公开(公告)号：US20080013107A1

公开(公告)日：2008-01-17

申请号：US11484974

申请日：2006-07-11

申请人： Jeffrey A. Chard ,  Junwei Bao ,  Joerg Bischoff ,  Shifang Li ,  Wei Liu ,  Hong Qiu ,  Sylvio Rabello ,  Vi Vuong

发明人： Jeffrey A. Chard ,  Junwei Bao ,  Joerg Bischoff ,  Shifang Li ,  Wei Liu ,  Hong Qiu ,  Sylvio Rabello ,  Vi Vuong

IPC分类号： G01B11/14

CPC分类号： G01B11/24 ,  G01N21/4788 ,  G01N21/95607 ,  G01N2021/8883 ,  G01N2021/95615

摘要： In generating a profile model to characterize a structure to be examined using optical metrology, a view canvas is displayed, with the profile model being generated displayed in the view canvas. A profile shape palette is displayed adjacent to the view canvas. A plurality of different profile shape primitives is displayed in the profile shape palette. Each profile shape primitive in the profile shape palette is defined by a set of profile parameters. When a user selects a profile shape primitive from the profile shape palette, drags the selected profile shape primitive from the profile shape palette, and drops the selected profile shape primitive into the view canvas, the selected profile shape primitive is incorporated into the profile model being generated and displayed in the view canvas.

摘要翻译： 在生成轮廓模型以使用光学计量学来表征要检查的结构时，显示视图画布，其中生成的轮廓模型显示在视图画布中。 在视图画布附近显示一个轮廓形状调色板。 在轮廓形状调色板中显示多个不同的轮廓形状基元。 轮廓形状调色板中的每个轮廓形状基元由一组轮廓参数定义。 当用户从轮廓形状调色板中选择轮廓形状基元时，从轮廓形状调色板中拖动所选择的轮廓形状基元，并将所选择的轮廓形状基元拖放到视图画布中，将所选择的轮廓形状原语合并到轮廓模型中 生成并显示在视图画布中。

公开(公告)号：US20080089574A1

公开(公告)日：2008-04-17

申请号：US11580716

申请日：2006-10-12

申请人： Hong Qiu ,  Junwei Bao ,  Wei Liu ,  Jeffrey A. Chard ,  Miao Liu ,  Gang He ,  Hemalatha Erva ,  Vi Vuong

发明人： Hong Qiu ,  Junwei Bao ,  Wei Liu ,  Jeffrey A. Chard ,  Miao Liu ,  Gang He ,  Hemalatha Erva ,  Vi Vuong

IPC分类号： G06K9/00

CPC分类号： G01N21/4788 ,  G01B11/24 ,  Y10S707/953

摘要： To manage data flow in generating different signal formats for use in optical metrology, a project data object is created. A first option data object is created. The first option data object has a set of signal parameters. Different settings of the set of signal parameters correspond to different signal formats for diffraction signals. A version number is associated with the first option data object. The first option data object is linked with the project data object. At least a second option data object is created. The second option data object has a set of signal parameters. Different settings of the set of signal parameters correspond to different signal formats for diffraction signals. The set of signal parameters of the first option data object and the set of signal parameters of the second option data object are set differently. Another version number is associated with the second option data object. The second option data object is linked with the project data object. The project data object, the first option data object, and the second option data object are stored. The version numbers associated with the first option data object and the second option data object are stored. The link between the first option data object and the project data object is stored. The link between the second option data object and the project data object is stored.

摘要翻译： 为了管理生成用于光学测量的不同信号格式的数据流，创建了一个项目数据对象。 创建第一个选项数据对象。 第一个选项数据对象具有一组信号参数。 信号参数组的不同设置对应于衍射信号的不同信号格式。 版本号与第一选项数据对象相关联。 第一个选项数据对象与项目数据对象链接。 至少创建第二个选项数据对象。 第二个选项数据对象具有一组信号参数。 信号参数组的不同设置对应于衍射信号的不同信号格式。 第一选项数据对象的信号参数集合和第二选项数据对象的信号参数集合设置不同。 另一个版本号与第二个选项数据对象相关联。 第二个选项数据对象与项目数据对象链接。 存储项目数据对象，第一选项数据对象和第二选项数据对象。 存储与第一选项数据对象和第二选项数据对象相关联的版本号。 存储第一个选项数据对象和项目数据对象之间的链接。 存储第二选项数据对象与项目数据对象之间的链接。

公开(公告)号：US20080091724A1

公开(公告)日：2008-04-17

申请号：US11580570

申请日：2006-10-12

申请人： Hong Qiu ,  Junwei Bao ,  Wei Liu ,  Jeffrey A. Chard ,  Miao Liu ,  Gang He ,  Hemalatha Erva ,  Vi Vuong

发明人： Hong Qiu ,  Junwei Bao ,  Wei Liu ,  Jeffrey A. Chard ,  Miao Liu ,  Gang He ,  Hemalatha Erva ,  Vi Vuong

IPC分类号： G06F17/00

CPC分类号： G01B11/24 ,  Y10S707/953

摘要： To manage data flow in generating profile models for use in optical metrology, a project data object is created. A first profile model data object is created. The first profile model data object corresponds to a first profile model defined using profile parameters. A version number is associated with the first profile model data object. The first profile model data object is linked with the project data object. At least a second profile model data object is created. The second profile model data object corresponds to a second profile model defined using profile parameters. The first and second profile models are different. Another version number is associated with the second profile model data object. The second profile model data object is linked with the project data object. The project data object, the first profile model data object, and the second profile model data object are stored. The version numbers associated with the first profile model data object and the second profile model data object are stored. The link between the first profile model data object and the project data object is stored. The link between the second profile model data object and the project data object is stored.

摘要翻译： 为了管理生成用于光学测量的轮廓模型中的数据流，创建了一个项目数据对象。 创建第一个配置文件模型数据对象。 第一个轮廓模型数据对象对应于使用轮廓参数定义的第一轮廓模型。 版本号与第一个轮廓模型数据对象相关联。 第一个配置文件模型数据对象与项目数据对象链接。 至少创建一个第二个轮廓模型数据对象。 第二轮廓模型数据对象对应于使用轮廓参数定义的第二轮廓模型。 第一个和第二个轮廓模型是不同的。 另一个版本号与第二个配置文件模型数据对象相关联。 第二个配置文件模型数据对象与项目数据对象链接。 存储项目数据对象，第一个轮廓模型数据对象和第二个轮廓模型数据对象。 存储与第一轮廓模型数据对象和第二轮廓模型数据对象相关联的版本号。 存储第一轮廓模型数据对象与项目数据对象之间的链接。 存储第二轮廓模型数据对象与项目数据对象之间的链接。

公开(公告)号：US20080013108A1

公开(公告)日：2008-01-17

申请号：US11485048

申请日：2006-07-11

申请人： Tri Thanh Khuong ,  Junwei Bao ,  Jeffrey A. Chard ,  Wei Liu ,  Ying Zhu ,  Sachin Deshpande ,  Pranav Sheth ,  Hong Qiu

发明人： Tri Thanh Khuong ,  Junwei Bao ,  Jeffrey A. Chard ,  Wei Liu ,  Ying Zhu ,  Sachin Deshpande ,  Pranav Sheth ,  Hong Qiu

IPC分类号： G01B11/14

CPC分类号： G01B11/24 ,  G01N21/4788 ,  G01N21/95607 ,  G01N2021/95615 ,  G03F7/70625

摘要： In processing requests for wafer structure profile determination from optical metrology measurements, a plurality of measured diffraction signal of a plurality of structures formed on one or more wafers is obtained. The plurality of measured diffraction signals is distributed to a plurality of instances of a profile search module. The plurality of instances of the profile search model is activated in one or more processing threads of one or more computer systems. The plurality of measured diffraction signals is processed in parallel using the plurality of instances of the profile search module to determine profiles of the plurality of structures corresponding to the plurality of measured diffraction signals.

摘要翻译： 在从光学测量测量处理对晶片结构轮廓确定的请求中，获得了形成在一个或多个晶片上的多个结构的多个测量的衍射信号。 多个测量的衍射信号被分配到简档搜索模块的多个实例。 简档搜索模型的多个实例在一个或多个计算机系统的一个或多个处理线程中被激活。 使用轮廓搜索模块的多个实例来并行处理多个测量的衍射信号，以确定对应于多个测量的衍射信号的多个结构的轮廓。

公开(公告)号：US07469192B2

公开(公告)日：2008-12-23

申请号：US11485046

申请日：2006-07-11

申请人： Tri Thanh Khuong ,  Junwei Bao ,  Jeffrey A. Chard ,  Wei Liu ,  Ying Zhu ,  Sachin Deshpande ,  Pranav Sheth ,  Hong Qiu

发明人： Tri Thanh Khuong ,  Junwei Bao ,  Jeffrey A. Chard ,  Wei Liu ,  Ying Zhu ,  Sachin Deshpande ,  Pranav Sheth ,  Hong Qiu

IPC分类号： G06F19/00 ,  G01B11/00

CPC分类号： G01B11/24 ,  G01N21/4788 ,  G01N21/95607 ,  G01N2021/95615 ,  G03F7/70625

摘要： A system to process requests for wafer structure profile determination from optical metrology measurements off a plurality of structures formed on one or more wafer includes a diffraction signal processor, a diffraction signal distributor, and a plurality of profile search servers. The diffraction signal processor is configured to obtain a plurality of measured diffraction signals of the plurality of structures. The diffraction signal distributor is coupled to the diffraction signal processor. The diffraction signal processor is configured to transmit the plurality of measured diffraction signals to the diffraction signal distributor. The plurality of profile search servers is coupled to the diffraction signal distributor. The diffraction signal distributor is configured to distribute the plurality of measured diffraction signals to the plurality of profile search servers. The profile search servers are configured to process in parallel the plurality of measured diffraction signals to determine profiles of the plurality of structures corresponding to the plurality of measured diffraction signals.

摘要翻译： 包括衍射信号处理器，衍射信号分配器和多个轮廓搜索服务器，用于处理从一个或多个晶片上形成的多个结构的光学测量测量的晶圆结构轮廓确定的请求的系统。 衍射信号处理器被配置为获得多个结构的多个测量的衍射信号。 衍射信号分配器耦合到衍射信号处理器。 衍射信号处理器被配置为将多个测量的衍射信号传输到衍射信号分配器。 多个轮廓搜索服务器耦合到衍射信号分配器。 衍射信号分配器被配置为将多个测量的衍射信号分布到多个简档搜索服务器。 轮廓搜索服务器被配置为并行处理多个测量的衍射信号，以确定与多个测量的衍射信号相对应的多个结构的轮廓。

公开(公告)号：US20080015812A1

公开(公告)日：2008-01-17

申请号：US11485046

申请日：2006-07-11

申请人： Tri Thanh Khuong ,  Junwei Bao ,  Jeffrey A. Chard ,  Wei Liu ,  Ying Zhu ,  Sachin Deshpande ,  Pranav Sheth ,  Hong Qui

发明人： Tri Thanh Khuong ,  Junwei Bao ,  Jeffrey A. Chard ,  Wei Liu ,  Ying Zhu ,  Sachin Deshpande ,  Pranav Sheth ,  Hong Qui

IPC分类号： G01B11/24 ,  G06F19/00

CPC分类号： G01B11/24 ,  G01N21/4788 ,  G01N21/95607 ,  G01N2021/95615 ,  G03F7/70625

摘要： A system to process requests for wafer structure profile determination from optical metrology measurements off a plurality of structures formed on one or more wafer includes a diffraction signal processor, a diffraction signal distributor, and a plurality of profile search servers. The diffraction signal processor is configured to obtain a plurality of measured diffraction signals of the plurality of structures. The diffraction signal distributor is coupled to the diffraction signal processor. The diffraction signal processor is configured to transmit the plurality of measured diffraction signals to the diffraction signal distributor. The plurality of profile search servers is coupled to the diffraction signal distributor. The diffraction signal distributor is configured to distribute the plurality of measured diffraction signals to the plurality of profile search servers. The profile search servers are configured to process in parallel the plurality of measured diffraction signals to determine profiles of the plurality of structures corresponding to the plurality of measured diffraction signals.

公开(公告)号：US07518740B2

公开(公告)日：2009-04-14

申请号：US11484459

申请日：2006-07-10

申请人： Jeffrey A. Chard ,  Junwei Bao ,  Youxian Wen ,  Sanjay Yedur

发明人： Jeffrey A. Chard ,  Junwei Bao ,  Youxian Wen ,  Sanjay Yedur

IPC分类号： G01B11/14 ,  G01B11/24 ,  G06F19/00

CPC分类号： G01B11/24

摘要： A profile model to characterize a structure to be examined using optical metrology is evaluated by displaying a set of profile parameters that characterizes the profile model. Each profile parameter has a range of values for the profile parameter. For each profile parameter having a range of values, an adjustment tool is displayed for selecting a value for the profile parameter within the range of values. A measured diffraction signal, which was measured using an optical metrology tool, is displayed. A simulated diffraction signal, which was generated based on the values of the profile parameters selected using the adjustment tools for the profile parameters, is displayed. The simulated diffraction signal is overlaid with the measured diffraction signal.

摘要翻译： 通过显示表征轮廓模型的一组轮廓参数来评估使用光学计量学来表征待检查结构的轮廓模型。 每个配置文件参数都有一个范围的配置文件参数的值。 对于具有值范围的每个轮廓参数，显示调整工具，用于在值范围内选择轮廓参数的值。 显示使用光学测量工具测量的测量的衍射信号。 显示基于使用用于轮廓参数的调整工具选择的轮廓参数的值而产生的模拟衍射信号。 模拟衍射信号与测得的衍射信号重叠。

公开(公告)号：US20080007738A1

公开(公告)日：2008-01-10

申请号：US11484459

申请日：2006-07-10

申请人： Jeffrey A. Chard ,  Junwei Bao ,  Youxian Wen ,  Sanjay Yedur

发明人： Jeffrey A. Chard ,  Junwei Bao ,  Youxian Wen ,  Sanjay Yedur

IPC分类号： G01B11/14

CPC分类号： G01B11/24

摘要： A profile model to characterize a structure to be examined using optical metrology is evaluated by displaying a set of profile parameters that characterizes the profile model. Each profile parameter has a range of values for the profile parameter. For each profile parameter having a range of values, an adjustment tool is displayed for selecting a value for the profile parameter within the range of values. A measured diffraction signal, which was measured using an optical metrology tool, is displayed. A simulated diffraction signal, which was generated based on the values of the profile parameters selected using the adjustment tools for the profile parameters, is displayed. The simulated diffraction signal is overlaid with the measured diffraction signal.

摘要翻译： 通过显示表征轮廓模型的一组轮廓参数来评估使用光学计量学来表征待检查结构的轮廓模型。 每个配置文件参数都有一个范围的配置文件参数的值。 对于具有值范围的每个轮廓参数，显示调整工具，用于在值范围内选择轮廓参数的值。 显示使用光学测量工具测量的测量的衍射信号。 显示基于使用用于轮廓参数的调整工具选择的轮廓参数的值而产生的模拟衍射信号。 模拟衍射信号与测得的衍射信号重叠。

公开(公告)号：US06823230B1

公开(公告)日：2004-11-23

申请号：US09657134

申请日：2000-09-07

申请人： Vikram R. Jamalabad ,  Jeffrey A. Chard ,  Charles J. Gasdaska

发明人： Vikram R. Jamalabad ,  Jeffrey A. Chard ,  Charles J. Gasdaska

IPC分类号： G06F1900

CPC分类号： G05B19/4099 ,  B29C64/386 ,  B33Y50/02 ,  G05B2219/49035 ,  Y02P80/40 ,  Y02P90/265

摘要： Methods for improving the manufacture of objects made by layered manufacturing techniques through improved tool path generation. A vertex improvement aspect improves tool paths used to form vertices. Outer perimeter vertices can be improved by automatically creating an outer boundary reflecting the design intent to have material extending to the perimeter vertex. The outer boundary can be used as a contour tool path or as a limit to travel by raster tool paths. Boundary vertices within parts can be improved by extending more internal boundary vertices outward toward enclosing vertices, thereby eliminating some internal voids. Contour boundaries near outer perimeter corners can be better defined by extending outward a contour tool path toward the corners. Narrow regions between combinations of outer and/or inner perimeters can be filled through improved tool paths. Layer regions near inner voids can receive consistent filling through an improved raster tool path method. Sub-perimeter voids between raster bead pair turn-arounds and contour beads can be eliminated by automatically adjusting the raster tool path vertices toward the adjacent raster bead pair and/or contour bead.

摘要翻译： 通过改进刀具路径生成来改进由分层制造技术制造的物体的制造方法。 顶点改进方面改进了用于形成顶点的工具路径。 可以通过自动创建反映设计意图的外边界以使材料延伸到周边顶点来改善外周顶点。 外边界可以用作轮廓刀具路径或作为通过光栅刀具路径行进的限制。 通过将更多的内部边界顶点向外扩展到封闭的顶点可以改善部分内的边界顶点，从而消除一些内部空隙。 通过将轮廓刀具路径朝着拐角向外延伸可以更好地限定外周角附近的轮廓边界。 外部和/或内部周边的组合之间的狭窄区域可以通过改进的工具路径填充。 内部空隙附近的层区域可以通过改进的栅格工具路径方法获得一致的填充。 通过自动调整光栅刀具路径顶点朝向相邻的光栅珠对和/或轮廓珠，可以消除光栅珠对转向和轮廓珠之间的子周界空隙。