an array substrate includes the steps of forming a projection of an organic material in a pixel on the array substrate by patterning a photosensitive material or by inkjet, forming a TFT on the array substrate, wherein a source electrode of the TFT is formed to extend on at least part of the upper surface of the projection, forming an inorganic passivation layer over the TFT and over at least part of the upper surface of the projection, forming an organic passivation layer over the inorganic passivation layer, forming an upper insulating layer over at least part of the organic passivation layer, forming a contact hole in the inorganic passivation layer and the upper insulation layer over the upper surface of the projection, and forming a pixel electrode on the upper insulation layer which contacts the source electrode.