公开(公告)号：US20080013107A1

公开(公告)日：2008-01-17

申请号：US11484974

申请日：2006-07-11

申请人： Jeffrey A. Chard ,  Junwei Bao ,  Joerg Bischoff ,  Shifang Li ,  Wei Liu ,  Hong Qiu ,  Sylvio Rabello ,  Vi Vuong

发明人： Jeffrey A. Chard ,  Junwei Bao ,  Joerg Bischoff ,  Shifang Li ,  Wei Liu ,  Hong Qiu ,  Sylvio Rabello ,  Vi Vuong

IPC分类号： G01B11/14

CPC分类号： G01B11/24 ,  G01N21/4788 ,  G01N21/95607 ,  G01N2021/8883 ,  G01N2021/95615

摘要： In generating a profile model to characterize a structure to be examined using optical metrology, a view canvas is displayed, with the profile model being generated displayed in the view canvas. A profile shape palette is displayed adjacent to the view canvas. A plurality of different profile shape primitives is displayed in the profile shape palette. Each profile shape primitive in the profile shape palette is defined by a set of profile parameters. When a user selects a profile shape primitive from the profile shape palette, drags the selected profile shape primitive from the profile shape palette, and drops the selected profile shape primitive into the view canvas, the selected profile shape primitive is incorporated into the profile model being generated and displayed in the view canvas.

摘要翻译： 在生成轮廓模型以使用光学计量学来表征要检查的结构时，显示视图画布，其中生成的轮廓模型显示在视图画布中。 在视图画布附近显示一个轮廓形状调色板。 在轮廓形状调色板中显示多个不同的轮廓形状基元。 轮廓形状调色板中的每个轮廓形状基元由一组轮廓参数定义。 当用户从轮廓形状调色板中选择轮廓形状基元时，从轮廓形状调色板中拖动所选择的轮廓形状基元，并将所选择的轮廓形状基元拖放到视图画布中，将所选择的轮廓形状原语合并到轮廓模型中 生成并显示在视图画布中。

公开(公告)号：US07588949B2

公开(公告)日：2009-09-15

申请号：US11699837

申请日：2007-01-29

申请人： Vi Vuong ,  Emmanuel Drege ,  Shifang Li ,  Junwei Bao

发明人： Vi Vuong ,  Emmanuel Drege ,  Shifang Li ,  Junwei Bao

IPC分类号： H01L21/00 ,  G06F19/00

CPC分类号： G03F7/70625 ,  G03F7/705

摘要： The optimization of an optical metrology model for use in measuring a wafer structure is evaluated. An optical metrology model having metrology model variables, which includes profile model parameters of a profile model, is developed. One or more goals for metrology model optimization are selected. One or more profile model parameters to be used in evaluating the one or more selected goals are selected. One or more metrology model variables to be set to fixed values are selected. One or more selected metrology model variables are set to fixed values. One or more termination criteria for the one or more selected goals are set. The optical metrology model is optimized using the fixed values for the one or more selected metrology model variables. Measurements for the one or more selected profile model parameters are obtained using the optimized optical metrology model. A determination is then made as to whether the one or more termination criteria are met by the obtained measurements.

摘要翻译： 评估用于测量晶片结构的光学测量模型的优化。 开发了具有度量模型变量的光学测量模型，其包括轮廓模型的轮廓模型参数。 选择计量模型优化的一个或多个目标。 选择要用于评估一个或多个所选目标的一个或多个简档模型参数。 选择要设置为固定值的一个或多个计量模型变量。 一个或多个选定的计量模型变量被设置为固定值。 设置一个或多个所选目标的一个或多个终止标准。 光学测量模型使用一个或多个所选计量模型变量的固定值进行优化。 使用优化的光学测量模型获得一个或多个所选轮廓模型参数的测量。 然后确定所获得的测量是否满足一个或多个终止标准。

公开(公告)号：US07515282B2

公开(公告)日：2009-04-07

申请号：US11173198

申请日：2005-07-01

申请人： Shifang Li ,  Vi Vuong ,  Alan Nolet ,  Junwei Bao

发明人： Shifang Li ,  Vi Vuong ,  Alan Nolet ,  Junwei Bao

IPC分类号： G01B11/14

CPC分类号： G01B11/24 ,  G03F7/70625

摘要： The profile of a structure having a region with a spatially varying property is modeled using an optical metrology model. A set of profile parameters is defined for the optical metrology model to characterize the profile of the structure. A set of layers is defined for a portion the optical metrology model that corresponds to the region of the structure with the spatially varying property, each layer having a defined height and width. For each layer, a mathematic function that varies across at least a portion of the width of the layer is defined to characterize the spatially varying property within a corresponding layer in the region of the structure.

摘要翻译： 使用光学测量模型对具有空间变化特性的区域的结构的轮廓进行建模。 为光学测量模型定义了一组轮廓参数，以表征结构轮廓。 对于与具有空间变化性质的结构区域对应的光学计量学模型的一部分定义了一组层，每层具有限定的高度和宽度。 对于每个层，在层的宽度的至少一部分上变化的数学函数被定义为表征结构区域中相应层内的空间变化特性。

公开(公告)号：US20070229855A1

公开(公告)日：2007-10-04

申请号：US11396164

申请日：2006-03-30

申请人： Shifang Li ,  Junwei Bao ,  Vi Vuong

发明人： Shifang Li ,  Junwei Bao ,  Vi Vuong

IPC分类号： G01B11/14

CPC分类号： G01B11/24

摘要： To determine one or more features of an in-die structure on a semiconductor wafer, a correlation is determined between one or more features of a test structure to be formed on a test pad and one or more features of a corresponding in-die structure. A measured diffraction signal measured off the test structure is obtained. One or more features of the test structure are determined using the measured diffraction signal. The one or more features of the in-die structure are determined based on the one or more determined features of the test structure and the determined correlation.

摘要翻译： 为了确定半导体晶片上的管芯内结构的一个或多个特征，在要形成在测试焊盘上的测试结构的一个或多个特征与相应的管芯内结构的一个或多个特征之间确定相关性。 获得测量结果测得的衍射信号。 使用测量的衍射信号确定测试结构的一个或多个特征。 基于测试结构的一个或多个确定的特征和确定的相关性来确定管芯内结构的一个或多个特征。

公开(公告)号：US20070211260A1

公开(公告)日：2007-09-13

申请号：US11371752

申请日：2006-03-08

申请人： Vi Vuong ,  Junwei Bao ,  Shifang Li ,  Yan Chen

发明人： Vi Vuong ,  Junwei Bao ,  Shifang Li ,  Yan Chen

IPC分类号： G01B11/14

CPC分类号： G01B11/24

摘要： A weighting function is obtained to enhance measured diffraction signals used in optical metrology. To obtain the weighting function, a measured diffraction signal is obtained. The measured diffraction signal was measured from a site on a wafer using a photometric device. A first weighting function is defined based on noise that exists in the measured diffraction signal. A second weighting function is defined based on accuracy of the measured diffraction signal. A third weighting function is defined based on sensitivity of the measured diffraction signal. A fourth weighting function is defined based on one or more of the first, second, and third weighting functions.

摘要翻译： 获得加权函数以增强在光学计量学中使用的测量的衍射信号。 为了获得加权函数，获得测量的衍射信号。 使用光度测量装置从晶片上的位置测量测量的衍射信号。 基于存在于测量的衍射信号中的噪声来定义第一加权函数。 基于测量的衍射信号的精度来定义第二加权函数。 基于测量的衍射信号的灵敏度来定义第三加权函数。 基于第一，第二和第三加权函数中的一个或多个来定义第四加权函数。

公开(公告)号：US07523021B2

公开(公告)日：2009-04-21

申请号：US11371752

申请日：2006-03-08

申请人： Vi Vuong ,  Junwei Bao ,  Shifang Li ,  Yan Chen

发明人： Vi Vuong ,  Junwei Bao ,  Shifang Li ,  Yan Chen

IPC分类号： G01B11/02 ,  G06F19/00 ,  H03F1/26 ,  H04B15/00

CPC分类号： G01B11/24

摘要： A weighting function is obtained to enhance measured diffraction signals used in optical metrology. To obtain the weighting function, a measured diffraction signal is obtained. The measured diffraction signal was measured from a site on a wafer using a photometric device. A first weighting function is defined based on noise that exists in the measured diffraction signal. A second weighting function is defined based on accuracy of the measured diffraction signal. A third weighting function is defined based on sensitivity of the measured diffraction signal. A fourth weighting function is defined based on one or more of the first, second, and third weighting functions.

摘要翻译： 获得加权函数以增强在光学计量学中使用的测量的衍射信号。 为了获得加权函数，获得测量的衍射信号。 使用光度测量装置从晶片上的位置测量测量的衍射信号。 基于存在于测量的衍射信号中的噪声来定义第一加权函数。 基于测量的衍射信号的精度来定义第二加权函数。 基于测量的衍射信号的灵敏度来定义第三加权函数。 基于第一，第二和第三加权函数中的一个或多个来定义第四加权函数。

公开(公告)号：US20070135959A1

公开(公告)日：2007-06-14

申请号：US11699837

申请日：2007-01-29

申请人： Vi Vuong ,  Emmanuel Drege ,  Shifang Li ,  Junwei Bao

发明人： Vi Vuong ,  Emmanuel Drege ,  Shifang Li ,  Junwei Bao

IPC分类号： G06F19/00

CPC分类号： G03F7/70625 ,  G03F7/705

摘要： The optimization of an optical metrology model for use in measuring a wafer structure is evaluated. An optical metrology model having metrology model variables, which includes profile model parameters of a profile model, is developed. One or more goals for metrology model optimization are selected. One or more profile model parameters to be used in evaluating the one or more selected goals are selected. One or more metrology model variables to be set to fixed values are selected. One or more selected metrology model variables are set to fixed values. One or more termination criteria for the one or more selected goals are set. The optical metrology model is optimized using the fixed values for the one or more selected metrology model variables. Measurements for the one or more selected profile model parameters are obtained using the optimized optical metrology model. A determination is then made as to whether the one or more termination criteria are met by the obtained measurements.

摘要翻译： 评估用于测量晶片结构的光学测量模型的优化。 开发了具有度量模型变量的光学测量模型，其包括轮廓模型的轮廓模型参数。 选择计量模型优化的一个或多个目标。 选择要用于评估一个或多个所选目标的一个或多个简档模型参数。 选择要设置为固定值的一个或多个计量模型变量。 一个或多个选定的计量模型变量被设置为固定值。 设置一个或多个所选目标的一个或多个终止标准。 光学测量模型使用一个或多个所选计量模型变量的固定值进行优化。 使用优化的光学测量模型获得一个或多个所选轮廓模型参数的测量。 然后确定所获得的测量是否满足一个或多个终止标准。

公开(公告)号：US20060064280A1

公开(公告)日：2006-03-23

申请号：US10946729

申请日：2004-09-21

申请人： Vi Vuong ,  Emmanuel Drege ,  Shifang Li ,  Junwei Bao

发明人： Vi Vuong ,  Emmanuel Drege ,  Shifang Li ,  Junwei Bao

IPC分类号： G06F15/00

CPC分类号： G03F7/70625 ,  G03F7/705

摘要： The optimization of an optical metrology model for use in measuring a wafer structure is evaluated. An optical metrology model having metrology model variables, which includes profile model parameters of a profile model, is developed. One or more goals for metrology model optimization are selected. One or more profile model parameters to be used in evaluating the one or more selected goals are selected. One or more metrology model variables to be set to fixed values are selected. One or more selected metrology model variables are set to fixed values. One or more termination criteria for the one or more selected goals are set. The optical metrology model is optimized using the fixed values for the one or more selected metrology model variables. Measurements for the one or more selected profile model parameters are obtained using the optimized optical metrology model. A determination is then made as to whether the one or more termination criteria are met by the obtained measurements.

公开(公告)号：US07474420B2

公开(公告)日：2009-01-06

申请号：US11396164

申请日：2006-03-30

申请人： Shifang Li ,  Junwei Bao ,  Vi Vuong

发明人： Shifang Li ,  Junwei Bao ,  Vi Vuong

IPC分类号： G01B11/14 ,  H01L21/06 ,  G06P15/00

CPC分类号： G01B11/24

摘要： To determine one or more features of an in-die structure on a semiconductor wafer, a correlation is determined between one or more features of a test structure to be formed on a test pad and one or more features of a corresponding in-die structure. A measured diffraction signal measured off the test structure is obtained. One or more features of the test structure are determined using the measured diffraction signal. The one or more features of the in-die structure are determined based on the one or more determined features of the test structure and the determined correlation.

摘要翻译： 为了确定半导体晶片上的管芯内结构的一个或多个特征，在要形成在测试焊盘上的测试结构的一个或多个特征与相应的管芯内结构的一个或多个特征之间确定相关性。 获得测量结果测得的衍射信号。 使用测量的衍射信号确定测试结构的一个或多个特征。 基于测试结构的一个或多个确定的特征和确定的相关性来确定管芯内结构的一个或多个特征。

公开(公告)号：US20070002337A1

公开(公告)日：2007-01-04

申请号：US11173198

申请日：2005-07-01

申请人： Shifang Li ,  Vi Vuong ,  Alan Nolet ,  Junwei Bao

发明人： Shifang Li ,  Vi Vuong ,  Alan Nolet ,  Junwei Bao

IPC分类号： G01B11/14

CPC分类号： G01B11/24 ,  G03F7/70625

摘要： The profile of a structure having a region with a spatially varying property is modeled using an optical metrology model. A set of profile parameters is defined for the optical metrology model to characterize the profile of the structure. A set of layers is defined for a portion the optical metrology model that corresponds to the region of the structure with the spatially varying property, each layer having a defined height and width. For each layer, a mathematic function that varies across at least a portion of the width of the layer is defined to characterize the spatially varying property within a corresponding layer in the region of the structure.

摘要翻译： 使用光学测量模型对具有空间变化特性的区域的结构的轮廓进行建模。 为光学测量模型定义了一组轮廓参数，以表征结构轮廓。 对于与具有空间变化性质的结构区域对应的光学计量学模型的一部分定义了一组层，每层具有限定的高度和宽度。 对于每个层，在层的宽度的至少一部分上变化的数学函数被定义为表征结构区域中相应层内的空间变化特性。